Journal of Vacuum Science & Technology A最新文献

{"title":"Formation of thin films via cold-rolled/annealed nickel sputtering targets","authors":"Sixie Li, Ming Wen, Chuanjun Wang, Yiqing Wang, Yue Shen","doi":"10.1116/6.0003033","DOIUrl":"https://doi.org/10.1116/6.0003033","url":null,"abstract":"Nickel (Ni) thin films are commonly used in the integrated circuit field. Magnetron sputtering is a common method for thin film deposition, and the sputtering target is the key raw material in the magnetron sputtering process. In this work, cold-rolled and annealed Ni targets were prepared. The microstructures and magnetic properties of the Ni targets were analyzed. Then, Ni films were prepared by direct current magnetron sputtering with the above two Ni targets. The Ni films were characterized by scanning electron microscopy, atomic force microscopy, grazing incidence x-ray diffraction, x-ray reflectivity, and four-probe testing. Finally, the surface morphologies of the targets were compared before and after sputtering, and the relationships between the Ni targets and the Ni films were discussed. The results show that with the same conditions, the annealed Ni target is more efficiently utilized, and the electrical properties of the Ni films are good when the film is macrostructurally smooth and microstructurally compact. This is due to the target texture, magnetic properties, etc.","PeriodicalId":17490,"journal":{"name":"Journal of Vacuum Science & Technology A","volume":"2015 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-10-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"136353392","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Phase composition of polycrystalline HfNx (0.45 ≤ x ≤ 1.60) and effects of low-energy ion irradiation on microstructure, texture, and physical properties","authors":"Hwan-Seok Seo, Taeyoon Lee, Hyungjun Kim, Ivan Petrov, J. E. Greene","doi":"10.1116/6.0003072","DOIUrl":"https://doi.org/10.1116/6.0003072","url":null,"abstract":"We have investigated the phase composition of HfNx as a function of x and the effects of low-energy ion irradiation on the microstructure and physical properties of polycrystalline layers grown on SiO2 at 350 °C by ultrahigh vacuum reactive dc magnetron sputtering of Hf in mixed N2/Ar discharges. X-ray diffraction and Rutherford backscattering spectrometry results show that the phases obtained in polycrystalline HfNx layers with increasing x are hcp-structure α-Hf:N (x ≲ 0.6); multiphase mixtures consisting of α-Hf, NaCl-structure δ-HfN, rhombohedral ɛ-Hf3N2, and/or ζ-Hf4N3 (0.6 ≲ x ≲ 0.9); δ-HfN single phase (0.9 ≲ x ≲ 1.3); and mixtures of δ-HfN and higher nitrides (x ≳ 1.3). HfNx layers with 0.9 ≲ x ≲ 1.2 grown under mild ion irradiation (incident ion energy Ei ≃ 7 eV and ion-to-Hf flux ratios Ji/JHf = 1−3) are underdense with mixed orientation, low in-plane stress, and rough surface morphology due to limited adatom mobilities resulting in kinetic roughening and atomic shadowing during film growth. However, the use of intense ion irradiation (Ei = 25 eV and Ji/JHf = 4−20) results in HfNx layers, which are fully dense with strongly 111-oriented texture, compressive in-plane stress, and smooth surfaces due to ion irradiation enhanced adatom surface mobilities. In addition, the latter films have lower resistivity and higher hardness. For stoichiometric δ-HfN layers, ρ decreases from 69.7 to 35.2 μΩ cm and H increases from 22.1 to 27.4 GPa, with increasing ion-irradiation intensity. However, for HfNx layers with 1.2 ≲ x ≲ 1.6, the correspondingly higher steady state atomic N surface coverages during deposition alter growth kinetics in favor of 001 texture with a fully dense structure and compressive in-plane stress.","PeriodicalId":17490,"journal":{"name":"Journal of Vacuum Science & Technology A","volume":"249 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-10-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"136353242","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Effects of duty cycle and nitrogen flow rate on the mechanical properties of (V,Mo)N coatings deposited by high-power pulsed magnetron sputtering","authors":"Yiqun Feng, Tsai-Fu Chung, Chien-Nan Hsiao, Jia-Hong Huang","doi":"10.1116/6.0003006","DOIUrl":"https://doi.org/10.1116/6.0003006","url":null,"abstract":"(V,Mo)N is theoretically predicted to have high hardness and fracture toughness and is a promising material for the application on protective hard coatings. However, the toughness enhancement of (V,Mo)N coatings deposited by dc-unbalanced magnetron sputtering (dc-UBMS) was not as remarkable as expected. The issue could be due to insufficient energy delivery to the plasma species in the deposition process such that nitrogen and metal atoms were not fully reacted and led to the degradation of coating quality. Since high-power pulsed magnetron sputtering (HPPMS) can provide high peak power density, the method was selected to deposit (V,Mo)N coatings in this research. The objective