发布求助
文献互助 智能选刊 最新文献

International Conference on Thin Film Physics and Applications最新文献

筛选
英文 中文
Multilayer optics and applications in EUV and x-ray region 多层光学及其在EUV和x射线区的应用
International Conference on Thin Film Physics and Applications Pub Date : 2010-10-11 DOI: 10.1117/12.888275
Jingtao Zhu, Qiushi Huang, Haochuan Li, Yuchun Tu, Z. Song, L. Pan, Li Jiang, Xiaoqiang Wang, Fengli Wang, Zhong Zhang, Zhanshan Wang, Lingyan Chen
{"title":"Multilayer optics and applications in EUV and x-ray region","authors":"Jingtao Zhu, Qiushi Huang, Haochuan Li, Yuchun Tu, Z. Song, L. Pan, Li Jiang, Xiaoqiang Wang, Fengli Wang, Zhong Zhang, Zhanshan Wang, Lingyan Chen","doi":"10.1117/12.888275","DOIUrl":"https://doi.org/10.1117/12.888275","url":null,"abstract":"For extreme ultraviolet (EUV) radiation and soft X-rays, real part of the refractive indices of all materials are very close to unity, coupled with high absorption, makes the realization of high-reflective mirrors (just like visible and infrared light) impossible. Multilayer is a nano-structure, alternating of low- and high-Z materials in a periodic way, which can greatly enhance the reflectivity via the interference of light reflected from interfaces, like crystal optics. Reflective mirrors, polarization elements, monochromators, etc, can be made basing on multi-layer structures. Zone plate is a powerful tool to focus the light beam for EUV and soft X-ray into nanometer scale, which is produced by electron beam etching method. However, for hard X-ray, the zone plate will has smaller width of outmost layer and larger aspect ratio, which is difficult to realize. Multilayer Laue lens (MLL) is a promising method to overcome these limitations. MLL is a novel linear zone plate which is produced by depositing the depth-graded multilayer, according to the zone plate law reversely, on flat substrate and then slicing and polishing it to an ideal aspect ratio. In this paper, some recent development of multilayer optics for EUV and X-ray regions in IPOE will be introduced.","PeriodicalId":316559,"journal":{"name":"International Conference on Thin Film Physics and Applications","volume":"4 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-10-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122237556","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Fabrication of nanopores utilizing SiC/Si(001) heteroepitaxial growth on SOI substrates: nanopore density control 在SOI衬底上利用SiC/Si(001)异质外延生长制备纳米孔:纳米孔密度控制
International Conference on Thin Film Physics and Applications Pub Date : 2010-10-11 DOI: 10.1117/12.888388
H. Yahaya, Y. Ikoma, K. Kuriyama, T. Motooka
{"title":"Fabrication of nanopores utilizing SiC/Si(001) heteroepitaxial growth on SOI substrates: nanopore density control","authors":"H. Yahaya, Y. Ikoma, K. Kuriyama, T. Motooka","doi":"10.1117/12.888388","DOIUrl":"https://doi.org/10.1117/12.888388","url":null,"abstract":"We have investigated the nanopore formation utilizing SiC/Si (001) heteroepitaxial growth. Inverse pyramidal pits were produced by {111} faceted on the top of Si layer of Silicon on Insulator (001) substrate after SiC growth by using CH3SiH3 pulse jet chemical vapor deposition. Randomly distributed nanopores with the size of ~10 nm were obtained after dipped into BHF solution for etching the buried oxide layer through the top of the pit. It was found that the densities of the pits and the nanopores strongly depend on the initial SiC nucleation density which can be controlled by the pulse frequency and number of CH3SiH3 pulse jets.","PeriodicalId":316559,"journal":{"name":"International Conference on Thin Film Physics and Applications","volume":"113 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-10-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125538819","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Effect of silica doping on the stability of gasochromic films 二氧化硅掺杂对气相变色膜稳定性的影响
International Conference on Thin Film Physics and Applications Pub Date : 2010-10-11 DOI: 10.1117/12.888323
Jiandong Wu, Guang-ming Wu, G. Gao, Zenghai Zhang, W. Feng, Jun Shen, Zhihua Zhang
