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2008 IEEE 21st International Conference on Micro Electro Mechanical Systems最新文献

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On-chip characterization of the transport properties of liquids using microfluidic channel-based Brownian microscopy 基于微流控通道的布朗显微技术在芯片上表征液体的输运特性
2008 IEEE 21st International Conference on Micro Electro Mechanical Systems Pub Date : 2008-01-28 DOI: 10.1109/MEMSYS.2008.4443724
Jichul Kim, Y. Ju
{"title":"On-chip characterization of the transport properties of liquids using microfluidic channel-based Brownian microscopy","authors":"Jichul Kim, Y. Ju","doi":"10.1109/MEMSYS.2008.4443724","DOIUrl":"https://doi.org/10.1109/MEMSYS.2008.4443724","url":null,"abstract":"We report techniques to characterize the transport properties as well as velocity fields of liquids flowing in microchannels. Microscopic particles of a precisely defined diameter are dispersed in a liquid of interest and their cross-stream Brownian motions are analyzed to determine the local Brownian diffusivity, which is in turn a function of the viscosity or mass concentration. We apply the proposed techniques to determine the viscosity and mass diffusivity of mixtures of glycerin and water, which agree well with the literature values. The techniques developed in this work will enable massively parallel characterization of novel liquids and their mixtures as well as in situ performance evaluation of microfluidic devices.","PeriodicalId":233133,"journal":{"name":"2008 IEEE 21st International Conference on Micro Electro Mechanical Systems","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-01-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116165908","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Characterization of silicon parallel-plate electrostatic actuator in partially conducting aqueous solution 部分导电水溶液中硅平行板静电致动器的表征
2008 IEEE 21st International Conference on Micro Electro Mechanical Systems Pub Date : 2008-01-28 DOI: 10.1109/MEMSYS.2008.4443701
H. Panchawagh, T. Sounart, A. Kausik, D. Finch, R. Mahajan
{"title":"Characterization of silicon parallel-plate electrostatic actuator in partially conducting aqueous solution","authors":"H. Panchawagh, T. Sounart, A. Kausik, D. Finch, R. Mahajan","doi":"10.1109/MEMSYS.2008.4443701","DOIUrl":"https://doi.org/10.1109/MEMSYS.2008.4443701","url":null,"abstract":"In this paper we present experimental results on the behavior of a silicon parallel-plate electrostatic actuator operated in a partially conducting aqueous solution. First, an experimental setup based on a laser position sensor is described for dynamic measurement of out-of-plate motion of MEMS structures in liquids. This set up is used to characterize motion of a surface-micromachined, polysilicon piston actuator operated in water using high- frequency drive signals to avoid charge migration that screens actuation potential. Results show that besides actuator design and fluid properties, voltage-displacement characteristics and pull-in phenomenon of parallel-plate actuators also depend on drive frequency.","PeriodicalId":233133,"journal":{"name":"2008 IEEE 21st International Conference on Micro Electro Mechanical Systems","volume":"122 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-01-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116207869","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 5
High frequency XYZ-axis single-disk silicon gyroscope 高频率xyz轴单盘硅陀螺仪
2008 IEEE 21st International Conference on Micro Electro Mechanical Systems Pub Date : 2008-01-28 DOI: 10.1109/MEMSYS.2008.4443791
H. Johari, J. Shah, F. Ayazi
{"title":"High frequency XYZ-axis single-disk silicon gyroscope","authors":"H. Johari, J. Shah, F. Ayazi","doi":"10.1109/MEMSYS.2008.4443791","DOIUrl":"https://doi.org/10.1109/MEMSYS.2008.4443791","url":null,"abstract":"This paper reports on the design and implementation of a single-disk capacitive gyroscope capable of sensing rotation rates around x, y and z axes. A single crystal silicon disk is operated in its appropriate in-plane and out-of-plane modes in the MHz frequency range to sense the z-axis and xy-axis rotation rates, respectively. Utilizing a single disk for measuring rate around all three axes minimizes the form factor compared to