{"title":"Precision VLSI Cross-Sectioning and Staining","authors":"T. Mills","doi":"10.1109/irps.1983.362006","DOIUrl":null,"url":null,"abstract":"Last year precision VLSI cross-sectioning and staining was introduced to IEEE IRPS. Included in this year's paper is how to implement a 4X productivity improvement of this cross-sectioning technique. Staining techniques are broken down so a failure analyst and/or process engineer can easily formulate and fine tune a stain, also a list of most commonly used stain formulations.","PeriodicalId":334813,"journal":{"name":"21st International Reliability Physics Symposium","volume":"4052 3 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"21st International Reliability Physics Symposium","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/irps.1983.362006","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Last year precision VLSI cross-sectioning and staining was introduced to IEEE IRPS. Included in this year's paper is how to implement a 4X productivity improvement of this cross-sectioning technique. Staining techniques are broken down so a failure analyst and/or process engineer can easily formulate and fine tune a stain, also a list of most commonly used stain formulations.