IEEE\/ASME Journal of Microelectromechanical Systems最新文献

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Fabrication and characterization of a micromechanical sensor for differential detection of nanoscale motions 用于纳米级运动差分检测的微机械传感器的制造与表征
IEEE\/ASME Journal of Microelectromechanical Systems Pub Date : 2002-12-16 DOI: 10.1109/JMEMS.2002.805057
C. Savran, A. Sparks, J. Sihler, Jian Li, Wangsong Wu, Dean Berlin, T. Burg, J. Fritz, M. Schmidt, S. Manalis
{"title":"Fabrication and characterization of a micromechanical sensor for differential detection of nanoscale motions","authors":"C. Savran, A. Sparks, J. Sihler, Jian Li, Wangsong Wu, Dean Berlin, T. Burg, J. Fritz, M. Schmidt, S. Manalis","doi":"10.1109/JMEMS.2002.805057","DOIUrl":"https://doi.org/10.1109/JMEMS.2002.805057","url":null,"abstract":"We have micromachined a mechanical sensor that uses interferometry to detect the differential and absolute deflections of two adjacent cantilevers. The overall geometry of the device allows simple fluidic delivery to each cantilever to immobilize molecules for biological and chemical detection. We show that differential sensing is 50 times less affected by ambient temperature changes than the absolute, thus enabling a more reliable differentiation between specific cantilever bending and background effects. We describe the fabrication process and show results related to the dynamic characterization of the device as a differential sensor. The root-mean-squared (r.m.s.) sensor noise in water and air is /spl sim/1 nm over the frequency range of 0.4-40 Hz. We also find that in air, the deflection resolution is limited only by the cantilever's thermomechanical noise level of 0.008 /spl Aring//Hz/sup 1/2/ over the frequency range of 40-1000 Hz.","PeriodicalId":13438,"journal":{"name":"IEEE\\/ASME Journal of Microelectromechanical Systems","volume":"15 1","pages":"703-708"},"PeriodicalIF":0.0,"publicationDate":"2002-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"74542275","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 40
Mechanics of microcantilever beams subject to combined electrostatic and adhesive forces 静电与粘接合力作用下微悬臂梁的力学
IEEE\/ASME Journal of Microelectromechanical Systems Pub Date : 2002-12-16 DOI: 10.1109/JMEMS.2002.805047
J. Knapp, M. P. Boer
{"title":"Mechanics of microcantilever beams subject to combined electrostatic and adhesive forces","authors":"J. Knapp, M. P. Boer","doi":"10.1109/JMEMS.2002.805047","DOIUrl":"https://doi.org/10.1109/JMEMS.2002.805047","url":null,"abstract":"One of the most important issues facing the continued development and application of microelectromechanical systems (MEMS) is that of adhesion and friction between microstructures intended to transfer force. In this work, we develop modeling approaches for studying adhesion (i.e., stiction) using the observed shape of microcantilevers under electrostatic loading. Analytical models for an idealized configuration are presented first. The solutions reveal the regimes over which the cantilever deflections are sensitive to adhesion versus applied loading. Also, the energy release rate and hence the cantilever adhesion value is shown to be independent of the curvature of the initially freestanding beam. Second, with a finite-element modeling approach, we quantify the slight sensitivity of the cantilever deflections to the surface force law assumed and show that with Angstrom scale resolution of beam deflections, cohesive zone law information can in principle be deduced. We also use this approach to model the nonuniform electrostatic loading force used in our experiments and the effect of support post compliance. We then demonstrate how adhesion values are obtained along the length of a microcantilever.","PeriodicalId":13438,"journal":{"name":"IEEE\\/ASME Journal of Microelectromechanical Systems","volume":"42 1","pages":"754-764"},"PeriodicalIF":0.0,"publicationDate":"2002-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"88345156","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 115
