Journal of Vacuum Science & Technology A最新文献_第5页

Density functional theory calculations of mechanical and electronic properties of W1−xTaxN6, W1−xMoxN6, and Mo1−xTaxN6 (0 ≤ x ≤ 1) alloys in a hexagonal structure W1−xTaxN6、W1−xMoxN6和Mo1−xTaxN6(0≤x≤1)六方结构合金力学和电子性能的密度泛函理论计算

3区材料科学

Journal of Vacuum Science & Technology A Pub Date : 2023-10-26 DOI: 10.1116/6.0002923

S. R. Kandel, D. Gall, S. V. Khare

引用次数: 0

Ultrathin VO2 grown with oxygen plasma molecular beam epitaxy on TiO2 (001) and Al2O3 (0001) 氧等离子体分子束外延在TiO2(001)和Al2O3(0001)上生长超薄VO2

3区材料科学

Journal of Vacuum Science & Technology A Pub Date : 2023-10-25 DOI: 10.1116/6.0003096

Alyson Spitzig, Jennifer E. Hoffman, Jason D. Hoffman

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Standing wave patterns in graphene systems studied using scanning tunneling spectroscopy 用扫描隧道光谱研究石墨烯系统中的驻波模式

3区材料科学

Journal of Vacuum Science & Technology A Pub Date : 2023-10-19 DOI: 10.1116/6.0003075

Won-Jun Jang, Min Hui Chang, Min Jeong Kang, Young Jae Song, Se-Jong Kahng

引用次数: 0

Core-shell metallic nanotube arrays for highly sensitive surface-enhanced Raman scattering (SERS) detection 用于高灵敏度表面增强拉曼散射(SERS)检测的核壳金属纳米管阵列

3区材料科学

Journal of Vacuum Science & Technology A Pub Date : 2023-10-17 DOI: 10.1116/6.0003055

Jinn P. Chu, Yi-Jui Yeh, Chih-Yu Liu, Yi-Xiang Yang, Alfreda Krisna Altama, Ting-Hao Chang, Wei-Hung Chiang, Pakman Yiu, Kuo-Lun Tung

{"title":"Core-shell metallic nanotube arrays for highly sensitive surface-enhanced Raman scattering (SERS) detection","authors":"Jinn P. Chu, Yi-Jui Yeh, Chih-Yu Liu, Yi-Xiang Yang, Alfreda Krisna Altama, Ting-Hao Chang, Wei-Hung Chiang, Pakman Yiu, Kuo-Lun Tung","doi":"10.1116/6.0003055","DOIUrl":"https://doi.org/10.1116/6.0003055","url":null,"abstract":"Here, we demonstrate the application of highly ordered, periodic Ag/Au core-shell triangle nanotube arrays as an ultrasensitive and low-cost surface-enhanced Raman scattering (SERS) substrate for the first time. The arrays of core-shell nanotube, with an outer diameter of 1.5 μm, were fabricated using top-down wafer-scale lithography followed by sequential sputter deposition of Ag and Au. The SERS activity of various combinations of core-shell structures was evaluated. It was found that Ag-core nanotubes overlaid with the Au-shell resulted in the highest Raman intensity, where the enhancement factor for R6G as a probe molecule is determined to be 1.38 × 107. Meanwhile, the limit of detections for R6G and ketoprofen analytes was evaluated to be 10−10 and 10−6 M, respectively. Linear correlations between the SERS signal intensities and logarithmical scale of both analytes in different concentrations were also established, ranging 10−4–10−10 and 10−2–10−6 M for R6G and ketoprofen, respectively. The Raman R6G peak intensity mapping suggests our metal nanotube arrays act as effective plasmonic hotspots and, thus, are useful for SERS sensing applications.","PeriodicalId":17490,"journal":{"name":"Journal of Vacuum Science & Technology A","volume":"23 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-10-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"136033516","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Investigation of mechanical and microstructural properties of sputter-deposited Zr-Ni3Al coatings 溅射沉积Zr-Ni3Al涂层的力学和显微组织性能研究

3区材料科学

Journal of Vacuum Science & Technology A Pub Date : 2023-10-17 DOI: 10.1116/6.0003022

Sunil Kumar Tiwari, Akula Umamaheswara Rao, Archana Singh Kharb, Vipin Chawla, Neha Sardana, Devesh Kumar Avasthi, Amit Kumar Chawla

引用次数: 1

Mechanistic analysis on low temperature thermal atomic layer deposition of nitrides utilizing H2S 利用H2S低温热原子层沉积氮化物的机理分析

3区材料科学

Journal of Vacuum Science & Technology A Pub Date : 2023-10-16 DOI: 10.1116/6.0003041

