{"title":"Electromigration-Induced Extrusions in Multi-Level Technologies","authors":"J. Lloyd","doi":"10.1109/IRPS.1983.361985","DOIUrl":"https://doi.org/10.1109/IRPS.1983.361985","url":null,"abstract":"It has been found that wearout failure in multilevel technologies is primarily by electromigration- induced extrusions leading to intralevel short circuits rather than by the traditionally studied open-circuit mode. Recent results are reported, with a discussion of the serious implication that this newly considered failure mode generates.","PeriodicalId":334813,"journal":{"name":"21st International Reliability Physics Symposium","volume":"24 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1983-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122016580","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Precision VLSI Cross-Sectioning and Staining","authors":"T. Mills","doi":"10.1109/irps.1983.362006","DOIUrl":"https://doi.org/10.1109/irps.1983.362006","url":null,"abstract":"Last year precision VLSI cross-sectioning and staining was introduced to IEEE IRPS. Included in this year's paper is how to implement a 4X productivity improvement of this cross-sectioning technique. Staining techniques are broken down so a failure analyst and/or process engineer can easily formulate and fine tune a stain, also a list of most commonly used stain formulations.","PeriodicalId":334813,"journal":{"name":"21st International Reliability Physics Symposium","volume":"4052 3 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127553143","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Mass Spectrometric Measurement of Moisture Workshop","authors":"B. A. M. Radc, R. Harris","doi":"10.1109/irps.1983.361993","DOIUrl":"https://doi.org/10.1109/irps.1983.361993","url":null,"abstract":"","PeriodicalId":334813,"journal":{"name":"21st International Reliability Physics Symposium","volume":"21 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127457743","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}