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Advances in Patterning Materials and Processes XXXIX最新文献

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Novel litho track hardware features and its contribution to EUV defect reduction 新型光刻轨迹硬件特性及其对减少极紫外光缺陷的贡献
Advances in Patterning Materials and Processes XXXIX Pub Date : 2022-06-13 DOI: 10.1117/12.2614668
Andreia Santos
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引用次数: 0
Achieving zero EUV patterning defect with dry photoresist system 用干燥光刻胶系统实现零EUV图案缺陷
Advances in Patterning Materials and Processes XXXIX Pub Date : 2022-06-13 DOI: 10.1117/12.2623499
M. Alvi, R. Gottscho, A. Haider, Seongjun Heo, P. Hsieh, Ching-Chung Huang, Gosia Jurczak, Benjamin Kam, Ji Yeon Kim, Billie Li, D. Li, Henry Nguyen, Yang Pan, D. Peter, N. Shamma, A. de Silva, Samantha Tan, Ethen Wang, T. Weidman, R. Wise, Morrey Wu, E. Verveniotis, Boris Volosskiy, Jengyi Yu, H. Zaid
{"title":"Achieving zero EUV patterning defect with dry photoresist system","authors":"M. Alvi, R. Gottscho, A. Haider, Seongjun Heo, P. Hsieh, Ching-Chung Huang, Gosia Jurczak, Benjamin Kam, Ji Yeon Kim, Billie Li, D. Li, Henry Nguyen, Yang Pan, D. Peter, N. Shamma, A. de Silva, Samantha Tan, Ethen Wang, T. Weidman, R. Wise, Morrey Wu, E. Verveniotis, Boris Volosskiy, Jengyi Yu, H. Zaid","doi":"10.1117/12.2623499","DOIUrl":"https://doi.org/10.1117/12.2623499","url":null,"abstract":"","PeriodicalId":314201,"journal":{"name":"Advances in Patterning Materials and Processes XXXIX","volume":"23 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115422258","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Materials development for immersive augmented reality experiences 沉浸式增强现实体验的材料开发
Advances in Patterning Materials and Processes XXXIX Pub Date : 2022-06-13 DOI: 10.1117/12.2622524
Ankit Vora, N. Mohanty, Keren Zhang, Giuseppe Calafiore, T. Rao, Heeyoon Lee, G. Dubois, M. Colburn
{"title":"Materials development for immersive augmented reality experiences","authors":"Ankit Vora, N. Mohanty, Keren Zhang, Giuseppe Calafiore, T. Rao, Heeyoon Lee, G. Dubois, M. Colburn","doi":"10.1117/12.2622524","DOIUrl":"https://doi.org/10.1117/12.2622524","url":null,"abstract":"","PeriodicalId":314201,"journal":{"name":"Advances in Patterning Materials and Processes XXXIX","volume":"106 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126723696","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Intra track backside cleaning optimization to reduce the focus spot in Immersion lithography cluster 减小浸入式光刻簇聚焦光斑的轨道内背面清洗优化
Advances in Patterning Materials and Processes XXXIX Pub Date : 2022-06-13 DOI: 10.1117/12.2614242
N. Frolet, E. Porcheron, K. Jullian, M. May, Yuji Tanaka, M. Harumoto, R. Tiron
{"title":"Intra track backside cleaning optimization to reduce the focus spot in Immersion lithography cluster","authors":"N. Frolet, E. Porcheron, K. Jullian, M. May, Yuji Tanaka, M. Harumoto, R. Tiron","doi":"10.1117/12.2614242","DOIUrl":"https://doi.org/10.1117/12.2614242","url":null,"abstract":"","PeriodicalId":314201,"journal":{"name":"Advances in Patterning Materials and Processes XXXIX","volume":"34 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123940786","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Improving wet etch resistance of organic underlayers 提高有机衬底的耐湿蚀性
Advances in Patterning Materials and Processes XXXIX Pub Date : 2022-06-13 DOI: 10.1117/12.2612350
A. Chavez, Iou-Sheng Ke, Sabrina Wong, Shintaro Yamada
{"title":"Improving wet etch resistance of organic underlayers","authors":"A. Chavez, Iou-Sheng Ke, Sabrina Wong, Shintaro Yamada","doi":"10.1117/12.2612350","DOIUrl":"https://doi.org/10.1117/12.2612350","url":null,"abstract":"","PeriodicalId":314201,"journal":{"name":"Advances in Patterning Materials and Processes XXXIX","volume":"5 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128368459","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Coater/developer based techniques to achieve sub-30nm CAR process on EUV stack 基于涂层/显影剂的技术，在EUV堆栈上实现30nm以下的CAR工艺