Jinwoo Lee, Soo Hyun Lee, Bonggeun Shong

引用次数: 0

Ternary Ga–Sn–O and quaternary In–Ga–Sn–O channel based thin film transistors fabricated by plasma-enhanced atomic layer deposition 等离子体增强原子层沉积制备三元Ga-Sn-O和四元In-Ga-Sn-O沟道薄膜晶体管

3区材料科学

Journal of Vacuum Science & Technology A Pub Date : 2023-10-16 DOI: 10.1116/6.0003004

Jong Hyeon Won, Hyeonhui Jo, Pil Ju Youn, Bo Keun Park, Taek-Mo Chung, Jeong Hwan Han

{"title":"Ternary Ga–Sn–O and quaternary In–Ga–Sn–O channel based thin film transistors fabricated by plasma-enhanced atomic layer deposition","authors":"Jong Hyeon Won, Hyeonhui Jo, Pil Ju Youn, Bo Keun Park, Taek-Mo Chung, Jeong Hwan Han","doi":"10.1116/6.0003004","DOIUrl":"https://doi.org/10.1116/6.0003004","url":null,"abstract":"Amorphous In–Ga–Sn–O (IGTO), as an n-type amorphous oxide semiconductor, has attracted interest owing to its potential applications to the vertical NAND or 3D DRAM channels as well as in high-mobility thin-film transistors (TFTs) for high-resolution displays. In this study, ternary Ga–Sn–O (GTO) and quaternary IGTO films were deposited through plasma-enhanced atomic layer deposition (PEALD) at 200 °C, using dimethyl(N-ethoxy-2,2-dimethylcarboxylicpropanamide)indium, trimethylgallium, and bis(1-dimethylamino-2-methyl-2-propoxide)tin as the In, Ga, and Sn precursors, respectively. First, GTO films were fabricated through PEALD with varying Ga2O3:SnO2 subcycle ratios. The remarkable evolutions of the microstructure and electrical properties of the PEALD GTO films were observed depending on the Ga/Sn cationic ratio. Subsequently, the growth characteristics of the quaternary PEALD IGTO films were examined by introducing In2O3 subcycles, and the In:Ga:Sn cationic composition was precisely engineered by varying the ratios of In2O3, SnO2, and Ga2O3 subcycles in the IGTO deposition process. Composition-controlled IGTO bottom gate staggered-type TFTs were fabricated, and their electrical performance was evaluated depending on the In:Ga:Sn cationic composition of the IGTO channel layer. The optimized TFT with the In0.38Ga0.32Sn0.30Ox film exhibited a high field-effect mobility of 22.5 cm2/V s, turn-on voltage of −4.4 V, and subthreshold swing of 0.26 V/dec.","PeriodicalId":17490,"journal":{"name":"Journal of Vacuum Science & Technology A","volume":"136 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-10-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"136112711","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Ordered deficient perovskite La2/3TiO3 films grown via molecular beam epitaxy 分子束外延法制备有序缺陷钙钛矿La2/3TiO3薄膜

3区材料科学

Journal of Vacuum Science & Technology A Pub Date : 2023-10-12 DOI: 10.1116/6.0003091

Joan Weng, Hyungki Shin, Simon Godin, Mohamed Oudah, Ronny Sutarto, Rebecca Pons, Bruce A. Davidson, Ke Zou

{"title":"Ordered deficient perovskite La2/3TiO3 films grown via molecular beam epitaxy","authors":"Joan Weng, Hyungki Shin, Simon Godin, Mohamed Oudah, Ronny Sutarto, Rebecca Pons, Bruce A. Davidson, Ke Zou","doi":"10.1116/6.0003091","DOIUrl":"https://doi.org/10.1116/6.0003091","url":null,"abstract":"As the parent compound of a promising solid electrolyte material Li3xLa2/3−xTiO3, the perovskite La2/3TiO3 has potential for advancing research on Li-intercalated ionic conductors. Epitaxial La2/3TiO3 films have been grown by molecular beam epitaxy using a growth process consisting of deposition and annealing cycles, with in situ monitoring by electron diffraction. X-ray absorption spectroscopy confirms the tetravalent state of Ti in La2/3TiO3, and the as-grown films are insulating. X-ray diffraction reveals the presence of half-order peaks, indicating a doubling of the pseudocubic perovskite unit cell due to the ordering of La vacancies in alternating A-site layers. These results demonstrate that single-phase, vacancy-ordered epitaxial films of La2/3TiO3 can be stabilized with excellent crystalline and electronic properties over wafer-sized areas, making possible Li-ion intercalation studies in films with well-defined domain boundary properties. Such boundaries are known to profoundly influence Li-ion conduction within the material. Understanding the effects of domain boundaries on Li-ion conduction could lead to improvements in solid-state battery technology and pave the way for the development of more efficient and safer energy storage devices.","PeriodicalId":17490,"journal":{"name":"Journal of Vacuum Science & Technology A","volume":"25 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-10-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"136012827","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Tribological behavior and wear mechanism of nanomultilayer AlCrN/AlTiSiN coatings at elevated temperatures 高温下纳米多层AlCrN/AlTiSiN涂层的摩擦学行为及磨损机理

