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X-RAY ABSORPTION SPECTROSCOPY STUDY OF Mn2O3 AND Mn3O4 NANOPARTICLES SUPPORTED ON MESOPOROUS SILICA SBA-15 介孔二氧化硅SBA-15负载的Mn2O3和Mn3O4纳米颗粒的x射线吸收光谱研究
Advances in Synchrotron Radiation Pub Date : 2008-06-01 DOI: 10.1142/S1793617908000112
Yi-fan Han, K. Ramesh, Luwei Chen, Fengxi Chen, A. Borgna
{"title":"X-RAY ABSORPTION SPECTROSCOPY STUDY OF Mn2O3 AND Mn3O4 NANOPARTICLES SUPPORTED ON MESOPOROUS SILICA SBA-15","authors":"Yi-fan Han, K. Ramesh, Luwei Chen, Fengxi Chen, A. Borgna","doi":"10.1142/S1793617908000112","DOIUrl":"https://doi.org/10.1142/S1793617908000112","url":null,"abstract":"Mn K-edge absorption measurements were carried out on α-Mn2O3 and Mn3O4 nanocrystals supported on a mesoporous silica, SBA-15. The X-ray absorption near edge structure (XANES) spectra demonstrate the existence of the oxidation states of Mn (2+ and 3+) in Mn3O4 and Mn (3+) in Mn2O3, those ions were present in different octahedral environments. Meanwhile, XANES data demonstrate that some Mn atoms that are bonding to the inner wall of the channels as isolated species, may exist as Mn4+ in Mn2O3/SBA-15. In addition, the structure, texture, and electronic properties of nanocomposites were also studied using various characterization techniques including X-ray diffraction (XRD) and laser Raman spectroscopy (LRS). The formation of the hausmannite Mn3O4 and bixbyite Mn2O3 structures has been confirmed clearly by XRD. The prepared nanocomposites of MnOx showed significant catalytic activity towards CO oxidation below 523 K.","PeriodicalId":166807,"journal":{"name":"Advances in Synchrotron Radiation","volume":"28 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129788416","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
EFFECTS OF Ar+ SPUTTERING ON VALENCE STATE AND CHEMICAL ENVIRONMENT OF COBALT IN COBALT-DOPED ZINC OXIDE Ar+溅射对钴掺杂氧化锌中钴价态和化学环境的影响
Advances in Synchrotron Radiation Pub Date : 2008-06-01 DOI: 10.1142/S1793617908000136
Zhihua Yong, Tao Liu, Xingyu Gao, Lei Yan, C. Ong, A. Wee
{"title":"EFFECTS OF Ar+ SPUTTERING ON VALENCE STATE AND CHEMICAL ENVIRONMENT OF COBALT IN COBALT-DOPED ZINC OXIDE","authors":"Zhihua Yong, Tao Liu, Xingyu Gao, Lei Yan, C. Ong, A. Wee","doi":"10.1142/S1793617908000136","DOIUrl":"https://doi.org/10.1142/S1793617908000136","url":null,"abstract":"Zn1-xCoxAl0.01O (x = 0, 0.15, 0.2, 0.3) films were fabricated on Si(100) substrates by pulsed laser deposition (PLD). X-ray diffraction (XRD) studies showed that the Co-doped ZnO films are polycrystalline with c-axis orientated wurtzite structure. Photoemission revealed a valence state of 2+ and a tetrahedral coordination of Co in the Co-doped ZnO. Ar+ sputtering was performed to investigate the changes to the valence state and the chemical environment of Co at surface and bulk. After Ar+ sputtering, the film composition was found to be closer to the starting target material. This was confirmed by the results of X-ray fluorescence (XRF) measurements, indicating the Co-doped ZnO film surface is cobalt-rich.","PeriodicalId":166807,"journal":{"name":"Advances in Synchrotron Radiation","volume":"3 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128568295","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
HIGH RESOLUTION REFLECTOMETRY AT SINGAPORE SYNCHROTRON LIGHT SOURCE 新加坡同步加速器光源的高分辨率反射测量
Advances in Synchrotron Radiation Pub Date : 2008-06-01 DOI: 10.1142/S1793617908000069
P. Yang, H. Moser
