Effects of non-uniform base heating in multi stack microchannel heat sinks used for cooling high heat flux electronic chips and devices

P. Hegde, K. N. Seetharamu
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引用次数: 3

Abstract

Microchannel heat sinks are widely regarded as being amongst the most effective heat removal techniques from the space constrained electronic devices. Electronic components and chips are often subjected to spatially varying heat fluxes and hot spots in certain regions. In the present work, effects of non-uniform base heating on the performance of stacked microchannel heat sinks cooled by forced circulated water is analyzed. Finite element method is used for the analysis wherein a self developed 12 noded element is used for channel discretization. Different types of non-uniform base heating such as non-uniform heating in the ascending and descending orders with respect to the coolant flow direction in the bottom channel, upstream half heating, downstream half heating and center half heating (similar to central hotspot) are analyzed for both parallel flow and counter flow models. The results are compared with the case of uniform heating throughout the base.
用于冷却高热流密度电子芯片和器件的多堆微通道散热器中不均匀基底加热的影响
微通道散热片被广泛认为是空间受限的电子器件中最有效的散热技术之一。电子元件和芯片在某些区域经常受到空间变化的热通量和热点的影响。本文分析了非均匀基底加热对强制循环水冷却的堆叠式微通道散热器性能的影响。采用有限元法进行分析,其中采用自行研制的12结点单元进行通道离散化。在平行流和逆流模型下,分别分析了不同类型的基底非均匀加热,如底部通道内冷却剂流动方向的升序和降序非均匀加热、上游半加热、下游半加热和中心半加热(类似中心热点)。结果与整个基底均匀加热的情况进行了比较。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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