3区材料科学

Journal of Vacuum Science & Technology A Pub Date : 2023-10-12 DOI: 10.1116/6.0003019

Baijun Xiao, Teng Fei Zhang

{"title":"Tribological behavior and wear mechanism of nanomultilayer AlCrN/AlTiSiN coatings at elevated temperatures","authors":"Baijun Xiao, Teng Fei Zhang","doi":"10.1116/6.0003019","DOIUrl":"https://doi.org/10.1116/6.0003019","url":null,"abstract":"Wear resistance is a critical property of tool coatings for high-speed machining, which depends on mechanical properties and oxidation resistance of the coatings. Many works have demonstrated that AlTiSiN coating has good mechanical properties. Additionally, AlCrN coating exhibits excellent oxidation resistance. The multilayered structure has proved to improve comprehensive properties of the coatings. Therefore, AlCrN/AlTiSiN multilayer coating has a high potential to be used in machining applications. This paper focuses on the high-temperature tribological behavior of AlCrN/AlTiSiN multilayer coating. The results show that AlCrN/AlTiSiN coating exhibits good to acceptable wear resistance up to 800 °C. Meanwhile, AlCrN/AlTiSiN coating also displays the lowest friction coefficient of ∼0.5 and a wear rate of 1.8 × 10−6 mm3/N m at 800 °C, which is about 58.13% and 64.0% lower than that of AlCrN and AlTiSiN coatings, respectively. The imaging and composition analysis of the high-temperature wear tracks allowed for explaining the differences in wear mechanisms. At 800 °C, a dense thin tribofilm is formed on the surface of AlCrN/AlTiSiN coating, which acts as a glaze layer to impede wear. It provides a strategy for enhancing the wear resistance of monolayer coating in high temperatures, which combines the advantages of both high oxidation resistance of one layer and high hardness of the other layer.","PeriodicalId":17490,"journal":{"name":"Journal of Vacuum Science & Technology A","volume":"44 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-10-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"136013007","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Stannane in extreme ultraviolet lithography and vacuum technology: Synthesis and characterization 紫外光刻与真空技术中的锡烷:合成与表征

3区材料科学

Journal of Vacuum Science & Technology A Pub Date : 2023-10-10 DOI: 10.1116/6.0002980

Raquel Garza, Nathan Bartlett, Jameson Crouse, Andrew Herschberg, R. Mohan Sankaran, Md. Amzad Hossain, David N. Ruzic

{"title":"Stannane in extreme ultraviolet lithography and vacuum technology: Synthesis and characterization","authors":"Raquel Garza, Nathan Bartlett, Jameson Crouse, Andrew Herschberg, R. Mohan Sankaran, Md. Amzad Hossain, David N. Ruzic","doi":"10.1116/6.0002980","DOIUrl":"https://doi.org/10.1116/6.0002980","url":null,"abstract":"In extreme ultraviolet (EUV) lithography, tin droplets evaporate and subsequently coat various surfaces including the collector mirrors. To clean off the tin, a hydrogen plasma is often used, but as a result, an unstable by-product, stannane (SnH4) is formed. The physicochemical characteristics of this gas, its formation in a plasma process, and its interaction with various materials have not been explored and understood completely. Here, the electron ionization mass spectrum of SnH4 is presented. All ten natural abundance isotopes were observed experimentally for each fragment, i.e., Sn+, SnH+, SnH2+, and SnH3+. Density functional electronic structure theory was used to calculate the optimized ground state geometries of these gas phase species and their relative stabilities and helped explain the absence of SnH4+ in the observed signals. The density of the liquid, its cracking pattern, and the surface morphology of its deposits were examined. The surface of the deposited tin film resulting from the decomposition and subsequent oxidation was characterized by x-ray photoelectron spectroscopy. The main species found at the surface were metallic tin and tin (II) oxide (SnO). The detailed characterization of stannane should help correctly identify it in EUV lithographic processes and develop approaches in the future to mitigate its decomposition and redeposition on the collector mirrors or vacuum chamber walls.","PeriodicalId":17490,"journal":{"name":"Journal of Vacuum Science & Technology A","volume":"27 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-10-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"136352789","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0