{"title":"IEEE Open Access Publishing","authors":"","doi":"10.1109/TEMC.2024.3512241","DOIUrl":"10.1109/TEMC.2024.3512241","url":null,"abstract":"","PeriodicalId":55012,"journal":{"name":"IEEE Transactions on Electromagnetic Compatibility","volume":"66 6","pages":"1922-1922"},"PeriodicalIF":2.0,"publicationDate":"2024-12-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10807761","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142858266","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"计算机科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"IEEE Transactions on Electromagnetic Compatibility Information for Authors","authors":"","doi":"10.1109/TEMC.2024.3504877","DOIUrl":"10.1109/TEMC.2024.3504877","url":null,"abstract":"","PeriodicalId":55012,"journal":{"name":"IEEE Transactions on Electromagnetic Compatibility","volume":"66 6","pages":"C3-C3"},"PeriodicalIF":2.0,"publicationDate":"2024-12-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10807763","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142858268","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"计算机科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"IEEE Transactions on Electromagnetic Compatibility Information for Authors","authors":"","doi":"10.1109/TEMC.2024.3504886","DOIUrl":"10.1109/TEMC.2024.3504886","url":null,"abstract":"","PeriodicalId":55012,"journal":{"name":"IEEE Transactions on Electromagnetic Compatibility","volume":"66 6","pages":"C3-C3"},"PeriodicalIF":2.0,"publicationDate":"2024-12-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10807728","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142858272","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"计算机科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Editorial: Introduction to the Special Issue on AI, Machine Learning, and Deep Learning: Advances and Applications for EMC","authors":"Alistair Duffy;En-Xiao Liu","doi":"10.1109/TEMC.2024.3504693","DOIUrl":"10.1109/TEMC.2024.3504693","url":null,"abstract":"Not many technologies have ever captured the public imagination as widely and abruptly as artificial intelligence (AI). While AI has been a staple of science fiction for decades with actual applications in engineering and sciences for many years, it is only in the last year or so that generative AI tools have enthused and engaged so many people. All of a sudden, our general consciousness sees AI as so accessible and so normalized. This is particularly evident that you wish to do a simple web search of AI tools available online or perhaps check out the libraries and toolboxes of your favorite programming languages.","PeriodicalId":55012,"journal":{"name":"IEEE Transactions on Electromagnetic Compatibility","volume":"66 6","pages":"1926-1927"},"PeriodicalIF":2.0,"publicationDate":"2024-12-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10807760","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142858265","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"计算机科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Share your Preprint Research with the World!","authors":"","doi":"10.1109/TEMC.2024.3512273","DOIUrl":"10.1109/TEMC.2024.3512273","url":null,"abstract":"","PeriodicalId":55012,"journal":{"name":"IEEE Transactions on Electromagnetic Compatibility","volume":"66 6","pages":"1924-1924"},"PeriodicalIF":2.0,"publicationDate":"2024-12-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10807739","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142858270","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"计算机科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Toward Enhancing Soil Resistivity Measurement and Modelling for Limited Interelectrode Spacing","authors":"Omar Kherif;Stephen Robson;Salah Mousa;Noureddine Harid;Huw Griffiths;David Thorpe;Abderrahmane Haddad","doi":"10.1109/TEMC.2024.3514772","DOIUrl":"10.1109/TEMC.2024.3514772","url":null,"abstract":"This article explores the influence of the maximum interelectrode spacing in soil resistivity measurements on the 1-D soil modeling process. Soil equivalent models are generated based on actual measurements using a Wenner configuration. The results indicate that soil resistivity models are significantly impacted by the maximum interelectrode spacing. For short spacings, rms errors ranging from over 19% to approximately 26% are observed, leading to up to a 5% reduction in upper layer resistivity and a 45% difference in the lower layer resistivity. To address this issue, a practical solution is proposed to improve the measurement and modeling process for sites with limited interelectrode spacing. The viability and rationale behind this solution are discussed and verified using extensive additional measurements. The verification process yielded positive results, confirming the potential of the proposed method for two-layer soils, as considerable improvement in the soil model was achieved. To cover additional scenarios and simulate measurements at different locations, synthetic data based on theoretical expressions are also considered. The synthetic data provided further evidence of the effectiveness of the proposed solution, but also highlights the need for further investigations to generalize the method for soils with a greater number of layers.","PeriodicalId":55012,"journal":{"name":"IEEE Transactions on Electromagnetic Compatibility","volume":"67 2","pages":"374-383"},"PeriodicalIF":2.0,"publicationDate":"2024-12-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142848910","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"计算机科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Response of Metal-Oxide Varistors Excited by Consecutive Early-Time and Intermediate-Time HEMP Conducted Currents","authors":"Dao-zhong Zhang;Yan-zhao Xie;Yi Zhou;Yun-peng Zhang","doi":"10.1109/TEMC.2024.3514685","DOIUrl":"10.1109/TEMC.2024.3514685","url":null,"abstract":"High-altitude electromagnetic pulse (HEMP) can be divided into three parts: 1) early-time HEMP (E1); 2) intermediate-time HEMP (E2); and 3) late-time HEMP (E3). Most studies focus on E1 alone, as E2 and E3 pose lower peak value, especially E2, which is considered less severe than lightning. However, E2 coexists with E1 and affects victim equipment simultaneously, which may result in different effects than E1 or E2 alone. As the most widely used surge protection device, the behavior of metal-oxide varistors (MOVs) under the consecutive E1 and E2 should be investigated and compared with those under E1 or E2 alone. Based on a pulse current injection platform, the voltage, current, susceptibility, and nonuniformity behavior of two types of MOVs under the separate E1, E2, and consecutive E1 and E2 disturbances are investigated and compared. The peak residual voltages of the MOV samples under consecutive E1 and E2 disturbances reach 15 kV, which is the same as that under the E1 disturbance and much higher than that under the E2 disturbance (1.5 kV). The MOV samples are more sensitive to the consecutive E1 and E2 disturbance, particularly those with a higher nonuniformity. Finally, the response process is discussed based on the microstructural nonuniformity of MOVs.","PeriodicalId":55012,"journal":{"name":"IEEE Transactions on Electromagnetic Compatibility","volume":"67 1","pages":"191-199"},"PeriodicalIF":2.0,"publicationDate":"2024-12-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142848919","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"计算机科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}