M. Alvi, R. Gottscho, A. Haider, Seongjun Heo, P. Hsieh, Ching-Chung Huang, Gosia Jurczak, Benjamin Kam, Ji Yeon Kim, Billie Li, D. Li, Henry Nguyen, Yang Pan, D. Peter, N. Shamma, A. de Silva, Samantha Tan, Ethen Wang, T. Weidman, R. Wise, Morrey Wu, E. Verveniotis, Boris Volosskiy, Jengyi Yu, H. Zaid
{"title":"Achieving zero EUV patterning defect with dry photoresist system","authors":"M. Alvi, R. Gottscho, A. Haider, Seongjun Heo, P. Hsieh, Ching-Chung Huang, Gosia Jurczak, Benjamin Kam, Ji Yeon Kim, Billie Li, D. Li, Henry Nguyen, Yang Pan, D. Peter, N. Shamma, A. de Silva, Samantha Tan, Ethen Wang, T. Weidman, R. Wise, Morrey Wu, E. Verveniotis, Boris Volosskiy, Jengyi Yu, H. Zaid","doi":"10.1117/12.2623499","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":314201,"journal":{"name":"Advances in Patterning Materials and Processes XXXIX","volume":"23 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Advances in Patterning Materials and Processes XXXIX","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2623499","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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