{"title":"HIGH RESOLUTION REFLECTOMETRY AT SINGAPORE SYNCHROTRON LIGHT SOURCE","authors":"P. Yang, H. Moser","doi":"10.1142/S1793617908000069","DOIUrl":"https://doi.org/10.1142/S1793617908000069","url":null,"abstract":"X-ray reflectometry (XRR) at Singapore Synchrotron Light Source (SSLS) is reviewed. The instrument and methods are introduced. Two films made of a poly-(styrene-block-2-vinylpyridine) diblock copolymer (PS-b-P2VP) film template and indium-tin-oxide (ITO, In2-xSnxO3-2x) are shown as typical applications of XRR. A simulation for spin valve magnetic sandwich layers is also shown as an application of anomalous scattering effect to XRR.","PeriodicalId":166807,"journal":{"name":"Advances in Synchrotron Radiation","volume":"70 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127109270","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 6
DEVELOPMENT OF SUPERCONDUCTING UNDULATORS FOR ADVANCED SYNCHROTRON LIGHT SOURCES 先进同步加速器光源超导波动器的研制
Advances in Synchrotron Radiation Pub Date : 2008-06-01 DOI: 10.1142/S1793617908000100
C. Diao, H. Moser
{"title":"DEVELOPMENT OF SUPERCONDUCTING UNDULATORS FOR ADVANCED SYNCHROTRON LIGHT SOURCES","authors":"C. Diao, H. Moser","doi":"10.1142/S1793617908000100","DOIUrl":"https://doi.org/10.1142/S1793617908000100","url":null,"abstract":"Superconducting undulators are being developed for their potential to produce either higher photon energy beams at given electron energy facilities or to save accelerator cost by using lower electron energy for given photon energy beams as compared to permanent-magnet undulators. They are expected to play an important role in upgrade projects of third generation sources and are believed to be a key component of fourth generation sources that may be based on Free Electron Lasers (FEL) and Energy Recovery Linacs (ERL). A review is made on the development of superconducting undulators, including some details of the development of superconducting miniundulators and the LIULI program at SSLS.","PeriodicalId":166807,"journal":{"name":"Advances in Synchrotron Radiation","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114473029","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
ULTRAFAST CHARGE TRANSFER ACROSS MOLECULE/METAL INTERFACES BY RESONANT PHOTOEMISSION SPECTROSCOPY 分子/金属界面超快电荷转移的共振光发射光谱研究
Advances in Synchrotron Radiation Pub Date : 2008-06-01 DOI: 10.1142/S1793617908000124
Li Wang, Wei Chen, Xingyu Gao, A. Wee
{"title":"ULTRAFAST CHARGE TRANSFER ACROSS MOLECULE/METAL INTERFACES BY RESONANT PHOTOEMISSION SPECTROSCOPY","authors":"Li Wang, Wei Chen, Xingyu Gao, A. Wee","doi":"10.1142/S1793617908000124","DOIUrl":"https://doi.org/10.1142/S1793617908000124","url":null,"abstract":"The authors review recent studies of charge transfer dynamics across molecule/metal interfaces by resonant photoemission spectroscopy done at the Surface, Interface and Nanostructure Science (SINS) beamline, Singapore Light Source Synchrotron. The interfacial charge transfer takes place in the femtosecond scale due to the strong coupling between molecules and metal substrate, indicating that the transport properties of the molecule/metal junction is dominated not only by the chemical nature of molecules but also the interfacial properties of molecule/metal. Resonant photoemission spectroscopy is demonstrated to be a powerful tool for the study of ultrafast charge transfer dynamics across molecule/metal interfaces.","PeriodicalId":166807,"journal":{"name":"Advances in Synchrotron Radiation","volume":"133 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116622887","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Fe-INDUCED CHANGE OF ELECTRON AFFINITY AND SECONDARY ELECTRON YIELD ON DIAMOND 铁诱导金刚石上电子亲和和二次电子产率的变化
Advances in Synchrotron Radiation Pub Date : 2008-06-01 DOI: 10.1142/S1793617908000045
