低信噪比异质外延界面原子分辨 HAADF 图像的精确定位。

Kohei Aso, Yoshifumi Oshima
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引用次数: 0

摘要

异质外延界面非常重要,因为它们决定了器件的性能,例如职业迁移率对界面的粗糙度、应变和成分分布非常敏感。扫描透射电子显微镜中的高角度环形暗场成像技术可用于捕捉原子尺度的界面。为了精确识别原子柱的位置,有人提出了一种技术,通过位置对齐来平均以高扫描速率拍摄的多个图像帧,以提高信噪比。然而,由于界面上几乎完美的周期性结构,帧间的位置对齐有时会估计错误。在此,我们开发了一种精确位置对齐的方法,即首先通过两幅连续图像对齐图像,然后根据第一幅对齐图像的综合图像进行更精确的对齐。我们将这种方法应用于硅基底上的 Si0.8Ge0.2(Si:硅,Ge:锗)外延薄膜的异质界面,并对其进行了演示。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Precise positional alignment of atom-resolved HAADF images of heteroepitaxial interface with low signal-to-noise ratio.

Heteroepitaxial interfaces are important because they determine the performance of devices such that career mobility is sensitive to the distribution of roughness, strain and composition at the interface. High-angle annular dark field imaging in scanning transmission electron microscopy has been utilized to capture them at an atomic scale. For precise identification of atomic column positions, a technique has been proposed to average multiple image frames taken at a high scanning rate by their positional alignment for increasing signal-to-noise ratio. However, the positional alignment between frames is sometimes incorrectly estimated because of the almost perfect periodic structure at the interfaces. Here, we developed an approach for precise positional alignment, where the images are first aligned by two consecutive images and then are aligned more precisely against the integrated image of the first alignment. We demonstrated our method by applying it to the heterointerface of Si0.8Ge0.2 (Si: silicon, Ge: germanium) epitaxial thin films on a Si substrate.

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