Advances in Patterning Materials and Processes XXXIX

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Advances in Patterning Materials and Processes XXXIX - 最新文献

Novel litho track hardware features and its contribution to EUV defect reduction

Pub Date : 2022-06-13 DOI: 10.1117/12.2614668 Andreia Santos

Achieving zero EUV patterning defect with dry photoresist system

Pub Date : 2022-06-13 DOI: 10.1117/12.2623499 M. Alvi, R. Gottscho, A. Haider, Seongjun Heo, P. Hsieh, Ching-Chung Huang, Gosia Jurczak, Benjamin Kam, Ji Yeon Kim, Billie Li, D. Li, Henry Nguyen, Yang Pan, D. Peter, N. Shamma, A. de Silva, Samantha Tan, Ethen Wang, T. Weidman, R. Wise, Morrey Wu, E. Verveniotis, Boris Volosskiy, Jengyi Yu, H. Zaid

Materials development for immersive augmented reality experiences

Pub Date : 2022-06-13 DOI: 10.1117/12.2622524 Ankit Vora, N. Mohanty, Keren Zhang, Giuseppe Calafiore, T. Rao, Heeyoon Lee, G. Dubois, M. Colburn

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