2008 33rd IEEE/CPMT International Electronics Manufacturing Technology Conference (IEMT)最新文献

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A novel push-pull sampling methodology for test production in semiconductor manufacturing industries 一种用于半导体制造行业测试生产的新型推挽抽样方法
Chow Leng Kwang, Ong Eu Chin
{"title":"A novel push-pull sampling methodology for test production in semiconductor manufacturing industries","authors":"Chow Leng Kwang, Ong Eu Chin","doi":"10.1109/IEMT.2008.5507804","DOIUrl":"https://doi.org/10.1109/IEMT.2008.5507804","url":null,"abstract":"This paper describes the use of a push-pull sampling methodology on test products to improve manufacturing efficiency. The conventional test technologies heavily rely on manufacturing operators to manually input the necessary information to a station controller for processing a test lot. This approach has resulted in some quality issues of sampling miscalculation owing to under-sample requirements in test processes. A robust solution is developed by applying a two-stage push-pull methodology in a new automated sampling system. The push-pull approach of automated sampling controls and propagates the correct sampling data to the operators for them to run test lots with the correct samples. The system has contributed to improving manufacturing capacity, creating robust controllable system, reducing human handling or dependency, and shortening the lead time to end customers. All these have resulted in effective manufacturing control to eliminate non-value added activities and zero repeated quality cases in the manufacturing test environment. The overall ROI (return of investment) realized by this system is a cost saving of million dollars, by mitigating the cost of human errors against reduction of production cost per unit.","PeriodicalId":151085,"journal":{"name":"2008 33rd IEEE/CPMT International Electronics Manufacturing Technology Conference (IEMT)","volume":"5 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124312862","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
A novel CMOS-compatible fabrication method for development of an electrostatically actuated micropump 一种用于开发静电驱动微泵的新型cmos兼容制造方法
Hing Wah Lee, M. R. Buyong, M. I. Syono, I. Azid
{"title":"A novel CMOS-compatible fabrication method for development of an electrostatically actuated micropump","authors":"Hing Wah Lee, M. R. Buyong, M. I. Syono, I. Azid","doi":"10.1109/IEMT.2008.5507836","DOIUrl":"https://doi.org/10.1109/IEMT.2008.5507836","url":null,"abstract":"This paper presents the development of a novel micropump actuated electrostatically utilizing CMOS-compatible silicon micromachining fabrication process. The fabrication process consists of six photolithography steps and five chemical vapor depositions. Etching of the sacrificial oxide layer for the diaphragm chamber, microchannels and inlet/outlet reservoirs are achieved using etch-release holes perforated on the polysilicon layer, similar to via holes used in IC-fabrication method. The sacrificial oxide etching and encapsulation of the etch-release holes have been successfully accomplished by using BOE etchants for 17 minutes and by growing LPCVD silicon nitride of thickness 0.9 μm respectively. Accomplishing this feat enables CMOS-compatible electrostatically actuated micropump to be developed with potential integration with CMOS-based sensors, readout circuits and packaging, on a single wafer.","PeriodicalId":151085,"journal":{"name":"2008 33rd IEEE/CPMT International Electronics Manufacturing Technology Conference (IEMT)","volume":"4 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123699739","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Nondestructive method of TIM bondline measurement in Flip Chips package 倒装芯片封装中TIM键合线的无损测量方法
H. Heng, V. Ben, K. Keok, Riemer Jay
{"title":"Nondestructive method of TIM bondline measurement in Flip Chips package","authors":"H. Heng, V. Ben, K. Keok, Riemer Jay","doi":"10.1109/IEMT.2008.5507830","DOIUrl":"https://doi.org/10.1109/IEMT.2008.5507830","url":null,"abstract":"This paper describes the method of using Acoustic Micro Imaging (AMI) technique as nondestructive method to measure the bond line thickness (BLT) of the thermal interface material (TIM) in Flip Chips package; this is an alternative to destructive physical analysis. The purpose of this study is to demonstrate the capability of AMI used to measure the BLT of TIM. The two interfaces of interest are Lid-to-TIM. and TIM-to-Silicon chip. AMI is a nondestructive inspection technique that utilizes high frequency ultrasound in the range of 5 to 500 MHz to: -determine interface bonding/adhesion detect -defects -characterize & measure material properties Acoustic Micro Imaging instrument shown here is an effective technique for nondestructively evaluating the TIM thickness. The images in this report demonstrate a few of many imaging and analysis techniques within AMI technology that are useful for production screening and in laboratory. These capabilities make it an excellent choice for a fast, reliable and accurate to measure the thermal interface material after joining the lid with the backside of the flip chip without manual cross section.","PeriodicalId":151085,"journal":{"name":"2008 33rd IEEE/CPMT International Electronics Manufacturing Technology Conference (IEMT)","volume":"2 2 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116861985","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Crosstalk and switching noise mechanism study in high density wire-bond FPGA device 高密度线键FPGA器件串扰与开关噪声机理研究
S. Tan, Yee Huan Yew, Hong Shi