approaches using three separate proof masses. Due to high frequency operation, both in-plane and out-of plane modes can achieve high quality factors (Q) in moderate vacuum (1-10Torr), facilitating the wafer-level encapsulation of the device. In addition, the device bandwidth, in the range of 20 to 50 Hz, is suitable for the relatively fast response time requirements of consumer electronics applications.","PeriodicalId":233133,"journal":{"name":"2008 IEEE 21st International Conference on Micro Electro Mechanical Systems","volume":"112 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-01-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115542353","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 18
Electrostatic droplet manipulation using electret as a voltage source 利用驻极体作为电压源的静电液滴操纵
2008 IEEE 21st International Conference on Micro Electro Mechanical Systems Pub Date : 2008-01-28 DOI: 10.1109/MEMSYS.2008.4443725
Tianzhun Wu, Y. Suzuki, N. Kasagi
{"title":"Electrostatic droplet manipulation using electret as a voltage source","authors":"Tianzhun Wu, Y. Suzuki, N. Kasagi","doi":"10.1109/MEMSYS.2008.4443725","DOIUrl":"https://doi.org/10.1109/MEMSYS.2008.4443725","url":null,"abstract":"A novel low-voltage electrostatic droplet manipulation method, liquid dielectrophoresis on electret (L-DEPOE) is proposed. By using electret as a voltage source, a dielectric droplet can move between two electrodes by switching an external capacitor. A circuit model is developed to predict the electrostatic force acting on the droplet and the droplet motion. A prototype device has been microfabricated using glass substrates with ITO electrodes and CYTOP electret. Parylene protection layer on the top of CYTOP prevents charge decay of the electret. It is demonstrated that the silicone oil droplet is moved by switching the capacitor using a 5 V signal, which is much smaller than the voltage required for electrowetting on dielectrics (EWOD).","PeriodicalId":233133,"journal":{"name":"2008 IEEE 21st International Conference on Micro Electro Mechanical Systems","volume":"12 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-01-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122036420","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 9
High-aspect-ratio vertical surface profiler using sensitive displacement detection by optomecanical probe 采用光学探针灵敏位移检测的高纵横比垂直曲面剖面仪
2008 IEEE 21st International Conference on Micro Electro Mechanical Systems Pub Date : 2008-01-28 DOI: 10.1109/MEMSYS.2008.4443798
Y. Hamaguchi, M. Kubota, J. Pourciel, Y. Mita
{"title":"High-aspect-ratio vertical surface profiler using sensitive displacement detection by optomecanical probe","authors":"Y. Hamaguchi, M. Kubota, J. Pourciel, Y. Mita","doi":"10.1109/MEMSYS.2008.4443798","DOIUrl":"https://doi.org/10.1109/MEMSYS.2008.4443798","url":null,"abstract":"This paper proposes an optomechanical surface profiler for high aspect ratio vertical walls. The profiler consists of a bulk silicon micro cantilever probe with a vertical mirror at its end and an integrated sheath fiberguide to insert thinned optical fiber, all fabricated by deep reactive ion etching (DRIE). The probe reflects light by integrated vertical mirror and detects the surface contact point by measuring light power attenuation, which decreases according to the overdrive distance from the contact point. A new stair-shape vertical mirror showed a high (-7.3 dBm/mum) power-to-overdrive sensitivity at 3.5 mum overdriving displacement. Together with an original neck-pinched cantilever design, the proposed profiler showed a potential superiority to conventional piezoresistive detection method and applicability to narrower entrance high aspect ratio structures.","PeriodicalId":233133,"journal":{"name":"2008 IEEE 21st International Conference on Micro Electro Mechanical Systems","volume":"38 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-01-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123845506","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
An improved anisotropic wet etching process for the fabrication of silicon mems structures using a single etching mask 一种改进的各向异性湿法刻蚀工艺，用于单刻蚀掩膜制造硅mems结构
2008 IEEE 21st International Conference on Micro Electro Mechanical Systems Pub Date : 2008-01-28 DOI: 10.1109/MEMSYS.2008.4443659
