Contact potential difference for sequential assembly and face alignment of submillimeter components

T. Tanemura, Y. Higuchi, T. Kusakabe, K. Sugano, T. Tsuchiya, O. Tabata
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Abstract

We demonstrated a new approach utilizing contact potential difference (CPD) based self-assembly for a future sequential assembly of nano/micro components and face alignment of submillimeter scale components. Two types of experiments realized by CPD were carried out; 1) sequential assembly of silica particles using Coulomb force induced by contacting a silver (Ag) probe on a platinum (Pt) substrate, and 2) face alignment of component with Ag on one face and Pt on the other face on a Pt substrate by CPD induced additional electrostatic adhesive energy. In the face alignment experiment, the measured adhesive energies of two different metal pairs (Pt-Ag and Pt-Pt) were one order smaller than the theoretical value. However, 83 % components were successfully aligned as Pt face up.
接触电位差的顺序装配和面对准的亚毫米组件
我们展示了一种利用接触电位差(CPD)自组装的新方法,用于未来纳米/微组件的顺序组装和亚毫米级组件的面对准。通过CPD实现了两类实验;1)在铂(Pt)衬底上接触银(Ag)探针,利用库仑力诱导二氧化硅颗粒的顺序组装;2)在铂衬底上,通过CPD诱导额外的静电粘接能量,使组件的一面为Ag,另一面为Pt。在表面对准实验中,两种不同金属对(Pt-Ag和Pt-Pt)的粘附能测量值比理论值小一个数量级。然而,83%的组件成功对准Pt面朝上。
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