Kanzo Kato, L. Huli, D. Hetzer, S. Shimura, S. Kawakami, Soichiro Okada, T. Kitano, Akihiro Sonoda, K. Petrillo, Luciana Meli, Cody Murray, A. Hubbard
{"title":"Coater/developer based techniques to achieve sub-30nm CAR process on EUV stack","authors":"Kanzo Kato, L. Huli, D. Hetzer, S. Shimura, S. Kawakami, Soichiro Okada, T. Kitano, Akihiro Sonoda, K. Petrillo, Luciana Meli, Cody Murray, A. Hubbard","doi":"10.1117/12.2613805","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":314201,"journal":{"name":"Advances in Patterning Materials and Processes XXXIX","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Advances in Patterning Materials and Processes XXXIX","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2613805","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}