of this study was to investigate the effects of duty cycle and nitrogen flow rate on the microstructure and mechanical properties of (V,Mo)N coatings deposited on Si substrates by HPPMS. Four sets of (V,Mo)N coatings were deposited by HPPMS at different durations with two duty cycles, 5% and 3%, and two nitrogen flow rates, 6.0 and 12.0 SCCM. The results showed that the N/metal ratio was mainly affected by the nitrogen flow rate, ranging from 0.70 to 0.96 with increasing nitrogen flow rate. The lattice parameter of the samples linearly increased with the N/metal ratio. The x-ray diffraction (XRD) patterns revealed that all samples tended to approach (200)-preferred orientation with increasing deposition duration. The glancing incident XRD patterns indicated that the samples deposited at 6 SCCM nitrogen flow rate and 3% duty cycle have multiphases. Transmission electron microscopy analysis confirmed that phase separation from (V,Mo)N to (V-rich,Mo)N and (V,Mo-rich)N occurred in those samples. The hardness of the (V,Mo)N coatings decreased with increasing N/metal ratio, which may be related to the N-vacancy hardening effect. The sample deposited at 6 SCCM nitrogen flow rate and 3% duty cycle for 36 h showed the highest hardness of 28.4 GPa, which was possibly associated with the phase separation, and hence plastic deformation became difficult. The fracture toughness (Gc) of the (V,Mo)N coatings was evaluated using the internal energy-induced cracking method. The resultant Gc of the (V,Mo)N coatings, ranging from 36.1 to 43.7 J/m2, was higher than that of the coatings deposited by dc-UBMS in our previous study. The toughness enhancement could be caused by a higher fraction of Mo–N bonding due to the adequate reaction energy provided by the HPPMS process.","PeriodicalId":17490,"journal":{"name":"Journal of Vacuum Science & Technology A","volume":"53 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-10-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"135142191","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Stabilization of the tetragonal phase in ZrO2 thin films according to ozone concentration using atomic layer deposition","authors":"Seokhwi Song, Eungju Kim, Kyunghoo Kim, Jangho Bae, Jinho Lee, Chang Hwa Jung, Hanjin Lim, Hyeongtag Jeon","doi":"10.1116/6.0002901","DOIUrl":"https://doi.org/10.1116/6.0002901","url":null,"abstract":"In this study, we investigated the crystallographic and electrical properties of ZrO2 thin films prepared by an ozone-based atomic layer deposition process. Cyclopentadienyl tris(dimethylamino) zirconium [CpZr(NMe2)3] was used as the Zr precursor, and O3 was used as the reactant. ZrO2 films were produced using O3 in various concentrations from 100 to 400 g/m3. These thin films were used to fabricate metal–oxide–semiconductor capacitors, whose electrical properties were evaluated and correlated with crystallographic analysis. As the O3 concentration increased, the tetragonal phase of the ZrO2 film stabilized and the dielectric constant improved. However, the leakage current density characteristics concurrently deteriorated due to the high concentration of O3, increasing the number of grain boundaries in the ZrO2 film by increasing crystallinity. Thus, the concentration of O3 can control the number of OH groups of the ZrO2 film, affecting the device characteristics.","PeriodicalId":17490,"journal":{"name":"Journal of Vacuum Science & Technology A","volume":"57 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-10-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"135141344","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"LixCoyOz thin-films deposition through thermal atomic layer deposition","authors":"Antoine Peisert, Noureddine Adjeroud, Damien Lenoble, Guillaume Lamblin","doi":"10.1116/6.0002863","DOIUrl":"https://doi.org/10.1116/6.0002863","url":null,"abstract":"3D-Li ion batteries are identified as one of the most promising technologies for improving portable and safe energy storage devices. One of the main remaining challenges to be tackled in that regard is the manufacture of efficient nanostructured electrode materials. In this paper, we report on the first realization of an electrochemically active cathodic LixCoyOz material grown via a thermal atomic layer deposition process based on the combination of Co(thd)2 and Li(thd) organometallic ligands and O3 as an oxidizing agent. Comprehensive characterizations comprising XPS, Raman, HIM (helium ion microscopy)-SIMS, and the first ever SEM images of a thermal-atomic layer deposition (ALD) deposited LixCoyOz material are shown and discussed as well and the very first electrochemical results to attest the electrochemical activity of the deposited material. Those results act as the first demonstration that lithiated materials and more precisely, LixCoyOz, can be grown via an advanced thermal ALD.","PeriodicalId":17490,"journal":{"name":"Journal of Vacuum Science & Technology A","volume":"213 