铁诱导金刚石上电子亲和和二次电子产率的变化

Xingyu Gao, D. Qi, Shi Chen, A. Wee, T. Ouyang, K. Loh, Xiaojiang Yu, H. Moser
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引用次数: 0

摘要

利用同步辐射x射线光发射光谱(XPS)和紫外光发射光谱(UPS)研究了在清洁金刚石(100)上生长的铁薄膜。随着铁膜厚度的增加,UPS的功函数和二次电子产率发生了较大的变化。通过XPS发现与金刚石发生反应的单层Fe沉积后,由于在界面处化学吸附的Fe和C原子之间形成偶极子层,功函数达到最小,而SEY达到最大。该研究有助于开发基于低或负电子亲合力金刚石磁性薄膜的高发射度自旋极化电子源。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Fe-INDUCED CHANGE OF ELECTRON AFFINITY AND SECONDARY ELECTRON YIELD ON DIAMOND
Fe films grown on clean diamond (100) have been studied using synchrotron-based X-ray photoemission spectroscopy (XPS) and ultra-violet photoemission spectroscopy (UPS). The work function and secondary electron yield (SEY) in UPS of the sample were found to change strongly as Fe film thickness increases. After the deposition of about one monolayer Fe, which was found to react with diamond by XPS, work function reaches its minimum while SEY reaches its maximum due to the formation of a dipole layer between the chemisorbed Fe and C atoms at the interface. This study could help the development of high emittance spin-polarized electron source based on magnetic thin films grown on diamond with low or negative electron affinity.
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