B. Casse, H. Moser, M. Bahou, J. Lee, Stephen Inglis, L. Jian
{"title":"ARTIFICIAL ENGINEERING AND CHARACTERIZATION OF MICRO- AND NANOSCALE ELECTROMAGNETIC METAMATERIALS FOR THE THz SPECTRAL RANGE","authors":"B. Casse, H. Moser, M. Bahou, J. Lee, Stephen Inglis, L. Jian","doi":"10.1142/S1793617908000070","DOIUrl":null,"url":null,"abstract":"Electromagnetic metamaterials are a new class of ordered composite materials made from metallic unit structures that exhibit an electric and magnetic response to an incident electromagnetic wavefield such that ∊ and μ become simultaneously negative. We review the recent progress made in manufacturing and characterizing micro- and nanostructured metamaterials from 1 to 216 THz (300 to 1.4 μm, respectively), at the Singapore Synchrotron Light Source, and discuss new developments towards three-dimensional and multilayered metamaterials structures by means of deep X-ray lithography.","PeriodicalId":166807,"journal":{"name":"Advances in Synchrotron Radiation","volume":"35 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2008-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Advances in Synchrotron Radiation","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1142/S1793617908000070","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2
Abstract
Electromagnetic metamaterials are a new class of ordered composite materials made from metallic unit structures that exhibit an electric and magnetic response to an incident electromagnetic wavefield such that ∊ and μ become simultaneously negative. We review the recent progress made in manufacturing and characterizing micro- and nanostructured metamaterials from 1 to 216 THz (300 to 1.4 μm, respectively), at the Singapore Synchrotron Light Source, and discuss new developments towards three-dimensional and multilayered metamaterials structures by means of deep X-ray lithography.