2016 14th International Baltic Conference on Atomic Layer Deposition (BALD)最新文献

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On the splitting method for the numerical solution of Boltzmann and lattice Boltzmann equations for gas flows in microsystems 微系统气体流动玻尔兹曼方程和晶格玻尔兹曼方程数值解的分裂方法
2016 14th International Baltic Conference on Atomic Layer Deposition (BALD) Pub Date : 2016-10-01 DOI: 10.1109/BALD.2016.7886538
G. Krivovichev, E. S. Marnopolskaya
{"title":"On the splitting method for the numerical solution of Boltzmann and lattice Boltzmann equations for gas flows in microsystems","authors":"G. Krivovichev, E. S. Marnopolskaya","doi":"10.1109/BALD.2016.7886538","DOIUrl":"https://doi.org/10.1109/BALD.2016.7886538","url":null,"abstract":"The modification of the splitting method for single kinetic equation or for the system of kinetic equations with discrete velocities is considered. The modification is based on the iterative procedure for the implicit Euler approximation on the collision stage of the method. The optimization problem for the hybrid scheme for linear equation of an advection stage is solved. Reported results may be applied in fluid and gas dynamics problems for the flows in natural and mechanical microsystems.","PeriodicalId":328869,"journal":{"name":"2016 14th International Baltic Conference on Atomic Layer Deposition (BALD)","volume":"352 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115977822","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
The holistic method of the surface structure characterization 表面结构表征的整体方法
2016 14th International Baltic Conference on Atomic Layer Deposition (BALD) Pub Date : 2016-10-01 DOI: 10.1109/BALD.2016.7886525
V. N. Petrushin, Y. Rudyak, G. Rytikov
{"title":"The holistic method of the surface structure characterization","authors":"V. N. Petrushin, Y. Rudyak, G. Rytikov","doi":"10.1109/BALD.2016.7886525","DOIUrl":"https://doi.org/10.1109/BALD.2016.7886525","url":null,"abstract":"We investigate the possibility of modified polymers' surfaces micro- and nanostructures description and classification. We discuss the analysis of topographic features of the surface, the two-dimensional Fourier analysis and the empirical distributions that characterize the separate typed elements of the considered surfaces.","PeriodicalId":328869,"journal":{"name":"2016 14th International Baltic Conference on Atomic Layer Deposition (BALD)","volume":"62 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126796453","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Characterization of nonstoichiometric silicon nitride PECVD/ALD films for IR micro-detectors array 用于红外微探测器阵列的非化学计量氮化硅PECVD/ALD薄膜的表征
2016 14th International Baltic Conference on Atomic Layer Deposition (BALD) Pub Date : 2016-10-01 DOI: 10.1109/BALD.2016.7886527
G. Rudakov, A. Sigarev, V. Fedirko, E. A. Fetisov
{"title":"Characterization of nonstoichiometric silicon nitride PECVD/ALD films for IR micro-detectors array","authors":"G. Rudakov, A. Sigarev, V. Fedirko, E. A. Fetisov","doi":"10.1109/BALD.2016.7886527","DOIUrl":"https://doi.org/10.1109/BALD.2016.7886527","url":null,"abstract":"Selective absorption of nonstoichiometric silicon nitride (SixNy) thin films on silicon substrates was studied by infrared (IR) spectroscopy in the region of wavenumbers 500–7500 1/cm. For the transmission and reflection spectra of SixNy layers of various thicknesses the analysis of the absorption band of the Si-N stretching vibrations in the region 700–1100 1/cm with the peak at 820–900 1/cm was carried out. The absorption coefficient for IR radiation at wavenumber 850 1/cm was found to be about 1.02 1/um. The estimated absorption of IR radiation in SixNy layers with thicknesses in the range of 270–1300 nm was found of 45–64% depending on layer thickness.","PeriodicalId":328869,"journal":{"name":"2016 14th International Baltic Conference on Atomic Layer Deposition (BALD)","volume":"329 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129447659","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Multilayer nano-structured field emitters for formation of high density electron beams in minituarized devices 用于在小型化装置中形成高密度电子束的多层纳米结构场发射体
2016 14th International Baltic Conference on Atomic Layer Deposition (BALD) Pub Date : 2016-10-01 DOI: 10.1109/BALD.2016.7886539
G. Sominskii, V. Sezonov
{"title":"Multilayer nano-structured field emitters for formation of high density electron beams in minituarized devices","authors":"G. Sominskii, V. Sezonov","doi":"10.1109/BALD.2016.7886539","DOIUrl":"https://doi.org/10.1109/BALD.2016.7886539","url":null,"abstract":"The operation of the field emitters, consisting of nano-layers of materials with different work function was investigated in continuous mode. Dependence of the emission current on the thickness of the layers was calculated and experimentally measured. There were obtained currents ∼ 170– 180 mkA and current density up to 10 A/cm from the cathods containing 40 pairs of layers Yb-C. Tested cathodes stably operated in technical vacuum conditions.","PeriodicalId":328869,"journal":{"name":"2016 14th International Baltic Conference on Atomic Layer Deposition (BALD)","volume":"88 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126015943","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