Advances in Patterning Materials and Processes XXXIX Pub Date : 2022-06-13 DOI: 10.1117/12.2613805
Kanzo Kato, L. Huli, D. Hetzer, S. Shimura, S. Kawakami, Soichiro Okada, T. Kitano, Akihiro Sonoda, K. Petrillo, Luciana Meli, Cody Murray, A. Hubbard
{"title":"Coater/developer based techniques to achieve sub-30nm CAR process on EUV stack","authors":"Kanzo Kato, L. Huli, D. Hetzer, S. Shimura, S. Kawakami, Soichiro Okada, T. Kitano, Akihiro Sonoda, K. Petrillo, Luciana Meli, Cody Murray, A. Hubbard","doi":"10.1117/12.2613805","DOIUrl":"https://doi.org/10.1117/12.2613805","url":null,"abstract":"","PeriodicalId":314201,"journal":{"name":"Advances in Patterning Materials and Processes XXXIX","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130878783","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Patterning liquids: liquid metals for soft and additive electronics 图案液体:软电子和增材电子用液态金属
Advances in Patterning Materials and Processes XXXIX Pub Date : 2022-06-13 DOI: 10.1117/12.2615966
M. Dickey
{"title":"Patterning liquids: liquid metals for soft and additive electronics","authors":"M. Dickey","doi":"10.1117/12.2615966","DOIUrl":"https://doi.org/10.1117/12.2615966","url":null,"abstract":"","PeriodicalId":314201,"journal":{"name":"Advances in Patterning Materials and Processes XXXIX","volume":"65 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122705441","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Development of a molecular modeling-based hazard ranking scheme for per- and polyfluoroalkyl substances and their alternatives 为全氟烷基和多氟烷基物质及其替代品制定基于分子模型的危害排序方案
Advances in Patterning Materials and Processes XXXIX Pub Date : 2022-06-13 DOI: 10.1117/12.2613598
Carla A. Ng, Yuexin Cao
{"title":"Development of a molecular modeling-based hazard ranking scheme for per- and polyfluoroalkyl substances and their alternatives","authors":"Carla A. Ng, Yuexin Cao","doi":"10.1117/12.2613598","DOIUrl":"https://doi.org/10.1117/12.2613598","url":null,"abstract":"","PeriodicalId":314201,"journal":{"name":"Advances in Patterning Materials and Processes XXXIX","volume":"20 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114510047","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
High-temperature stable spin-on carbon materials for advanced pattern transfer applications 用于高级图案转移应用的高温稳定自旋碳材料
Advances in Patterning Materials and Processes XXXIX Pub Date : 2022-06-13 DOI: 10.1117/12.2628988
J. Koza, Caroline D. Evans, R. Huang, Jamie Storie, Vandana N. Krishnamurthy, D. Guerrero
{"title":"High-temperature stable spin-on carbon materials for advanced pattern transfer applications","authors":"J. Koza, Caroline D. Evans, R. Huang, Jamie Storie, Vandana N. Krishnamurthy, D. Guerrero","doi":"10.1117/12.2628988","DOIUrl":"https://doi.org/10.1117/12.2628988","url":null,"abstract":"","PeriodicalId":314201,"journal":{"name":"Advances in Patterning Materials and Processes XXXIX","volume":"30 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116561238","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Considerations on polymer removal mechanism by filter membrane 过滤膜去除聚合物机理的探讨
Advances in Patterning Materials and Processes XXXIX Pub Date : 2022-06-13 DOI: 10.1117/12.2611689
Yoshiaki Yamada, Robb Fang, J. Zhou, Nicole Wang
{"title":"Considerations on polymer removal mechanism by filter membrane","authors":"Yoshiaki Yamada, Robb Fang, J. Zhou, Nicole Wang","doi":"10.1117/12.2611689","DOIUrl":"https://doi.org/10.1117/12.2611689","url":null,"abstract":"","PeriodicalId":314201,"journal":{"name":"Advances in Patterning Materials and Processes XXXIX","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130388212","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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