{"title":"Crosstalk and switching noise mechanism study in high density wire-bond FPGA device","authors":"S. Tan, Yee Huan Yew, Hong Shi","doi":"10.1109/EPTC.2008.4763415","DOIUrl":"https://doi.org/10.1109/EPTC.2008.4763415","url":null,"abstract":"This paper presents the dominant contributors of mutual inductance in wirebond package thru study on the return path. The study is validated through real device measurement correlation. Based on the study, techniques to reduce crosstalk in wire-bond package will be presented which will be beneficial to the packaging world as bond wire continues to be the dominant technique to connect die to the package in low cost application.","PeriodicalId":151085,"journal":{"name":"2008 33rd IEEE/CPMT International Electronics Manufacturing Technology Conference (IEMT)","volume":"158 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125782362","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Chip-free singulation for medical application 用于医疗应用的无芯片模拟
A. Teng
{"title":"Chip-free singulation for medical application","authors":"A. Teng","doi":"10.1109/IEMT.2008.5507867","DOIUrl":"https://doi.org/10.1109/IEMT.2008.5507867","url":null,"abstract":"Singulation is one of the most damaging process steps in IC assembly because of the torque and force applied by the saw blade to abrade away silicon material on all 4 sides of the IC die. The removed material around the die creates a gap which allows the die to be freed from the wafer. If the abrasive singulation process is not controlled, the freed die may exhibit low mechanical strength due to chipping damage. This is particularly a problem because newer medical devices are designed with dimensions that are long and narrow in order to fit into small implantable or insertable products. Compared to the more square shaped IC dies, chipping is more of a problem on high aspect ratio dies because of the its susceptibility to resonance and vibration during blade dicing on the longer sides. For this paper, conventional dicing and Dice Before Grind (DBG) are compared. Mechanical test dies prepared from blank silicon wafers cut to >3.5 mm long 0.5 mm wide and 0.150 mm thick are prepared. High aspect ratios of 10:1 with various backside finishes will be compared for dicing quality and mechanical integrity. Using the proper grind wheels with the finer grit size, 100% yield for singulation resulting in higher strength devices can be obtained with good efficiency with dice before grind method.","PeriodicalId":151085,"journal":{"name":"2008 33rd IEEE/CPMT International Electronics Manufacturing Technology Conference (IEMT)","volume":"21 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127360751","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Warpage measurements of laminate based BGA packages at elevated temperatures and comparison with real board assembly behaviour 基于层压板的BGA封装在高温下的翘曲测量和与实际电路板组装行为的比较
C. Birzer, M. Graml, M. Dittes, W. Mack
{"title":"Warpage measurements of laminate based BGA packages at elevated temperatures and comparison with real board assembly behaviour","authors":"C. Birzer, M. Graml, M. Dittes, W. Mack","doi":"10.1109/IEMT.2008.5507824","DOIUrl":"https://doi.org/10.1109/IEMT.2008.5507824","url":null,"abstract":"This paper is about warpage of laminate substrate based BGAs and fine pitch BGAs at lead-free board assembly reflow temperatures using shadow moiré technique. Various constructions (e.g. single die devices and multi chip modules) and different die and package sizes as well as different molding compound materials were considered in this study. A simple model for predicting high temperature warpage for single die devices based on the distance between package corner and die corner was developed. The comparison of the warpage results with and without moisture soaking according JEDEC MSL 3 did not exhibit a significant influence on high temperature warpage. The shadow moiré test results at elevated temperatures are compared with solder joint height distributions measured in cross sections after real lead-free board assembly. A clear correlation of the solder joint height distributions with the package warpage status at 170°C during cooling phase was found. This is much lower than the mominal solidification temperature of lead-free solder. This study helps to understand the influencing factors of BGA warpage and its role for board assembly.","PeriodicalId":151085,"journal":{"name":"2008 33rd IEEE/CPMT International Electronics Manufacturing Technology Conference (IEMT)","volume":"18 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130174688","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 5
Prediction studies on percolation threshold behaviour of silver filled epoxy composite for electrically conductive adhesives applications 导电胶粘剂用银填充环氧复合材料渗透阈值行为的预测研究
M. Zulkarnain, M. Mariatti, I. Azid
