Site selective doping of Zn for the p ‐type Cu(In,Ga)Se 2 thin film for solar cell application

S. Shirakata
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引用次数: 3

Abstract

Selective doping of a Zn impurity at the group III site in a Cu(In, Ga)Se2 (CIGS) film was performed by the doping of Zn at the first stage of the three-stage method. The p-type CIGS:Zn film was obtained, which is in contrast to the n-type CIGS:Zn film obtained by the Zn impurity doping at the second and third-stages. Based on excitation intensity dependence of photoluminescence (PL) at low-temperature, the change in the acceptor level was observed. The enhancement of carrier concentration as a result of Zn-doping in the p-type CIGS:Zn film was observed. The CIGS:Zn solar cells exhibited η of 14.5% and Voc of 0.658 V, which are higher than that of the corresponding solar cells using the undoped CIGS films
太阳能电池用p型Cu(In,Ga)Se 2薄膜Zn的选择性掺杂
在三阶段方法的第一阶段,在Cu(in, Ga)Se2 (CIGS)薄膜的III基位置选择性掺杂Zn杂质。得到了p型CIGS:Zn薄膜,这与在第二和第三阶段掺杂Zn杂质得到的n型CIGS:Zn薄膜形成了对比。根据低温下光致发光(PL)的激发强度依赖性,观察了受体能级的变化。在p型CIGS:Zn薄膜中掺杂Zn后,载流子浓度提高。CIGS:Zn太阳电池的η值为14.5%,Voc值为0.658 V,均高于未掺杂CIGS薄膜的太阳电池
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