Application of the low-temperature CVD process

The low-temperature CVD process, a specific version of the single vapour deposition procedure, is presented and its potential applications are described. The important features that have led to the designation “low-temperature CVD process” are outlined.

Besides organometals as pyrolyzable compounds, evaporation and pyrolysis, diffusion zone and gas dynamics, the determination of the deposition conditions especially are discussed in detail. This discussion covers practice-oriented rather than theoretical approaches to the problem.

Following the above-mentioned line, the applications of depostion from the vapour phase at low temperatures are discussed. This discussion includes protective coatings against corrosion and wear, optical and decorative coatings, pigments and fillers.