Yoji Watanabe, Yuho Kanaya, Yusuke Saito, Toshiaki Sakamoto, Kazuo Masaki, Soichi Owa, Thomas Koo, David Tseng, Conrad Sorensen, Bryant Lin, Michael Tan, Sujuan Li, Stephen Renwick, Noriyuki Hirayanagi, Bausan Yuan
{"title":"先进光刻用深紫外光学无掩模曝光工具的研制","authors":"Yoji Watanabe, Yuho Kanaya, Yusuke Saito, Toshiaki Sakamoto, Kazuo Masaki, Soichi Owa, Thomas Koo, David Tseng, Conrad Sorensen, Bryant Lin, Michael Tan, Sujuan Li, Stephen Renwick, Noriyuki Hirayanagi, Bausan Yuan","doi":"10.1117/1.jmm.22.4.041403","DOIUrl":null,"url":null,"abstract":"Digital scanner (DS), a deep ultraviolet optical maskless exposure tool is being developed. DS uses a micromirror-type spatial light modulator to create the “mask” pattern combined with a solid-state laser with a wavelength of 193 or 248 nm. The exposure concept of DS and advantage of solid-state laser as an exposure light source is described. DS proof-of-concept tool with resolution of half-pitch 80 nm L/S was developed. The exposure results of maskless unique application, such as large area printing and chip ID printing for security purposes, are shown.","PeriodicalId":499761,"journal":{"name":"Journal of micro/nanopatterning, materials, and metrology","volume":"75 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2023-06-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Development of deep ultraviolet optical maskless exposure tool for advanced lithography\",\"authors\":\"Yoji Watanabe, Yuho Kanaya, Yusuke Saito, Toshiaki Sakamoto, Kazuo Masaki, Soichi Owa, Thomas Koo, David Tseng, Conrad Sorensen, Bryant Lin, Michael Tan, Sujuan Li, Stephen Renwick, Noriyuki Hirayanagi, Bausan Yuan\",\"doi\":\"10.1117/1.jmm.22.4.041403\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Digital scanner (DS), a deep ultraviolet optical maskless exposure tool is being developed. DS uses a micromirror-type spatial light modulator to create the “mask” pattern combined with a solid-state laser with a wavelength of 193 or 248 nm. The exposure concept of DS and advantage of solid-state laser as an exposure light source is described. DS proof-of-concept tool with resolution of half-pitch 80 nm L/S was developed. The exposure results of maskless unique application, such as large area printing and chip ID printing for security purposes, are shown.\",\"PeriodicalId\":499761,\"journal\":{\"name\":\"Journal of micro/nanopatterning, materials, and metrology\",\"volume\":\"75 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2023-06-05\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of micro/nanopatterning, materials, and metrology\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1117/1.jmm.22.4.041403\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of micro/nanopatterning, materials, and metrology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/1.jmm.22.4.041403","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Development of deep ultraviolet optical maskless exposure tool for advanced lithography
Digital scanner (DS), a deep ultraviolet optical maskless exposure tool is being developed. DS uses a micromirror-type spatial light modulator to create the “mask” pattern combined with a solid-state laser with a wavelength of 193 or 248 nm. The exposure concept of DS and advantage of solid-state laser as an exposure light source is described. DS proof-of-concept tool with resolution of half-pitch 80 nm L/S was developed. The exposure results of maskless unique application, such as large area printing and chip ID printing for security purposes, are shown.
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