Development of deep ultraviolet optical maskless exposure tool for advanced lithography

Abstract

Digital scanner (DS), a deep ultraviolet optical maskless exposure tool is being developed. DS uses a micromirror-type spatial light modulator to create the “mask” pattern combined with a solid-state laser with a wavelength of 193 or 248 nm. The exposure concept of DS and advantage of solid-state laser as an exposure light source is described. DS proof-of-concept tool with resolution of half-pitch 80 nm L/S was developed. The exposure results of maskless unique application, such as large area printing and chip ID printing for security purposes, are shown.