P. Pal, K. Sato, M. Gosálvez, M. Shikida
{"title":"An improved anisotropic wet etching process for the fabrication of silicon mems structures using a single etching mask","authors":"P. Pal, K. Sato, M. Gosálvez, M. Shikida","doi":"10.1109/MEMSYS.2008.4443659","DOIUrl":"https://doi.org/10.1109/MEMSYS.2008.4443659","url":null,"abstract":"We have developed an improved anisotropic wet etching process for the fabrication of various silicon microstructures with rounded concave and sharp convex corners, grooves for chip isolation, meandering micro-fluidic channels, mesa structures with bent V-grooves, and 45deg mirrors with highly smooth surface finish by using a single etching mask on (100) wafers. In this work, we use a CMOS compatible anisotropic etchant containing tetramethyl ammonium hydroxide (TMAH) and a small amount (0.1% v/v) of a non-ionic surfactant (NC-200), containing 100% polyoxyethylene-alkyl- phenyl-ether. The process has been developed by analyzing the etching characteristics of (100) silicon wafers in pure and surfactant added TMAH.","PeriodicalId":233133,"journal":{"name":"2008 IEEE 21st International Conference on Micro Electro Mechanical Systems","volume":"11 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-01-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121644242","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 6
Contact potential difference for sequential assembly and face alignment of submillimeter components 接触电位差的顺序装配和面对准的亚毫米组件
2008 IEEE 21st International Conference on Micro Electro Mechanical Systems Pub Date : 2008-01-28 DOI: 10.1109/MEMSYS.2008.4443841
T. Tanemura, Y. Higuchi, T. Kusakabe, K. Sugano, T. Tsuchiya, O. Tabata
{"title":"Contact potential difference for sequential assembly and face alignment of submillimeter components","authors":"T. Tanemura, Y. Higuchi, T. Kusakabe, K. Sugano, T. Tsuchiya, O. Tabata","doi":"10.1109/MEMSYS.2008.4443841","DOIUrl":"https://doi.org/10.1109/MEMSYS.2008.4443841","url":null,"abstract":"We demonstrated a new approach utilizing contact potential difference (CPD) based self-assembly for a future sequential assembly of nano/micro components and face alignment of submillimeter scale components. Two types of experiments realized by CPD were carried out; 1) sequential assembly of silica particles using Coulomb force induced by contacting a silver (Ag) probe on a platinum (Pt) substrate, and 2) face alignment of component with Ag on one face and Pt on the other face on a Pt substrate by CPD induced additional electrostatic adhesive energy. In the face alignment experiment, the measured adhesive energies of two different metal pairs (Pt-Ag and Pt-Pt) were one order smaller than the theoretical value. However, 83 % components were successfully aligned as Pt face up.","PeriodicalId":233133,"journal":{"name":"2008 IEEE 21st International Conference on Micro Electro Mechanical Systems","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-01-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124506972","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Mechanically flexible and expandable display with conductive-polymer-coated nylon fabric 机械柔性和可膨胀的显示器与导电聚合物涂层尼龙织物
2008 IEEE 21st International Conference on Micro Electro Mechanical Systems Pub Date : 2008-01-28 DOI: 10.1109/MEMSYS.2008.4443612
S. Takamatsu, K. Matsumoto, I. Shimoyama
{"title":"Mechanically flexible and expandable display with conductive-polymer-coated nylon fabric","authors":"S. Takamatsu, K. Matsumoto, I. Shimoyama","doi":"10.1109/MEMSYS.2008.4443612","DOIUrl":"https://doi.org/10.1109/MEMSYS.2008.4443612","url":null,"abstract":"We developed and characterized a mechanically flexible and expandable display with a conductive-polymer-coated nylon fabric which offers a new class of mechanical robustness on its pixels and electrodes. For mobile information displays such as electronic papers, the mechanical stability to expansion and the function to mechanically magnify the display area are very attractive. For this purpose, we utilized helical-coiled structure of nylon fabric as a substrate and selectively coated an organic conductive polymer of poly(3,4-ethylenedioxythiophene) (PEDOT):polystyrenesulfornate(PSS) on the fabric for constructing the pixels and electrodes of displays. Since