Physica Status Solidi (c)最新文献

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Optical properties and electronic structures of CuSbS 2 , CuSbSe 2 , and CuSb(S 1−x Se x ) 2 solid solution cusbs2、CuSbSe 2和CuSb(s1−x Se x) 2固溶体的光学性质和电子结构
Physica Status Solidi (c) Pub Date : 2017-06-01 DOI: 10.1002/PSSC.201600196
T. Wada, T. Maeda
{"title":"Optical properties and electronic structures of CuSbS\u0000 2\u0000 , CuSbSe\u0000 2\u0000 , and CuSb(S\u0000 1−x\u0000 Se\u0000 x\u0000 )\u0000 2\u0000 solid solution","authors":"T. Wada, T. Maeda","doi":"10.1002/PSSC.201600196","DOIUrl":"https://doi.org/10.1002/PSSC.201600196","url":null,"abstract":"To clarify electronic structures of CuSbS2, CuSbSe2, and CuSb(S1−xSex)2 solid solutions, these powder samples were synthesized by a mechanochemical process and post-heating. CuSbS2 and CuSbSe2 have indirect and direct band gaps, of which the direct band gaps are a little wider than the indirect band gaps. The ionization energies of CuSb(S1−xSex)2 (0.0 ≤ x ≤ 1.0) powders were measured by photoemission yield spectroscopy (PYS). Energy levels of the valence band maximum (VBM) of the CuSb(S1−xSex)2 samples were estimated from the ionization energies. The electron affinity, energy level of conduction band minimum (CBM), of the CuSb(S1−xSex)2 samples could also be determined by adding the value of the optical band gap to the energy level of the VBM. The energy level of the VBM of the CuSb(S1−xSex)2 system monotonically increases from −5.45 eV for CuSbS2 (x = 0.0) to −5.15 eV for CuSbSe2 (x = 1.0). On the other hand, the energy levels of the indirect CBM of the CuSb(S1−xSex)2 system slightly decrease from −4.05 eV for CuSbS2 to −4.11 eV for CuSbSe2. The energy levels of the direct CBM also slightly decrease from −4.00 eV for CuSbS2 to −4.07 eV for CuSbSe2. We show the band alignment of CuSbS2 (CuSbSe2)-based solar cells with a standard device structure of ZnO/CdS/CuSbS2 (CuSbSe2) absorber.","PeriodicalId":20065,"journal":{"name":"Physica Status Solidi (c)","volume":"3 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2017-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"87778701","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 29
Low band‐gap CuIn(S,Se) 2 thin film solar cells using molecular ink with 9.5% efficiency (Phys. Status Solidi C 6/2017) 使用分子墨水的低带隙CuIn(S,Se) 2薄膜太阳能电池效率为9.5%。Solidi C 6/2017)
Physica Status Solidi (c) Pub Date : 2017-06-01 DOI: 10.1002/PSSC.201770006
Yajie Wang, Xianzhong Lin, Lan Wang, T. Köhler, M. Lux‐Steiner, R. Klenk
{"title":"Low band‐gap CuIn(S,Se)\u0000 2\u0000 thin film solar cells using molecular ink with 9.5% efficiency (Phys. Status Solidi C 6/2017)","authors":"Yajie Wang, Xianzhong Lin, Lan Wang, T. Köhler, M. Lux‐Steiner, R. Klenk","doi":"10.1002/PSSC.201770006","DOIUrl":"https://doi.org/10.1002/PSSC.201770006","url":null,"abstract":"","PeriodicalId":20065,"journal":{"name":"Physica Status Solidi (c)","volume":"38 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2017-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"86550040","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
X‐ray characterization of self‐organized periodic body‐centered tetragonal lattices of SiGe dots SiGe点自组织周期体心四边形晶格的X射线表征
Physica Status Solidi (c) Pub Date : 2017-05-31 DOI: 10.1002/PSSC.201700004
P. Zaumseil, Y. Yamamoto, G. Capellini
{"title":"X‐ray characterization of self‐organized periodic body‐centered tetragonal lattices of SiGe dots","authors":"P. Zaumseil, Y. Yamamoto, G. Capellini","doi":"10.1002/PSSC.201700004","DOIUrl":"https://doi.org/10.1002/PSSC.201700004","url":null,"abstract":"Modern nanotechnology offers new possibilities to create artificial materials such as three-dimensional (3D) ordered island crystals that might be of interest e.g., for optoelectronic applications. We demonstrate that a completely self-organized body-centered tetragonal lattice of SiGe dots can be achieved by reduced pressure chemical vapor deposition (RPCVD). Main subject of this paper is the application of different X-ray diffraction techniques to study the structural properties of a large ensemble of buried SiGe dots with the target to optimize deposition conditions. This includes specular