{"title":"Electromigration-Induced Extrusions in Multi-Level Technologies","authors":"J. Lloyd","doi":"10.1109/IRPS.1983.361985","DOIUrl":null,"url":null,"abstract":"It has been found that wearout failure in multilevel technologies is primarily by electromigration- induced extrusions leading to intralevel short circuits rather than by the traditionally studied open-circuit mode. Recent results are reported, with a discussion of the serious implication that this newly considered failure mode generates.","PeriodicalId":334813,"journal":{"name":"21st International Reliability Physics Symposium","volume":"24 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1983-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"21st International Reliability Physics Symposium","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IRPS.1983.361985","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5
Abstract
It has been found that wearout failure in multilevel technologies is primarily by electromigration- induced extrusions leading to intralevel short circuits rather than by the traditionally studied open-circuit mode. Recent results are reported, with a discussion of the serious implication that this newly considered failure mode generates.