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-10-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"135350926","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Chemical significance of x-ray photoelectron spectroscopy binding energy shifts: A Perspective","authors":"Paul S. Bagus, Connie J. Nelin, C. R. Brundle","doi":"10.1116/6.0003081","DOIUrl":"https://doi.org/10.1116/6.0003081","url":null,"abstract":"The principal intent of this Perspective is to review the mechanisms that are responsible for the shifts of binding energies, ΔBE, observed in x-ray photoelectron spectroscopy (XPS) measurements and so to relate the shifts to the electronic structure and the chemical bonding in the systems studied. To achieve this goal, several theoretical considerations are necessary beyond just the calculation of XPS BEs. Though briefly discussed here, we are not primarily interested in absolute values of BE or quantitation using relative intensities. Within the molecular orbital (MO) theory framework, it is shown that the analysis of orbital properties is critical for the correct interpretation of XPS. In particular, rigorous definitions are given for the initial state and final state contributions to BEs and to BE shifts, ΔBE. It is first shown how the BEs of core levels are related to the electronic structure by consideration of the BEs for a model atomic system to establish the origins and magnitudes of BE shifts. The mechanisms established for the model system are then applied to a review of XPS measurements and MO theory on a set of real examples. An important focus of the paper is to demonstrate that, in many cases, initial state mechanisms allow for a definitive interpretation of the XPS BE shifts and that an important role of theory is to provide qualitative explanations rather than quantitative agreement with XPS measurements. The mechanisms established are a guide to the interpretation of XPS measurements and consideration of these mechanisms may suggest additional calculations that would be useful. It is concluded that there is still a bright future for the coupling of ab initio MO theory with XPS measurements.","PeriodicalId":17490,"journal":{"name":"Journal of Vacuum Science & Technology A","volume":"5 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-10-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"135350759","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Molecular dynamics simulation of amine formation in plasma-enhanced chemical vapor deposition with hydrocarbon and amino radicals","authors":"Anjar Anggraini Harumningtyas, Tomoko Ito, Michiro Isobe, Lenka Zajíčková, Satoshi Hamaguchi","doi":"10.1116/6.0002978","DOIUrl":"https://doi.org/10.1116/6.0002978","url":null,"abstract":"Molecular dynamics simulations were performed to examine the amine formation in carbon-based polymer films deposited by plasma-enhanced chemical vapor deposition (PECVD) with methane (CH4) and nitrogen (N2) gases. In the simulations, the interactions between the deposited film surface and incident precursors were examined, where nitrogen species were assumed to be supplied only as amino radicals (NH2) such that the amount of primary amine (−NH2) could be maximized in the deposited film. Carbon was supplied as CH2 or CH3 radicals as well as CH2+ or CH3+ ions with an ion kinetic energy up to 100 eV, as typical in such PECVD experiments. It has been found that, even under such “ideal” conditions for the maximum primary-amine content, hydrogen (H) atoms of incident NH2 radicals tend to be transferred to surrounding C atoms in the polymerization process, leaving a relatively small amount of primary amine (the concentration ratio of primary amino groups NH2 to nitrogen atoms N ∼10%) in the deposited polymer films. The simulation results indicate that an increase of NH2 radicals in the gas phase of PECVD hardly increases the primary-amine content in the deposited films and, therefore, the primary-amine content may not depend strongly on the plasma conditions as long as a sufficient amount of nitrogen and hydrogen is supplied during the plasma polymerization process. The primary-amine content predicted by the simulations was found to be consistent with earlier experimental observations.","PeriodicalId":17490,"journal":{"name":"Journal of Vacuum Science & Technology A","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-10-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"135351961","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"High-mass metal ion irradiation enables growth of high-entropy sublattice nitride thin films from elemental targets","authors":"Vladyslav Rogoz, Oleksandr Pshyk, Bartosz Wicher, Justinas Palisaitis, Jun Lu, Daniel Primetzhofer, Ivan Petrov, Lars Hultman, Grzegorz Greczynski","doi":"10.1116/6.0003065","DOIUrl":"https://doi.org/10.1116/6.0003065","url":null,"abstract":"Synthesis of high-entropy sublattice nitride (HESN) coatings by magnetron sputtering is typically done using custom-made alloyed targets