Modeling of fluctuations for the field electron emission current density 场电子发射电流密度波动的建模
2016 14th International Baltic Conference on Atomic Layer Deposition (BALD) Pub Date : 2016-10-01 DOI: 10.1109/BALD.2016.7886532
A. Y. Antonov, Ya. I. Rusina, M. I. Varayun'
{"title":"Modeling of fluctuations for the field electron emission current density","authors":"A. Y. Antonov, Ya. I. Rusina, M. I. Varayun'","doi":"10.1109/BALD.2016.7886532","DOIUrl":"https://doi.org/10.1109/BALD.2016.7886532","url":null,"abstract":"This work considers the problem of modeling of current density fluctuations in conditions of field electron emission. The transmission coefficient of the potential barrier at the emitter surface is calculated with the Runge—Kutta—Nyström method of 12-th order with Dormand—Prince coefficients. The electron supply function is corresponded to metal cathode with tungsten parameters under normal conditions. The emission current density is obtained through the Monte Carlo integration of the external electron distribution. The Shapiro—Wilk normality test for a random current density values is performed. Estimations and confidence intervals for the mean and standard deviation are presented. The dependence of the emission signal noise from the nodes number in a random quadrature formula is constructed.","PeriodicalId":328869,"journal":{"name":"2016 14th International Baltic Conference on Atomic Layer Deposition (BALD)","volume":"11 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"117136365","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
I–V curve investigation with regression methods 用回归方法研究I-V曲线
2016 14th International Baltic Conference on Atomic Layer Deposition (BALD) Pub Date : 2016-10-01 DOI: 10.1109/BALD.2016.7886533
A. Y. Antonov, M. I. Varayun'
{"title":"I–V curve investigation with regression methods","authors":"A. Y. Antonov, M. I. Varayun'","doi":"10.1109/BALD.2016.7886533","DOIUrl":"https://doi.org/10.1109/BALD.2016.7886533","url":null,"abstract":"Currently, field electron emission is an indispensable tool for studying advanced materials. Analysis of the current-voltage (I–V ) dependences allows us to derive information about some characteristics of the field-emission cathode (i.e., work function or field enhancement factor values). It is known that in the Fowler—Nordheim coordinates I–V curve is linear. A linear approximation can be constructed with the method of ordinary least squares (OLS). OLS is one of the basic methods of regression analysis used to estimate unknown parameters of regression models. However, reliable confidence intervals for the regression coefficients can only be easily obtained if the model residuals are normally distributed. This is impossible to assume about the log-transformed I–V curve. The scope of this paper is modeling of I–V dependence. The random errors of I measurements are normally distributed. We have constructed estimations of the coefficients in Fowler— Nordheim law (i.e. A and B) using methods of linear and nonlinear regression and shown that those approaches give different results. Errors of determining of the coefficients A and B are presented.","PeriodicalId":328869,"journal":{"name":"2016 14th International Baltic Conference on Atomic Layer Deposition (BALD)","volume":"44 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128138907","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Phenomenon of pulsed high-power electron emission from graphene-like structures and carbon nanotubes stimulated by electric field 类石墨烯结构和碳纳米管在电场刺激下的脉冲高功率电子发射现象
2016 14th International Baltic Conference on Atomic Layer Deposition (BALD) Pub Date : 2016-10-01 DOI: 10.1109/BALD.2016.7886535
G. Fursey, M. Polyakov, I. Zakirov
{"title":"Phenomenon of pulsed high-power electron emission from graphene-like structures and carbon nanotubes stimulated by electric field","authors":"G. Fursey, M. Polyakov, I. Zakirov","doi":"10.1109/BALD.2016.7886535","DOIUrl":"https://doi.org/10.1109/BALD.2016.7886535","url":null,"abstract":"A new type of pulsed electron emission has been discovered. This emission arises when the pulsed electron field of strength F ≥ 10 V/mkm is applied to the cathode made of graphene-like structure and multi-walled carbon nanotubes. This high power current emission makes possible the obtaining of pulsed currents of hundreds ampere in nanosecond range. This type of emission has the character of the charge-limited electron flash and can be called «Flash emission». The duration of the process depends on the strength of the electric field and decreases as the field strength increases. The characteristic emission times are 1–5 ns. The duration of the electron emission is determined by the value of the charge concentrated in the near-to-surface region of the graphene-like structure and carbon nanotubes. The recovery time of the initial state of the emitter after the extraction of the electron current, is in the range exceeding 300 ns.","PeriodicalId":328869,"journal":{"name":"2016 14th International Baltic Conference on Atomic Layer Deposition (BALD)","volume":"10 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132280858","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Measuring the thickness of ALD-fabricated thin films by small-angle X-ray scattering 小角x射线散射法测量ald薄膜厚度
