1995 IEEE TENCON. IEEE Region 10 International Conference on Microelectronics and VLSI. 'Asia-Pacific Microelectronics 2000'. Proceedings最新文献

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REALIZATION OF VIDEO-RATE STN DISPLAY USING ROW VOLTAGE MODULATION METHOD 用行电压调制方法实现视频率STN显示
S. Lee, Sung-Hoon Park, H. Lee, C. Kim, Chul‐Hi Han
{"title":"REALIZATION OF VIDEO-RATE STN DISPLAY USING ROW VOLTAGE MODULATION METHOD","authors":"S. Lee, Sung-Hoon Park, H. Lee, C. Kim, Chul‐Hi Han","doi":"10.1109/TENCON.1995.496441","DOIUrl":"https://doi.org/10.1109/TENCON.1995.496441","url":null,"abstract":"A driving method which makes it possible to use conventional digital driver ICs and to achieve multi-gray displays with simple computation is proposed. Low cost video-rate 320/spl times/240 8-gray STN-LCD has been realized using the proposed method which adopts multi-line selection scheme.","PeriodicalId":425138,"journal":{"name":"1995 IEEE TENCON. IEEE Region 10 International Conference on Microelectronics and VLSI. 'Asia-Pacific Microelectronics 2000'. Proceedings","volume":"102 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1995-11-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121138806","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A finite width impurity source model for linear doping profiles 线性掺杂谱线的有限宽度杂质源模型
Tommy M. L. Lai, J. Sin, P. Ko
{"title":"A finite width impurity source model for linear doping profiles","authors":"Tommy M. L. Lai, J. Sin, P. Ko","doi":"10.1109/TENCON.1995.496432","DOIUrl":"https://doi.org/10.1109/TENCON.1995.496432","url":null,"abstract":"In order to provide high breakdown voltage in thin-film SOI devices, a linear doping profile in the drift region is needed. The linear doping profile can be obtained by using a lateral variation doping technique. In this technique, a smeared-out dopant distribution is implemented through the use of a sequence of small opening slits in the oxide with subsequent impurity implantation and drive-in processes. In this paper, an analytical model is presented to describe the impurity distribution of a finite width impurity source which is used to form the linear doping profile. This model provides a basis for determination of the slits width and silts spacing which are required to implement the linear doping profile.","PeriodicalId":425138,"journal":{"name":"1995 IEEE TENCON. IEEE Region 10 International Conference on Microelectronics and VLSI. 'Asia-Pacific Microelectronics 2000'. Proceedings","volume":"33 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1995-11-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121332814","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Field programmable analog arrays: past, present and future perspectives 现场可编程模拟阵列:过去,现在和未来的观点
P. Gulak
{"title":"Field programmable analog arrays: past, present and future perspectives","authors":"P. Gulak","doi":"10.1109/TENCON.1995.496352","DOIUrl":"https://doi.org/10.1109/TENCON.1995.496352","url":null,"abstract":"The development of accurate, low-cost, rapid prototyping techniques for analog circuits has been attempted at various times using variety of implementation formats over the past several decades with varying degrees of success. Commercial products introduced recently, along with progress made at University research labs, indicates renewed interest and further accomplishment in achieving this goal. This paper reviews past work in the area from both universities and industry, provides a status report on the state of activities world-wide, and attempts to forecast developments in prototyping analog and mixed-signal systems one can expect in the near future.","PeriodicalId":425138,"journal":{"name":"1995 IEEE TENCON. IEEE Region 10 International Conference on Microelectronics and VLSI. 'Asia-Pacific Microelectronics 2000'. Proceedings","volume":"199 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1995-11-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115887580","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 32