with specific elemental compositions. This approach is expensive, requires long delivery times, and offers very limited flexibility to adjust the film composition. Here, we demonstrate a new method to grow HESN films, which relies on elemental targets arranged in the multicathode configuration with substrates rotating during deposition. TiVNbMoWN films are grown at a temperature of ∼520 °С using Ti, V, Nb, and Mo targets operating in the direct current magnetron sputtering mode, while the W target, operated by high power impulse magnetron sputtering (HiPIMS), provides a source of heavy ions. The energy of the metal ions EW+ is controlled in the range from 80 to 620 eV by varying the amplitude of the substrate bias pulses Vs, synchronized with the metal-ion-rich phase of HiPIMS pulses. We demonstrate that W+ irradiation provides dynamic recoil mixing of the film-forming components in the near-surface atomic layers. For EW+ ≥ 320 eV the multilayer formation phenomena, inherent for this deposition geometry, are suppressed and, hence, compositionally uniform HESN films are obtained, as confirmed by the microstructural and elemental analysis.","PeriodicalId":17490,"journal":{"name":"Journal of Vacuum Science & Technology A","volume":"34 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-10-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"135481364","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Oxygen plasma treatment of TeO2—B2O3 (boro-tellurite) thin films","authors":"Uğur Demirkol, Çağrı Durmuş, Tamer Akan","doi":"10.1116/6.0002879","DOIUrl":"https://doi.org/10.1116/6.0002879","url":null,"abstract":"In this study, boro-tellurite glasses with a composition of 75TeO2–25B2O3 (mol. %) (TB) were synthesized using a traditional melt-quenching method. The glasses were subsequently deposited as thin films using the thermionic vacuum arc system, and a subset of the samples underwent treatment with a low-pressure cold oxygen plasma system, resulting in the formation of the “TBO (boro-tellurite treated by oxygen plasma)” thin films. The structural and morphological properties of the TB and TBO thin films were characterized using x-ray diffraction analysis, x-ray photoelectron spectroscopy, Raman spectroscopy, field emission scanning electron microscopy, and atomic force microscopy. The optical properties of the thin film samples were evaluated using ultraviolet–visible spectrophotometry in the range of 300–800 nm. The resistivity of the thin films was measured using the four-probe Van der Pauw method. It was found that the TB thin films had an amorphous structure with some crystalline formations, whereas the TBO thin films were similar to the bulk boro-tellurite glasses described in the literature, with no detectable crystalline formations. Both TB and TBO thin films exhibited homogenous and amorphous surfaces. Furthermore, the electronic structure of the thin films has changed after oxygen plasma treatment.","PeriodicalId":17490,"journal":{"name":"Journal of Vacuum Science & Technology A","volume":"3 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-10-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"135592775","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Wear and corrosion resistance of zinc-oxide and zirconium-oxide coated WE43 magnesium alloy","authors":"Canser Gül, Hülya Durmuş, Sevda Albayrak, Nilay Çömez","doi":"10.1116/6.0002894","DOIUrl":"https://doi.org/10.1116/6.0002894","url":null,"abstract":"Magnesium alloy, which draws attention with its lightness and high specific strength, is frequently preferred due to its advantages. However, it is necessary to improve the wear and corrosion properties in order to develop the areas of use in the automotive, aircraft, and space industries. For this purpose, after the surface preparation of the main material WE43 Mg alloy, ZnO and ZrO2 coatings were made and characterized in this study. The surface morphology and structural and chemical properties of the samples were investigated using profilometry, contact angle tests, scanning electron microscopy, and x-ray diffraction. Corrosion tests have been carried out. In order to determine the wear performance of the samples, the wear-related volume losses were measured and the friction coefficients were compared. Layers with 2–6 μm coating thickness were obtained homogeneously on the polished and sandblasted sample surfaces. It was determined that the coating layers grew in the form of columns and did not contain capillary cracks. As a result of the study, it was observed that the ZnO-coated samples had the highest wear and corrosion resistance, and the wear and corrosion resistance of the coatings and magnesium alloy substrates improved.","PeriodicalId":17490,"journal":{"name":"Journal of Vacuum Science & Technology A","volume":"55 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-10-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"135590513","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}