2016 14th International Baltic Conference on Atomic Layer Deposition (BALD) Pub Date : 2016-10-01 DOI: 10.1109/BALD.2016.7886524
K. Nishchev, M. I. Novopoltsev, Natalia A. Ruzavina, V. S. Khramov, E. N. Lyutova
{"title":"Measuring the thickness of ALD-fabricated thin films by small-angle X-ray scattering","authors":"K. Nishchev, M. I. Novopoltsev, Natalia A. Ruzavina, V. S. Khramov, E. N. Lyutova","doi":"10.1109/BALD.2016.7886524","DOIUrl":"https://doi.org/10.1109/BALD.2016.7886524","url":null,"abstract":"The thickness of aluminum oxide thin films fabricated by technology of atomic layer deposition with different number of cycles measured by small angle X-ray scattering. The dependence of the film thickness in the range of 20–120 nm from the number of ALD process cycles is linear.","PeriodicalId":328869,"journal":{"name":"2016 14th International Baltic Conference on Atomic Layer Deposition (BALD)","volume":"642 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115061896","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Influence of ALD temperature on thin film conformality: Investigation with microscopic lateral high-aspect-ratio structures ALD温度对薄膜一致性的影响:微观横向高纵横比结构的研究
2016 14th International Baltic Conference on Atomic Layer Deposition (BALD) Pub Date : 2016-10-01 DOI: 10.1109/BALD.2016.7886526
R. Puurunen, F. Gao
{"title":"Influence of ALD temperature on thin film conformality: Investigation with microscopic lateral high-aspect-ratio structures","authors":"R. Puurunen, F. Gao","doi":"10.1109/BALD.2016.7886526","DOIUrl":"https://doi.org/10.1109/BALD.2016.7886526","url":null,"abstract":"Unparallelled conformality is driving the interest to use coatings made by atomic layer deposition (ALD) in a growing number of applications from microelectronics to catalysis to biomedical devices and beyond. Despite the fundamental importance of conformality, dedicated conformality studies of ALD processes have been scarcely reported, as available, easy-to-use conformality test structures have been missing. In earlier work, we have developed silicon-based lateral high-aspect-ratio (LHAR) test structures [J. Vac. Sci. Technol. A, 33, 010601 (2015)], which are used in this work to analyse the influence of ALD temperature on the conformality of aluminium oxide, titanium dioxide and their nanolaminates. With the LHAR structures of a gap height of 500 nm and aspect ratios (AR) up to 10 000:1, films grown at 110 to 300 degrees Celsius are observed enter typically up to an aspect ratio of 100∶1 to 200∶1. The temperature trend of conformality differs for aluminium oxide and titanium dioxide ALD processes: aluminium oxide penetrates deeper in the 3D structures at lower temperatures, while titanium dioxide has a maximum penetration depth at 200 degrees Celsius. An inverse correlation was seen between a decreasing ALD growth per cycle (GPC) and an increasing conformality. Metal reactant consumption along the trench is proposed to explain the correlation. Microscopic LHAR structures expose a new parameter space conformality analysis and are likely to enable novel experimental and theoretical conformality studies in the future in ALD and related fields.","PeriodicalId":328869,"journal":{"name":"2016 14th International Baltic Conference on Atomic Layer Deposition (BALD)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130531584","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 7
The sharp-edged field cathode mathematical modeling 锐边场阴极数学建模
2016 14th International Baltic Conference on Atomic Layer Deposition (BALD) Pub Date : 2016-10-01 DOI: 10.1109/BALD.2016.7886541
E. Vinogradova, N. Egorov, G. Doronin
{"title":"The sharp-edged field cathode mathematical modeling","authors":"E. Vinogradova, N. Egorov, G. Doronin","doi":"10.1109/BALD.2016.7886541","DOIUrl":"https://doi.org/10.1109/BALD.2016.7886541","url":null,"abstract":"In this work the axially symmetrical diode system based on a sharp-edged field cathode on a plane substrate is under investigation. Anode is a plane. All interior area of the system is filled with two dielectrics. To solve the boundary-value problem the variable separation method is used and an effect of the field cathode is simulated using the charged circular lines. The electrostatic potential distribution is represented as Fourier-Bessel expansion. The unknown coefficients in the expansion are a solution of the linear algebraic equations with constant coefficients.","PeriodicalId":328869,"journal":{"name":"2016 14th International Baltic Conference on Atomic Layer Deposition (BALD)","volume":"23 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133729891","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
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