the PEDOT:PSS-coated nylon is capable of mechanically expanding its electric wiring not by stretching the conductive film itself, but by changing pitch between coils, the fracture of the electronic materials is prevented under large deformation. The deformation of our structure reached the strain of 1.25 without large increase of the electric resistance. In our developed process of PEDOT:PSS patterning, KMPR photoresist was spontaneously penetrated into the defined area of nylon. The photoresist was lifted off after PEDOT:PSS was coated. Finally, the coloration of both the one pixel on a 4-pixel-display and the cactus shape was demonstrated with their areas expanded at the strain of 0.3.","PeriodicalId":233133,"journal":{"name":"2008 IEEE 21st International Conference on Micro Electro Mechanical Systems","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-01-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131002894","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 7
Nanoporous polymeric structures: Fabrication and applications in biosensing and drug delivery 纳米多孔聚合物结构:制备及其在生物传感和药物传递中的应用
2008 IEEE 21st International Conference on Micro Electro Mechanical Systems Pub Date : 2008-01-28 DOI: 10.1109/MEMSYS.2008.4443755
Wei Yan, V. Hsiao, Yuebing Zheng, T. Huang
{"title":"Nanoporous polymeric structures: Fabrication and applications in biosensing and drug delivery","authors":"Wei Yan, V. Hsiao, Yuebing Zheng, T. Huang","doi":"10.1109/MEMSYS.2008.4443755","DOIUrl":"https://doi.org/10.1109/MEMSYS.2008.4443755","url":null,"abstract":"In this paper, we demonstrate the utilization of an interferometrically created nanoporous polymeric structure as a platform for biosensing and drug delivery applications. Aminopropyltriethoxysilane (APTES)-functionalized nanoporous polymeric gratings was fabricated by combining holographic interference patterning and APTES-functionalization of pre-polymer syrup. The successful detection of multiple biomolecules indicates that the biofunctionalized nanoporous polymeric gratings can act as biosensing platforms which are label-free, inexpensive, and applicable as high-throughput assays. In addition, high-porosity nanoporous polymer thin films were fabricated and used as drug carrier. Our results proved the possibility of using the nanoporous polymer thin films in drug delivery applications.","PeriodicalId":233133,"journal":{"name":"2008 IEEE 21st International Conference on Micro Electro Mechanical Systems","volume":"11 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-01-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129343492","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Variable thermal resistors (VTR) for thermal management of Chip Scale Atomic Clocks (CSAC) 芯片级原子钟(CSAC)热管理的可变热电阻(VTR)
2008 IEEE 21st International Conference on Micro Electro Mechanical Systems Pub Date : 2008-01-28 DOI: 10.1109/MEMSYS.2008.4443790
Hyeun-Su Kim, H. Liao, Hyun Oh Song, T. Kenny
{"title":"Variable thermal resistors (VTR) for thermal management of Chip Scale Atomic Clocks (CSAC)","authors":"Hyeun-Su Kim, H. Liao, Hyun Oh Song, T. Kenny","doi":"10.1109/MEMSYS.2008.4443790","DOIUrl":"https://doi.org/10.1109/MEMSYS.2008.4443790","url":null,"abstract":"This study reports the design and measured performance of a low-power package for thermal control of miniature precision instruments, such as a Chip-Scale Atomic Clock (CSAC) using variable thermal resistors (VTR). VTR is a novel low power temperature regulating platform with thermal isolation structures and an array of vertical electrostatic actuators. A prototype of VTR was fabricated to verify the design and we observed desired thermal resistance variation of ~1000degC/W. To ensure no failure due to fatigue or stiction, long term operation was performed. We also demonstrated the temperature control of a constant power dissipating heater chip with plusmn1degC tolerance using VTR operation.","PeriodicalId":233133,"journal":{"name":"2008 IEEE 21st International Conference on Micro Electro Mechanical Systems","volume":"16 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-01-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131161872","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 16
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