Electrodeposition and Surface Treatment最新文献_第9页

Dry friction of manganese phosphate coatings on steel and cast iron 钢和铸铁上磷酸锰涂层的干摩擦

Electrodeposition and Surface Treatment Pub Date : 1974-01-01 DOI: 10.1016/0300-9416(74)90009-1

Andrzej KozŁowski

引用次数: 22

Electrodeposition of ternary alloys of iron-cobalt-cadmium from the sulphate bath 硫酸盐浴电沉积铁钴镉三元合金

Electrodeposition and Surface Treatment Pub Date : 1974-01-01 DOI: 10.1016/0300-9416(74)90008-X

S.K. Narang, T.L.Rama Char

引用次数: 2

Electrolyte contamination effects of the high temperature deposition of barrier anodic films on aluminium in aqueous solutions 在水溶液中沉积阻挡阳极膜对铝的电解质污染效应

Electrodeposition and Surface Treatment Pub Date : 1974-01-01 DOI: 10.1016/0300-9416(74)90011-X

S. Ikonopisov, L. Andreeva

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引用次数: 4

Identification of the cause of embrittlement in annealed low current density nickel electrodeposits 退火低电流密度镍镀层脆化原因分析

Electrodeposition and Surface Treatment Pub Date : 1974-01-01 DOI: 10.1016/0300-9416(74)90010-8

D.M. Braddick , S.J. Harris

引用次数: 1

Boron and boron carbide by vapor deposition 气相沉积硼和碳化硼

Electrodeposition and Surface Treatment Pub Date : 1974-01-01 DOI: 10.1016/0300-9416(74)90012-1

J.G. Donaldson, J.B. Stephenson, A.A. Cochran

{"title":"Boron and boron carbide by vapor deposition","authors":"J.G. Donaldson, J.B. Stephenson, A.A. Cochran","doi":"10.1016/0300-9416(74)90012-1","DOIUrl":"10.1016/0300-9416(74)90012-1","url":null,"abstract":"<div>Boron trichloride can be reduced by hydrogen at 1,300°C with a recovery of approximately 85% as elemental boron. The optimum H2 to BCl3 molar ratio was 30 under the test conditions used. No reaction between tungsten substrates and the boron deposits could be detected. Other substrate materials tested, in order of increasing reactivity with the depositing boron, were fused silica, mullite, graphite, titanium and nickel. Alumina reacted extensively with the chloride gases to form aluminum chloride.BBr3 can be reduced by hydrogen at slightly lower temperatures than can BCl3, but this advantage is probably outweighed by the lower boron content, lower volatility and higher cost of BBr3.When stoichiometric amounts of BCl3 and CH4 were reacted with an excess of H2 at 1,300°C, B4C deposits were obtained. An excess of CH4 in the reaction mixture resulted in the codeposition of B4C and free carbon. B4C deposits contained 74.7 to 76.0% boron, compared with 78.3% for pure B4C. The specific gravity of the B4C was 2.32, which is 90% or more of the theoretical value. The Knoop microhardness of one B4C deposit on a mullite substrate was 3,472.A method of etching B4C was developed and used. Etching revealed that the B4C deposits had a columnar microstructure with the columns perpendicular to the substrate.When BCl3 was reduced with H2 at 1,500°C with a graphite substrate, the depositing boron reacted with the graphite to produce uniform, strongly adherent coatings of B4C on graphite. The Knoop microhardness of two of these B4C coatings was 3,065 and 3,195, which corresponds to a Mohs hardness of approximately 9. Graphite coated with B4C has many physical and chemical properties that would be desirable in rocket nozzle applications.</div>","PeriodicalId":100399,"journal":{"name":"Electrodeposition and Surface Treatment","volume":"2 2","pages":"Pages 149-163"},"PeriodicalIF":0.0,"publicationDate":"1974-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0300-9416(74)90012-1","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"86973843","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 8

1974 Gorden research conference on electrochemistry 1974年戈登电化学研究会议

Electrodeposition and Surface Treatment Pub Date : 1974-01-01 DOI: 10.1016/0300-9416(74)90013-3

引用次数: 0

The performance of electrodeposited iron plate in contact with lead-tin alloys 电沉积铁板与铅锡合金接触时的性能

Electrodeposition and Surface Treatment Pub Date : 1973-11-01 DOI: 10.1016/0300-9416(73)90005-9

G.R. Perger, P.M. Robinson

引用次数: 2

Application of the low-temperature CVD process 低温CVD工艺的应用

Electrodeposition and Surface Treatment Pub Date : 1973-11-01 DOI: 10.1016/0300-9416(73)90003-5

K.H. Bloss, H. Lukas

引用次数: 1

Variation des tensions internes et de l'epaisseur de fissuration des revetements electrolytiques Ni-Mo avec les conditions experimentales 实验条件下镍钼电解涂层内应力和开裂厚度的变化

Electrodeposition and Surface Treatment Pub Date : 1973-11-01 DOI: 10.1016/0300-9416(73)90004-7

Elizabeth Chassaing, Vu Quang Kinh

引用次数: 1

Electrodeposition from liquid ammonia solutions 用液氨溶液电沉积

Electrodeposition and Surface Treatment Pub Date : 1973-11-01 DOI: 10.1016/0300-9416(73)90002-3

E.W. Brooman

引用次数: 5