N. Frolet, E. Porcheron, K. Jullian, M. May, Yuji Tanaka, M. Harumoto, R. Tiron
{"title":"Intra track backside cleaning optimization to reduce the focus spot in Immersion lithography cluster","authors":"N. Frolet, E. Porcheron, K. Jullian, M. May, Yuji Tanaka, M. Harumoto, R. Tiron","doi":"10.1117/12.2614242","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":314201,"journal":{"name":"Advances in Patterning Materials and Processes XXXIX","volume":"34 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Advances in Patterning Materials and Processes XXXIX","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2614242","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}