ω-2Θ scans to reveal vertical periodicity and strain state, reciprocal space mapping to determine lateral arrangement and symmetry of dots, and in-plane diffraction to get better inside to the lateral strain distribution close to the surface for further growth simulations. \u0000 \u0000 \u0000 \u0000SEM cross-section images of a SiGe/Si superlattice of imperfect lateral periodic structure of SiGe dots.","PeriodicalId":20065,"journal":{"name":"Physica Status Solidi (c)","volume":"409 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2017-05-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"74983065","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Optical and electronic properties of periodic Si nanostructures 周期性硅纳米结构的光学和电子性质
Physica Status Solidi (c) Pub Date : 2017-05-30 DOI: 10.1002/PSSC.201700093
A. Tavkhelidze, A. Bayramov, Y. Aliyeva, L. Jangidze, G. Skhiladze, S. Asadullayeva, O. Alekperov, N. Mamedov
{"title":"Optical and electronic properties of periodic Si nanostructures","authors":"A. Tavkhelidze, A. Bayramov, Y. Aliyeva, L. Jangidze, G. Skhiladze, S. Asadullayeva, O. Alekperov, N. Mamedov","doi":"10.1002/PSSC.201700093","DOIUrl":"https://doi.org/10.1002/PSSC.201700093","url":null,"abstract":"Nanogratings (NGs) on the surface of the top Si layer of a Si/SiO2/ substrate device structure were prepared using laser interference lithography. Electron transport, photoluminescence, and Raman scattering were then studied on the plain Si and NG Si structures to see the effect of NG introduction. As a result of NG-introduction and very likely G-doping maintenance, all samples studied in this work displayed a 2 to 3 order of magnitude reduction in resistivity for NG Si. The Hall coefficient indicated that electrons are main charge carriers that is also expected for exactly G-doping. Plain Si layer did not show any photoluminescence either for 532 nm (2.38 eV) or 325 nm (3.81 eV) laser excitation. A broad photoluminescence band, composed of a number of almost equidistant peaks was observed on NG Si layer between the photon energies 1.5 and 3.5 eV. Both Stocks and anti-Stocks components for 522.65 cm−1 phonons at room temperature were observed in the Raman spectra of NG Si layer. Estimated from the ratio between the intensities of Stocks and anti-Stocks components, the drop (if any) in phonon gas temperature below ambient (295 K) does not exceed 3 K.","PeriodicalId":20065,"journal":{"name":"Physica Status Solidi (c)","volume":"27 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2017-05-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"83514094","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
Deep level centers in electron‐irradiated silicon crystals doped with copper at different temperatures 掺杂铜的电子辐照硅晶体在不同温度下的深能级中心
Physica Status Solidi (c) Pub Date : 2017-05-24 DOI: 10.1002/PSSC.201600267
N. Yarykin, J. Weber
{"title":"Deep level centers in electron‐irradiated silicon crystals doped with copper at different temperatures","authors":"N. Yarykin, J. Weber","doi":"10.1002/PSSC.201600267","DOIUrl":"https://doi.org/10.1002/PSSC.201600267","url":null,"abstract":"The effect of bombardment with energetic particles on the deep-level spectrum of copper-contaminated silicon wafers is studied by space charge spectroscopy methods. The p-type FZ-Si wafers were doped with copper in the temperature range of 645–750 °C and then irradiated with the 1015 cm−2 fluence of 5 MeV electrons at room temperature. Only the mobile Cui species and the CuPL centers are detected in significant concentrations in the non-irradiated Cu-doped wafers. The properties of the irradiated samples are found to qualitatively depend on the copper in-diffusion temperature Tdiff. For Tdiff > 700 °C, the irradiation partially reduces the Cui concentration and introduces additional CuPL centers while no standard radiation defects are detected. If Tdiff was below ∼700 °C, the irradiation totally removes the mobile Cui species. Instead, the standard radiation defects and their complexes with copper appear in the deep-level spectrum. A model for the defects reaction scheme during the irradiation is derived and discussed. \u0000 \u0000DLTS spectrum of the Cu-contaminated and then irradiated silicon qualitatively depends on the copper in-diffusion temperature.","PeriodicalId":20065,"journal":{"name":"Physica Status Solidi (c)","volume":"1 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2017-05-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"91024687","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Spectroscopic planar diffraction ellipsometry of Si‐based multilayer structure with subwavelength grating 基于亚波长光栅的硅基多层结构的平面衍射椭偏光谱