Integrated digital input driver for active matrix liquid-crystal-on-silicon display 用于有源矩阵液晶单晶硅显示器的集成数字输入驱动器
H.C. Huang, P. Cheng, H. Kwok
{"title":"Integrated digital input driver for active matrix liquid-crystal-on-silicon display","authors":"H.C. Huang, P. Cheng, H. Kwok","doi":"10.1109/TENCON.1995.496444","DOIUrl":"https://doi.org/10.1109/TENCON.1995.496444","url":null,"abstract":"A digital input driver was designed and integrated with an active matrix nematic liquid-crystal-on-silicon (LCOS) display. Fabricated by conventional 2-/spl mu/m CMOS technology, the driver in the periphery of the active matrix can easily incorporate versatile electronic functions into the silicon backplane. This integration makes the LCOS display easier to be interfaced with different image sources of various formats and, hence, leads to a versatile display system.","PeriodicalId":425138,"journal":{"name":"1995 IEEE TENCON. IEEE Region 10 International Conference on Microelectronics and VLSI. 'Asia-Pacific Microelectronics 2000'. Proceedings","volume":"57 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1995-11-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122498763","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Analog and VLSI implementation of connectionist network for minimum spanning tree problems 最小生成树问题的连接网络模拟和VLSI实现
H. Ng, K. Lam, W. K. Tai
{"title":"Analog and VLSI implementation of connectionist network for minimum spanning tree problems","authors":"H. Ng, K. Lam, W. K. Tai","doi":"10.1109/TENCON.1995.496356","DOIUrl":"https://doi.org/10.1109/TENCON.1995.496356","url":null,"abstract":"We describe a connectionist architecture which shows promise in obtaining the global optimal solution to the classical minimum spanning tree problem in a time independent of the problem size. Using commonly available analogue electronic components, a network prototype was found to give the global optimal solution within the microseconds range. Simulation results and limiting factors of the performance of analog and VLSI implementation circuits are discussed.","PeriodicalId":425138,"journal":{"name":"1995 IEEE TENCON. IEEE Region 10 International Conference on Microelectronics and VLSI. 'Asia-Pacific Microelectronics 2000'. Proceedings","volume":"89 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1995-11-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122690917","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 6
CoSi/sub 2//SiGe contact formation by Co/a-SiGe/Si solid state reaction Co/a-SiGe/Si固相反应形成CoSi/ sub2 //SiGe触点
W. Qi, B. Li, G. Jiang, W.N. Huang, Z. Gu
{"title":"CoSi/sub 2//SiGe contact formation by Co/a-SiGe/Si solid state reaction","authors":"W. Qi, B. Li, G. Jiang, W.N. Huang, Z. Gu","doi":"10.1109/TENCON.1995.496393","DOIUrl":"https://doi.org/10.1109/TENCON.1995.496393","url":null,"abstract":"The Co/a-SiGe/Si solid state reaction has been studied in this paper. The experimental results demonstrated the simultaneously SiGe/Si solid phase hetero-epitaxy and CoSi/sub 2//SiGe contact formation. The SiGe crystallization is a result of the Ge rejection and interdiffusion with Si during the Co/a-SiGe/Si ternary interaction.","PeriodicalId":425138,"journal":{"name":"1995 IEEE TENCON. IEEE Region 10 International Conference on Microelectronics and VLSI. 'Asia-Pacific Microelectronics 2000'. Proceedings","volume":"58 34 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1995-11-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125036993","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
A new hybrid SOI LDMOS-IGBT power transistor 一种新型混合SOI LDMOS-IGBT功率晶体管
J. Zeng, P. Mawby, M. Towers, K. Board
{"title":"A new hybrid SOI LDMOS-IGBT power transistor","authors":"J. Zeng, P. Mawby, M. Towers, K. Board","doi":"10.1109/TENCON.1995.496434","DOIUrl":"https://doi.org/10.1109/TENCON.1995.496434","url":null,"abstract":"A new hybrid LDMOS-IGBT structure using SOI film is reported. The new device integrates the advantages of SOI technology, the conductivity modulation of IGBT and the high switching speed of DMOSFET.","PeriodicalId":425138,"journal":{"name":"1995 IEEE TENCON. IEEE Region 10 International Conference on Microelectronics and VLSI. 'Asia-Pacific Microelectronics 2000'. Proceedings","volume":"69 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1995-11-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125932810","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 6
