Measuring the thickness of ALD-fabricated thin films by small-angle X-ray scattering

2016 14th International Baltic Conference on Atomic Layer Deposition (BALD) Pub Date : 2016-10-01 DOI:10.1109/BALD.2016.7886524

K. Nishchev, M. I. Novopoltsev, Natalia A. Ruzavina, V. S. Khramov, E. N. Lyutova

引用次数: 3

Abstract

The thickness of aluminum oxide thin films fabricated by technology of atomic layer deposition with different number of cycles measured by small angle X-ray scattering. The dependence of the film thickness in the range of 20–120 nm from the number of ALD process cycles is linear.

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小角x射线散射法测量ald薄膜厚度

用x射线小角散射测量了不同循环次数原子层沉积技术制备的氧化铝薄膜的厚度。在20 ~ 120 nm范围内，薄膜厚度与ALD工艺循环次数呈线性关系。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

2016 14th International Baltic Conference on Atomic Layer Deposition (BALD)

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