Physica Status Solidi (c) Pub Date : 2017-05-23 DOI: 10.1002/PSSC.201700092
N. Mamedov, A. Tavkhelidze, A. Bayramov, K. Akhmedova, Y. Aliyeva, G. Eyyubov, L. Jangidze, G. Skhiladze
{"title":"Spectroscopic planar diffraction ellipsometry of Si‐based multilayer structure with subwavelength grating","authors":"N. Mamedov, A. Tavkhelidze, A. Bayramov, K. Akhmedova, Y. Aliyeva, G. Eyyubov, L. Jangidze, G. Skhiladze","doi":"10.1002/PSSC.201700092","DOIUrl":"https://doi.org/10.1002/PSSC.201700092","url":null,"abstract":"Spectroscopic ellipsometry has been applied at room temperature to a multilayer device structure with plain and nanograting-embedded Si layer on the top. In both cases, the real and imaginary parts of the complex dielectric function of the top layer have been retrieved. In nanograting case, ellipsometric data were collected in planar diffraction geometry. A profound change in dielectric function in the photon energy region between 1.5 and 3.5 eV is established for nanograting-embedded Si layer compared to plain Si layer. Both real and imaginary parts of the former are no longer Si-like and resemble more those for metals. The maximum of interband density-of-states for optical transitions is positioned at 2.1 eV and coincides with the energy of optical transitions from the main irradiative eigenstate. The obtained results are discussed in terms of geometry-induced doping changes in interband density of states.","PeriodicalId":20065,"journal":{"name":"Physica Status Solidi (c)","volume":"158 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2017-05-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"74803105","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 5
Influence of irradiation on mechanical properties of Si‐Ge alloys 辐照对Si - Ge合金力学性能的影响
Physica Status Solidi (c) Pub Date : 2017-05-23 DOI: 10.1002/PSSC.201700123
A. Sichinava, G. Bokuchava, G. Chubinidze, N. Gapishvili, Giorgi Archuadze
{"title":"Influence of irradiation on mechanical properties of Si‐Ge alloys","authors":"A. Sichinava, G. Bokuchava, G. Chubinidze, N. Gapishvili, Giorgi Archuadze","doi":"10.1002/PSSC.201700123","DOIUrl":"https://doi.org/10.1002/PSSC.201700123","url":null,"abstract":"Impact of various irradiation (Ar and He ions, high energy electrons) on microhardness and indentation of monocrystalline Si0,98Ge0,02 alloy is studied. Samples of Si and SiGe alloy are obtained by Czochralski (CZ) method in the [111] direction in the atmosphere of high purity Ar. High energy electron irradiation with fluence of ∼1012 cm−2 is conducted at the Clinac 2100iX. Ar and He ion implantation is performed on modernized “VEZUVI-3M” plant. It is shown that for all types of irradiation the microhardness and indentation modulus versus load are characterized by reverse indentation size effect (ISE). With the increase of fluences of Ar and He ions, the maximum value of the effect increases. At high values of loading force impact on the indenter the mechanical characteristics slowly decrease. Impact of isochronous thermal annealing on mechanical properties of high energy electron irradiated samples is studied. Non-monotonic changes of microhardness and indentation modulus are revealed in the temperature range of 200–260 °C. It is proposed that such changes are caused by radiation defects transformation.","PeriodicalId":20065,"journal":{"name":"Physica Status Solidi (c)","volume":"3 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2017-05-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"86555738","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
High amplitude internal friction in monocrystalline germanium‐doped silicon 单晶掺锗硅的高振幅内摩擦
Physica Status Solidi (c) Pub Date : 2017-05-22 DOI: 10.1002/PSSC.201700107