Xingyu Gao, D. Qi, Shi Chen, A. Wee, T. Ouyang, K. Loh, Xiaojiang Yu, H. Moser
{"title":"Fe-INDUCED CHANGE OF ELECTRON AFFINITY AND SECONDARY ELECTRON YIELD ON DIAMOND","authors":"Xingyu Gao, D. Qi, Shi Chen, A. Wee, T. Ouyang, K. Loh, Xiaojiang Yu, H. Moser","doi":"10.1142/S1793617908000045","DOIUrl":"https://doi.org/10.1142/S1793617908000045","url":null,"abstract":"Fe films grown on clean diamond (100) have been studied using synchrotron-based X-ray photoemission spectroscopy (XPS) and ultra-violet photoemission spectroscopy (UPS). The work function and secondary electron yield (SEY) in UPS of the sample were found to change strongly as Fe film thickness increases. After the deposition of about one monolayer Fe, which was found to react with diamond by XPS, work function reaches its minimum while SEY reaches its maximum due to the formation of a dipole layer between the chemisorbed Fe and C atoms at the interface. This study could help the development of high emittance spin-polarized electron source based on magnetic thin films grown on diamond with low or negative electron affinity.","PeriodicalId":166807,"journal":{"name":"Advances in Synchrotron Radiation","volume":"40 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124331561","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
MOLECULAR ORIENTATION AND ENERGY LEVEL ALIGNMENT AT THE CuPc/SAMs INTERFACE CuPc/SAMs界面的分子取向和能级排列
Advances in Synchrotron Radiation Pub Date : 2008-06-01 DOI: 10.1142/S1793617908000094
Wei Chen, Shi Chen, D. Qi, Xingyu Gao, A. Wee
{"title":"MOLECULAR ORIENTATION AND ENERGY LEVEL ALIGNMENT AT THE CuPc/SAMs INTERFACE","authors":"Wei Chen, Shi Chen, D. Qi, Xingyu Gao, A. Wee","doi":"10.1142/S1793617908000094","DOIUrl":"https://doi.org/10.1142/S1793617908000094","url":null,"abstract":"This article highlights recent progress in the use of functionalized self-assembled monolayers for organic electronics, with particular emphasis on the investigation of the CuPc-SAMs interface properties, particularly the energy level alignment and molecular orientation. Synchrotron-based high-resolution photoemission spectroscopy (PES) and near-edge X-ray absorption fine structure measurements (NEXAFS) are used to address these issues. It is found that the energy level alignment at the CuPc-SAMs interface depends on the chain length of SAMs. Fermi level pinning occurs at the interface of CuPc with short chain SAMs of 4-trifluoromethyl-benzenethiol (CF3-SAM) and 4-methyl-benzenethiol (CH3-SAM), whereas the vacuum level aligns at the interface of CuPc with long chain SAMs including 1-(p-thiophenyl)-4-phenylbenzene (BBB), 4-(p-thiophenyl)-2, 2', 5, 5'-tetramethoxy-biphenyl (BOO), 1-(p-thiophenyl)-4-(2', 5'-dimethoxyphenyl)-tetrafluorobenzene (BFO) and 4-pentafluorophenyl-1-(p-thiophenyl)-2, 5-dimethoxybenzene (BOF). A significant reduction of the hole injection barrier (Δh) by up to 0.75 eV was observed after deposition of 5 nm CuPc on BOF/Au(111) as compared to the CuPc/Au(111) (Δh = 0.9 eV). Angular-dependent NEXAFS measurements reveal that CuPc molecules adopt a standing up configuration on all SAMs. This suggests that the interface charge transfer has negligible effect on the molecular orientation of CuPc on various SAMs.","PeriodicalId":166807,"journal":{"name":"Advances in Synchrotron Radiation","volume":"8 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127011825","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
ARTIFICIAL ENGINEERING AND CHARACTERIZATION OF MICRO- AND NANOSCALE ELECTROMAGNETIC METAMATERIALS FOR THE THz SPECTRAL RANGE 太赫兹光谱范围内微、奈米级电磁超材料的人工工程与表征
