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Journal of micro/nanopatterning, materials, and metrology最新文献

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Reconstruction of the in-depth profile of line gratings with critical dimension grazing incidence small angle x-ray scattering on laboratory equipment 临界尺寸掠入射小角x射线散射线光栅在实验室设备上的深度轮廓重建
Journal of micro/nanopatterning, materials, and metrology Pub Date : 2023-06-24 DOI: 10.1117/1.jmm.22.3.031210
Guillaume Freychet, Guido Rademaker, Yoann Blancquaert, Patrice Gergaud
{"title":"Reconstruction of the in-depth profile of line gratings with critical dimension grazing incidence small angle x-ray scattering on laboratory equipment","authors":"Guillaume Freychet, Guido Rademaker, Yoann Blancquaert, Patrice Gergaud","doi":"10.1117/1.jmm.22.3.031210","DOIUrl":"https://doi.org/10.1117/1.jmm.22.3.031210","url":null,"abstract":"We present a reconstruction of the in-depth profile of line gratings using critical-dimension grazing incidence small angle x-ray scattering with a compact Cu-Kα x-ray source mounted on a laboratory small angle x-ray scattering (SAXS). By taking advantage of the grazing-incidence configuration and with a rotation of the gratings under the x-ray beam, several orders of the Bragg rods were probed and led to the extraction of the in-depth profile of the lines. The extracted in-depth profile is compared with 3D atomic force microscopy results. The methodology developed mimics the one of critical dimension SAXS measurements, in transmission, to enable future comparison between the two approaches as well as building complementary modeling. These results open new perspectives for in-line x-ray metrology since the Cu-Kα x-ray source is widely spread and used by the x-ray community.","PeriodicalId":499761,"journal":{"name":"Journal of micro/nanopatterning, materials, and metrology","volume":"11 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-06-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"135904317","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Development of deep ultraviolet optical maskless exposure tool for advanced lithography 先进光刻用深紫外光学无掩模曝光工具的研制
Journal of micro/nanopatterning, materials, and metrology Pub Date : 2023-06-05 DOI: 10.1117/1.jmm.22.4.041403
Yoji Watanabe, Yuho Kanaya, Yusuke Saito, Toshiaki Sakamoto, Kazuo Masaki, Soichi Owa, Thomas Koo, David Tseng, Conrad Sorensen, Bryant Lin, Michael Tan, Sujuan Li, Stephen Renwick, Noriyuki Hirayanagi, Bausan Yuan
{"title":"Development of deep ultraviolet optical maskless exposure tool for advanced lithography","authors":"Yoji Watanabe, Yuho Kanaya, Yusuke Saito, Toshiaki Sakamoto, Kazuo Masaki, Soichi Owa, Thomas Koo, David Tseng, Conrad Sorensen, Bryant Lin, Michael Tan, Sujuan Li, Stephen Renwick, Noriyuki Hirayanagi, Bausan Yuan","doi":"10.1117/1.jmm.22.4.041403","DOIUrl":"https://doi.org/10.1117/1.jmm.22.4.041403","url":null,"abstract":"Digital scanner (DS), a deep ultraviolet optical maskless exposure tool is being developed. DS uses a micromirror-type spatial light modulator to create the “mask” pattern combined with a solid-state laser with a wavelength of 193 or 248 nm. The exposure concept of DS and advantage of solid-state laser as an exposure light source is described. DS proof-of-concept tool with resolution of half-pitch 80 nm L/S was developed. The exposure results of maskless unique application, such as large area printing and chip ID printing for security purposes, are shown.","PeriodicalId":499761,"journal":{"name":"Journal of micro/nanopatterning, materials, and metrology","volume":"75 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-06-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"135658689","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
2022 List of Reviewers 2022年评审人员名单
Journal of micro/nanopatterning, materials, and metrology Pub Date : 2023-01-13 DOI: 10.1117/1.jmm.22.1.010102
{"title":"2022 List of Reviewers","authors":"","doi":"10.1117/1.jmm.22.1.010102","DOIUrl":"https://doi.org/10.1117/1.jmm.22.1.010102","url":null,"abstract":"","PeriodicalId":499761,"journal":{"name":"Journal of micro/nanopatterning, materials, and metrology","volume":"92 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-01-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"135898124","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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