{"title":"Prediction studies on percolation threshold behaviour of silver filled epoxy composite for electrically conductive adhesives applications","authors":"M. Zulkarnain, M. Mariatti, I. Azid","doi":"10.1109/IEMT.2008.5507799","DOIUrl":"https://doi.org/10.1109/IEMT.2008.5507799","url":null,"abstract":"Electrically conductive adhesives (ECAs) has received considerable interest as a solder replacement in flip chip packaging because of their advantages such as significant reduction in pitch, weight and volume and increased environmental compatibility. Conductivity of the ECA polymers can be described by percolation threshold which can be achieved by the addition of silver (Ag) nanoparticles in polymer matrix. In this present study, the existing electrical conductivity models were used to predict the percolation threshold phenomena in the conductive polymer composites. The electrical property characterization was modelled by finite element and statistical approach that assumes the transition of insulator to conductor at certain filler content. The model was developed based on spherical shape of Ag filler. From the study, it was found that the electric field and current density forces of spherical particles are governed by a dispersion of particle in the polymer matrix and filler content.","PeriodicalId":151085,"journal":{"name":"2008 33rd IEEE/CPMT International Electronics Manufacturing Technology Conference (IEMT)","volume":"9 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126870284","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Effects of non-uniform base heating in multi stack microchannel heat sinks used for cooling high heat flux electronic chips and devices 用于冷却高热流密度电子芯片和器件的多堆微通道散热器中不均匀基底加热的影响
P. Hegde, K. N. Seetharamu
{"title":"Effects of non-uniform base heating in multi stack microchannel heat sinks used for cooling high heat flux electronic chips and devices","authors":"P. Hegde, K. N. Seetharamu","doi":"10.1109/IEMT.2008.5507856","DOIUrl":"https://doi.org/10.1109/IEMT.2008.5507856","url":null,"abstract":"Microchannel heat sinks are widely regarded as being amongst the most effective heat removal techniques from the space constrained electronic devices. Electronic components and chips are often subjected to spatially varying heat fluxes and hot spots in certain regions. In the present work, effects of non-uniform base heating on the performance of stacked microchannel heat sinks cooled by forced circulated water is analyzed. Finite element method is used for the analysis wherein a self developed 12 noded element is used for channel discretization. Different types of non-uniform base heating such as non-uniform heating in the ascending and descending orders with respect to the coolant flow direction in the bottom channel, upstream half heating, downstream half heating and center half heating (similar to central hotspot) are analyzed for both parallel flow and counter flow models. The results are compared with the case of uniform heating throughout the base.","PeriodicalId":151085,"journal":{"name":"2008 33rd IEEE/CPMT International Electronics Manufacturing Technology Conference (IEMT)","volume":"247 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115966894","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Application Of Ultra Low Loop gold wire bonding technique in Super Thin (Jedec Package Profile Height Sub Code “X2”) Quad Flat No Lead Package (QFN) 超低环金线键合技术在超薄(Jedec封装外形高度子码“X2”)四平无引线封装(QFN)中的应用
Tan Boo Wei, Wang Lei, K. Niu, Lu Hai Long
{"title":"Application Of Ultra Low Loop gold wire bonding technique in Super Thin (Jedec Package Profile Height Sub Code “X2”) Quad Flat No Lead Package (QFN)","authors":"Tan Boo Wei, Wang Lei, K. Niu, Lu Hai Long","doi":"10.1109/IEMT.2008.5507845","DOIUrl":"https://doi.org/10.1109/IEMT.2008.5507845","url":null,"abstract":"Quad Flat No Lead Package (QFN) with “Super Thin” package height of 0.3 to 0.4 mm (package profile height sub code “X2” per Jedec Standard) is designed with limited vertical space for wire loop height. Typical package construction consists of leadframe thickness, chip and chip attach adhesive thickness, mold (encapsulation) thickness left only 75 to 100 um (3 to 4 mils) space between chip surface and package surface which is available for wire bonding . Therefore wire bonding loop height in QFN-X2 package are typically controlled within less than 100um (4mils) as measured from chip surface to highest point of wire loop . Typically there are 3 areas to consider when developing gold wire bond techniques to achieve low loop height: 1. Stress level at the heat affected zone near wire exit above ball (1st bonds). 2. Consistency of wire loop height across all wires within same package. 3. Resistance to mold flow sweeping during molding (encapsulation process). There are two common wire bond techniques available to achieve wire loop height less than 100um (4mils) - bond stitch on ball (BSOB) and ultra low loop (ULL) forward bonding. This paper discusses the comparative performance and limitations of both wire bond techniques .","PeriodicalId":151085,"journal":{"name":"2008 33rd IEEE/CPMT International Electronics Manufacturing Technology Conference (IEMT)","volume":"106 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122640642","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Warpage simulation for chip-in-substrates 芯片基板翘曲模拟
J. Kim, Jupyo Hong, Shan Gao, Seogmoon Choi, S. Yi
{"title":"Warpage simulation for chip-in-substrates","authors":"J. Kim, Jupyo Hong, Shan Gao, Seogmoon Choi, S. Yi","doi":"10.1109/IEMT.2008.5507803","DOIUrl":"https://doi.org/10.1109/IEMT.2008.5507803","url":null,"abstract":"In order to predict warpage of chip-in-substrate package, finite element analysis was carried out with modeling layers in chip and substrate and effective thermoelastic properties. The effects of design parameters such as pattern on the gap between chip and cavity, number of circuit layers, thickness and face direction of the chip, and gap width were investigated. The result shows that the warpage much depends on the internal structure and the effective thermoelastic properties.","PeriodicalId":151085,"journal":{"name":"2008 33rd IEEE/CPMT International Electronics Manufacturing Technology Conference (IEMT)","volume":"53 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133494784","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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