Soichiro Okada, Keisuke Yoshida, Hiroyuki Fujii, S. Shimura
{"title":"Fundamental study of inorganic middle layer film for EUV patterning","authors":"Soichiro Okada, Keisuke Yoshida, Hiroyuki Fujii, S. Shimura","doi":"10.1117/12.2614092","DOIUrl":"https://doi.org/10.1117/12.2614092","url":null,"abstract":"","PeriodicalId":314201,"journal":{"name":"Advances in Patterning Materials and Processes XXXIX","volume":"40 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125493259","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Adhesion and collapse of EUV photoresists and the role of underlayers","authors":"R. Fallica, Steven Chen, D. De Simone, H. Suh","doi":"10.1117/12.2609485","DOIUrl":"https://doi.org/10.1117/12.2609485","url":null,"abstract":"","PeriodicalId":314201,"journal":{"name":"Advances in Patterning Materials and Processes XXXIX","volume":"2 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126900071","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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