Design, fabrication, and testing of an electrohydrodynamic ion-drag micropump 电流体动力离子拖微泵的设计、制造和测试
IEEE\/ASME Journal of Microelectromechanical Systems Pub Date : 2002-12-16 DOI: 10.1109/JMEMS.2002.805046
J. Darabi, M. Rada, M. Ohadi, J. Lawler
{"title":"Design, fabrication, and testing of an electrohydrodynamic ion-drag micropump","authors":"J. Darabi, M. Rada, M. Ohadi, J. Lawler","doi":"10.1109/JMEMS.2002.805046","DOIUrl":"https://doi.org/10.1109/JMEMS.2002.805046","url":null,"abstract":"This paper presents the design, fabrication, and testing of a novel electrohydrodynamic (EHD) ion-drag micropump. In order to maximize the electrical field gradients that are responsible for EHD pumping, we incorporated three-dimensional (3-D) triangular bumps of solder as part of the EHD electrodes. To form these bumps, Niobium was sputter-deposited onto a ceramic substrate, coated with photoresist, optically exposed and etched using a reactive ion etcher to define the electrode pattern. The substrate was then \"dipped\" into a molten solder pool. Since the solder adheres only to the metallic film, bumps of solder form on the electrodes, giving the electrodes a significant 3-D character. The overall dimensions of the micropump are 19 mm /spl times/ 32 mm /spl times/ 1.05 mm. Four different designs were fabricated and tested. Static pressure tests were performed with a 3M Thermal Fluid (HFE-7100) as the working fluid and the optimum design was identified. The results with the thermal fluid were highly promising and indicated a pumping head of up to 700 Pa at an applied voltage of 300 V. The experimental results for the four different designs show that the presence of the 3-D bump structures significantly improves the pumping performance. Also, a much better pumping performance was obtained with the micropump in which the emitter had a saw-tooth shape.","PeriodicalId":13438,"journal":{"name":"IEEE\\/ASME Journal of Microelectromechanical Systems","volume":"85 1","pages":"684-690"},"PeriodicalIF":0.0,"publicationDate":"2002-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"89032908","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 5
A MEMS piggyback actuator for hard-disk drives 一种用于硬盘驱动器的MEMS背负式驱动器
IEEE\/ASME Journal of Microelectromechanical Systems Pub Date : 2002-12-16 DOI: 10.1109/JMEMS.2002.805054
H. Toshiyoshi, M. Mita, H. Fujita
{"title":"A MEMS piggyback actuator for hard-disk drives","authors":"H. Toshiyoshi, M. Mita, H. Fujita","doi":"10.1109/JMEMS.2002.805054","DOIUrl":"https://doi.org/10.1109/JMEMS.2002.805054","url":null,"abstract":"This paper reports a new fabrication process and designing method to integrate MEMS piggyback actuators on a silicon-on-insulator (SOI) wafer with magnetic read/write heads of hard-disk drives. Large bandwidth of the tracking servo system is designed by reducing the load mass for the tracking microactuator to be around 40 /spl mu/g. A prototype electrostatic MEMS actuator (2 mm /spl times/ 3 mm /spl times/ 0.6 mm) of multiple parallel plates has been successfully integrated by using high-aspect ratio microstructures (gap opening 2 /spl mu/m into 50-/spl mu/m-SOI wafer) patterned by deep reactive-ion-etching (DRIE). A dc displacement of 0.5 /spl mu/m, which is almost the same size as data track width, has been obtained at a driving voltage of dc 60 V and the fundamental resonance is found at 16 kHz. An analytical model of the MEMS piggyback actuator has been proposed to predict electromechanical performance. The fabrication method proposed here is very simple and straightforward to put the head-element-drive mechanism into practice.","PeriodicalId":13438,"journal":{"name":"IEEE\\/ASME Journal of Microelectromechanical Systems","volume":"31 1","pages":"648-654"},"PeriodicalIF":0.0,"publicationDate":"2002-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"87605299","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 44
Electrically tunable collective response in a coupled micromechanical array 耦合微机械阵列中的电调谐集体响应