I. Kurashvili, G. Darsavelidze, G. Bokuchava
{"title":"High amplitude internal friction in monocrystalline germanium‐doped silicon","authors":"I. Kurashvili, G. Darsavelidze, G. Bokuchava","doi":"10.1002/PSSC.201700107","DOIUrl":"https://doi.org/10.1002/PSSC.201700107","url":null,"abstract":"The internal friction and shear modulus of the monocrystalline Si-Ge alloys with Ge with 0.5 to 2 at.% content grown by Czochralski technique were studied as functions of strain amplitude at the temperatures of 20 and 600 °C. It is shown that internal friction and shear modulus are characterized by one critical value of strain amplitude at which dislocation segments breakaway from weak point centers begins. Measurements at 600 °C show additional second critical strain amplitude and intensive hysteresis-type change of the internal friction and shear modulus in high strain amplitude range. First and second critical strain amplitudes reveal the tendency of reduction with Ge content increase in Si-Ge alloys.","PeriodicalId":20065,"journal":{"name":"Physica Status Solidi (c)","volume":"1 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2017-05-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"75331495","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Nickel in silicon: Room‐temperature in‐diffusion and interaction with radiation defects 硅中的镍:室温扩散和与辐射缺陷的相互作用
Physica Status Solidi (c) Pub Date : 2017-05-18 DOI: 10.1002/PSSC.201700005
N. Yarykin, J. Weber
{"title":"Nickel in silicon: Room‐temperature in‐diffusion and interaction with radiation defects","authors":"N. Yarykin, J. Weber","doi":"10.1002/PSSC.201700005","DOIUrl":"https://doi.org/10.1002/PSSC.201700005","url":null,"abstract":"Nickel is incorporated into silicon wafers during chemomechanical polishing in an alkaline Ni-contaminated slurry at room temperature. The nickel in-diffusion is detected by DLTS depth profiles of a novel Ni183 level, which is formed due to a reaction between the diffusing nickel and the VO centers introduced before the polishing. The Ni183 profile extends up to 10 μm after a 2 min polishing. The available data provide a lower estimate for the room-temperature nickel diffusivity DNi > 10−9 cm2 s−1.","PeriodicalId":20065,"journal":{"name":"Physica Status Solidi (c)","volume":"335 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2017-05-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"76907697","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 6
Dislocation trails in Si: Geometry and electrical properties Si中的位错轨迹:几何和电学性质
Physica Status Solidi (c) Pub Date : 2017-05-11 DOI: 10.1002/PSSC.201700074
V. Orlov, E. Yakimov, N. Yarykin
{"title":"Dislocation trails in Si: Geometry and electrical properties","authors":"V. Orlov, E. Yakimov, N. Yarykin","doi":"10.1002/PSSC.201700074","DOIUrl":"https://doi.org/10.1002/PSSC.201700074","url":null,"abstract":"Dislocation trails, the quasi-2D defects left behind gliding dislocations, are studied in terms of the dislocation motion geometry. The individual dislocation half-loops are introduced in silicon crystals at 600 °C from the sources on the tensile {100} surface. The electrically active dislocations and dislocation trails are revealed by their recombination activity using the LBIC and EBIC techniques. It is found that only one 60° segment of the dislocation half-loop creates the dislocation trail, while the screw and differently aligned 60° segments do not. Reversal of the dislocation motion is observed to alternate the role of the 60° segments in the dislocation trail formation. All results are consistent with the model which assumes that the electrically active dislocation trails are created by the dissociated 60° dislocation with the 90° leading partial. \u0000 \u0000LBIC image of the defects formed by expansion of the dislocation half-loops created from the tensile {100} silicon surface.","PeriodicalId":20065,"journal":{"name":"Physica Status Solidi (c)","volume":"217 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2017-05-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"85869957","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
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