Variable data rate Viterbi decoder with modified LOVA algorithm 基于改进LOVA算法的可变数据速率Viterbi解码器
S. Czaja, J. Robertson
{"title":"Variable data rate Viterbi decoder with modified LOVA algorithm","authors":"S. Czaja, J. Robertson","doi":"10.1109/TENCON.1995.496443","DOIUrl":"https://doi.org/10.1109/TENCON.1995.496443","url":null,"abstract":"This paper describes the implementation of a Viterbi decoder with a modified list-of-two List Output Viterbi Algorithm (LOVA) which is used to decode variable data rate frames in Code Division Multiple Access (CDMA) mobile stations. It performs the decoding of convolutional code k=9, rate=1/2 for fall, half, quarter, and eighth data rate frames. This Viterbi decoder is a part of a CDMA base-band processor used in an IS-95 cellular and Personal Communication System (PCS) mobile terminal.","PeriodicalId":425138,"journal":{"name":"1995 IEEE TENCON. IEEE Region 10 International Conference on Microelectronics and VLSI. 'Asia-Pacific Microelectronics 2000'. Proceedings","volume":"12 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1995-11-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"117107535","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Electro-absorption and refraction at 1.5 /spl mu/m in InGaAs/AlGaAs superlattice growth on GaAs substrate GaAs衬底上InGaAs/AlGaAs超晶格生长在1.5 /spl mu/m下的电吸收和折射
Michael C. Y. Chan, E. Li, K. S. Chan
{"title":"Electro-absorption and refraction at 1.5 /spl mu/m in InGaAs/AlGaAs superlattice growth on GaAs substrate","authors":"Michael C. Y. Chan, E. Li, K. S. Chan","doi":"10.1109/TENCON.1995.496340","DOIUrl":"https://doi.org/10.1109/TENCON.1995.496340","url":null,"abstract":"High indium concentration In/sub 0.65/Ga/sub 0.35/As/Al/sub 0.33/Ga/sub 0.67/As superlattices on GaAs substrates are useful for modulators and optical communication applications. This is due to the lowest loss 1.55 /spl mu/m optimum wavelength for operation of fiber optic systems. The optical parameters such as absorption coefficient and change in refractive index with applied electric field are investigated.","PeriodicalId":425138,"journal":{"name":"1995 IEEE TENCON. IEEE Region 10 International Conference on Microelectronics and VLSI. 'Asia-Pacific Microelectronics 2000'. Proceedings","volume":"42 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1995-11-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126873026","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Fluidic shear-stress measurement using surface-micromachined sensors 使用表面微机械传感器的流体剪切应力测量
Jin-Biao Huang, Chang Liu, F. Jiang, S. Tung, Y. Tai, Chih-Ming Ho
{"title":"Fluidic shear-stress measurement using surface-micromachined sensors","authors":"Jin-Biao Huang, Chang Liu, F. Jiang, S. Tung, Y. Tai, Chih-Ming Ho","doi":"10.1109/TENCON.1995.496324","DOIUrl":"https://doi.org/10.1109/TENCON.1995.496324","url":null,"abstract":"A poly-silicon hot-film shear-stress sensor insulated by a vacuum-chamber underneath has been designed and fabricated by the surface micromachining technology. The sensor is operated at both constant current and constant temperature modes. The dynamic performance (including time constant and cut-off frequency) measurement, calibration, and temperature compensation of the sensor have been realized.","PeriodicalId":425138,"journal":{"name":"1995 IEEE TENCON. IEEE Region 10 International Conference on Microelectronics and VLSI. 'Asia-Pacific Microelectronics 2000'. Proceedings","volume":"64 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1995-11-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126755199","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 11
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