IEEE\/ASME Journal of Microelectromechanical Systems Pub Date : 2002-12-16 DOI: 10.1109/JMEMS.2002.805056
E. Buks, M. Roukes
{"title":"Electrically tunable collective response in a coupled micromechanical array","authors":"E. Buks, M. Roukes","doi":"10.1109/JMEMS.2002.805056","DOIUrl":"https://doi.org/10.1109/JMEMS.2002.805056","url":null,"abstract":"We employ optical diffraction to study the mechanical properties of a grating array of suspended doubly clamped beams made of Au. The device allows application of electrostatic coupling between the beams that gives rise to formation of a band of normal modes of vibration (phonons). We parametrically excite these collective modes and study the response by measuring the diffraction signal. The results indicate that nonlinear effects strongly affect the dynamics of the system. Further optimization will allow employing similar systems for real-time mechanical spectrum analysis of electrical waveforms.","PeriodicalId":13438,"journal":{"name":"IEEE\\/ASME Journal of Microelectromechanical Systems","volume":"22 1","pages":"802-807"},"PeriodicalIF":0.0,"publicationDate":"2002-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"75660423","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 149
Piezoresistive accelerometers for MCM package 用于MCM封装的压阻式加速度计
IEEE\/ASME Journal of Microelectromechanical Systems Pub Date : 2002-12-16 DOI: 10.1109/JMEMS.2002.805213
J. Plaza, A. Collado, E. Cabruja, J. Esteve
{"title":"Piezoresistive accelerometers for MCM package","authors":"J. Plaza, A. Collado, E. Cabruja, J. Esteve","doi":"10.1109/JMEMS.2002.805213","DOIUrl":"https://doi.org/10.1109/JMEMS.2002.805213","url":null,"abstract":"Describes the first steps carried out for the integration of piezoresistive accelerometers in an MCM-D (D-type multichip modules with flip-chip interconnection) package. The bulk micromachined accelerometer technology and its modification to comply with MCM-D packaging technology requirements are presented. The accelerometer technology is based on BESOI (Bond and Etch Back Silicon-On-Insulator) wafers. The main characteristic of this technology is the use of the buried silicon oxide layer as an etch stop and as a sacrificial layer. In addition, over-range protection and self-test systems are defined without any additional photolithographic step or process. The flip chip attachment requires solderable metals in the bump pads. In addition, a sealing ring has been defined around the movable parts of the sensors to protect them from the underfill used during the final packaging process. Cantilever beam accelerometers with a self-test system are presented as example of the combined technology. The design, simulation, fabrication and characterization of the devices prior to the MCM-D packaging are presented as well.","PeriodicalId":13438,"journal":{"name":"IEEE\\/ASME Journal of Microelectromechanical Systems","volume":"29 1","pages":"794-801"},"PeriodicalIF":0.0,"publicationDate":"2002-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"90229776","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 54
Miniaturization and integration of photoacoustic detection with a microfabricated chemical reactor system 光声探测与微型化学反应器系统的小型化与集成化
IEEE\/ASME Journal of Microelectromechanical Systems Pub Date : 2001-06-01 DOI: 10.1007/978-94-017-2264-3_10
S. Firebaugh, K. Jensen, M. Schmidt
{"title":"Miniaturization and integration of photoacoustic detection with a microfabricated chemical reactor system","authors":"S. Firebaugh, K. Jensen, M. Schmidt","doi":"10.1007/978-94-017-2264-3_10","DOIUrl":"https://doi.org/10.1007/978-94-017-2264-3_10","url":null,"abstract":"","PeriodicalId":13438,"journal":{"name":"IEEE\\/ASME Journal of Microelectromechanical Systems","volume":"4 1","pages":"232-237"},"PeriodicalIF":0.0,"publicationDate":"2001-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"74143229","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 47
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