Advances in Synchrotron Radiation Pub Date : 2008-06-01 DOI: 10.1142/S1793617908000070
B. Casse, H. Moser, M. Bahou, J. Lee, Stephen Inglis, L. Jian
{"title":"ARTIFICIAL ENGINEERING AND CHARACTERIZATION OF MICRO- AND NANOSCALE ELECTROMAGNETIC METAMATERIALS FOR THE THz SPECTRAL RANGE","authors":"B. Casse, H. Moser, M. Bahou, J. Lee, Stephen Inglis, L. Jian","doi":"10.1142/S1793617908000070","DOIUrl":"https://doi.org/10.1142/S1793617908000070","url":null,"abstract":"Electromagnetic metamaterials are a new class of ordered composite materials made from metallic unit structures that exhibit an electric and magnetic response to an incident electromagnetic wavefield such that ∊ and μ become simultaneously negative. We review the recent progress made in manufacturing and characterizing micro- and nanostructured metamaterials from 1 to 216 THz (300 to 1.4 μm, respectively), at the Singapore Synchrotron Light Source, and discuss new developments towards three-dimensional and multilayered metamaterials structures by means of deep X-ray lithography.","PeriodicalId":166807,"journal":{"name":"Advances in Synchrotron Radiation","volume":"35 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116536705","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
NANOFABRICATION FOR PHOTONIC APPLICATIONS 光子应用的纳米制造
Advances in Synchrotron Radiation Pub Date : 2008-06-01 DOI: 10.1142/S1793617908000021
A. Chen, L. Jian, H. Moser
{"title":"NANOFABRICATION FOR PHOTONIC APPLICATIONS","authors":"A. Chen, L. Jian, H. Moser","doi":"10.1142/S1793617908000021","DOIUrl":"https://doi.org/10.1142/S1793617908000021","url":null,"abstract":"Materials with nanoscale dimensions have unique optical properties, which have been extensively explored and implemented for a variety of functionalized photonic structures and devices. In this paper, the nanofabrication processes for photonic applications are reviewed. The nanofabrication methods can be divided into two major categories: top-down and bottom-up. The main techniques used in each method are discussed in terms of its process capabilities, advantages, limitations, and applications. The cases which involve the combination of top-down and bottom-up approaches are also illustrated.","PeriodicalId":166807,"journal":{"name":"Advances in Synchrotron Radiation","volume":"18 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132048913","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
CHARACTERIZATION OF MATERIALS FOR MOLECULAR ELECTRONICS AND DATA STORAGE BY SOFT X-RAY SPECTROSCOPY 用软x射线光谱学表征分子电子学和数据存储材料
Advances in Synchrotron Radiation Pub Date : 2008-06-01 DOI: 10.1142/S1793617908000033
Xiaojiang Yu, H. Moser, Xingyu Gao, A. Wee
{"title":"CHARACTERIZATION OF MATERIALS FOR MOLECULAR ELECTRONICS AND DATA STORAGE BY SOFT X-RAY SPECTROSCOPY","authors":"Xiaojiang Yu, H. Moser, Xingyu Gao, A. Wee","doi":"10.1142/S1793617908000033","DOIUrl":"https://doi.org/10.1142/S1793617908000033","url":null,"abstract":"SINS is a soft X-ray spectroscopy facility at SSLS, dedicated to Surface, Interface and Nanostructure Science of advanced materials. Developed over the past few years, the SINS end-station includes a photoemission spectroscopy analyzer, LEED, in situ STM/AFM, and a separate sample preparation chamber. Applications to such fields as molecular electronics, high density data storage, and nanonetwork templates are briefly reviewed.","PeriodicalId":166807,"journal":{"name":"Advances in Synchrotron Radiation","volume":"3 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133839625","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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