{"title":"Effect of silica doping on the stability of gasochromic films","authors":"Jiandong Wu, Guang-ming Wu, G. Gao, Zenghai Zhang, W. Feng, Jun Shen, Zhihua Zhang","doi":"10.1117/12.888323","DOIUrl":"https://doi.org/10.1117/12.888323","url":null,"abstract":"WO3 has emerged as one of the most extensively studied materials because its gasochromic effect can be used for smart window and gas sensor; currently it is widely used in many energy conservation areas. Compared with other preparations methods for gasoschromic films, sol-gel process shows several advantages, such as low cost and large-scale applications. However, sol-gel WO3 films were not stable enough for commercial application yet. In this paper, we first investigated the effect of SiO2 doping, which exhibited good enhancement of WO3 gasochromic films' stability. We also examined the relationship between SiO2 ratio and stability of WO3/SiO2 films. An empirical formula was established by fitting exponential decay of the coloring-bleaching cycles for four different Si/W ratios.","PeriodicalId":316559,"journal":{"name":"International Conference on Thin Film Physics and Applications","volume":"26 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-10-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123217216","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Design, fabrication and characterization of dispersive mirrors for ultrafast lasers 超快激光器色散镜的设计、制造与表征
International Conference on Thin Film Physics and Applications Pub Date : 2010-10-11 DOI: 10.1117/12.888171
Weidong Shen, Q. Ma, Zhen-fei Luo, Shuna Zhang, Yue-guang Zhang, X. Liu
{"title":"Design, fabrication and characterization of dispersive mirrors for ultrafast lasers","authors":"Weidong Shen, Q. Ma, Zhen-fei Luo, Shuna Zhang, Yue-guang Zhang, X. Liu","doi":"10.1117/12.888171","DOIUrl":"https://doi.org/10.1117/12.888171","url":null,"abstract":"The design, fabrication and characterization of the dispersive multilayers are presented in this paper. Two kinds of dispersive mirror (High dispersion and 700-900nm Gires-Tournois mirrors) are designed by employing Particle Swarm Optimization method which demonstrates fast convergence speed and less dependence on the initial parameters. The mirrors are experimentally fabricated by home-made dual ion beam sputtering system with stable deposition rate and high density. A white light interferometry is built for precisely measuring the dispersion properties. A novel wavelet-based differentiation approach is introduced with considerable resistance to measurement error. The good agreement between the measured and designed results verifies the accuracy of both the fabrication and characterization method. Finally, two applications of Yb-doped photonic crystal fiber laser and Ti:Sapphire crystal oscillation cavity, which use our fabricated mirrors for dispersion compensation, are presented. Good output characteristics of both the two ultrafast laser systems are obtained.","PeriodicalId":316559,"journal":{"name":"International Conference on Thin Film Physics and Applications","volume":"67 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-10-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"117304608","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Oriented SnS thin films formed by nano-multilayer method 纳米多层法制备取向SnS薄膜
International Conference on Thin Film Physics and Applications Pub Date : 2010-10-11 DOI: 10.1117/12.888219
Zhan Xu, Yigang Chen, Wei-min Shi, Linjun Wang
{"title":"Oriented SnS thin films formed by nano-multilayer method","authors":"Zhan Xu, Yigang Chen, Wei-min Shi, Linjun Wang","doi":"10.1117/12.888219","DOIUrl":"https://doi.org/10.1117/12.888219","url":null,"abstract":"Tin sulfide (SnS) thin films were prepared by nano-multilayer method on glass substrate followed by thermal annealing at 400 degrees for 3 hours in Argon atmosphere. The films showed strong (040) crystal orientation for the films with stoichiometric ratio (Sn:S) of 1:1. The film had an optical energy band gap Eg=1.44 ev and a P-type conductivity with a resistivity of 5 Ω•cm.","PeriodicalId":316559,"journal":{"name":"International Conference on Thin Film Physics and Applications","volume":"7995 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-10-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130879122","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Experiment study on laser damage characteristics of diamond-like carbon films 类金刚石碳膜激光损伤特性的实验研究
International Conference on Thin Film Physics and Applications Pub Date : 2010-10-11 DOI: 10.1117/12.888186
Shenjiang Wu, W. Shi, Junhong Su, Junqi Xu, Yingxue Xi
{"title":"Experiment study on laser damage characteristics of diamond-like carbon films","authors":"Shenjiang Wu, W. Shi, Junhong Su, Junqi Xu, Yingxue Xi","doi":"10.1117/12.888186","DOIUrl":"https://doi.org/10.1117/12.888186","url":null,"abstract":"Diamond-like carbon (DLC) films were deposited by the Unbalanced Magnetron Sputtering(UBMS) technique which was under the conditions of bias 80V, target current 110A, argon flow 200SCCM, excitation current 100A; experimental platform was built for Laser-induced damage threshold(LIDT). The DLC films was irradiated by the laser (Wavelength 1046nm, pulse width 10ns, laser energy from 0.75mJ/cm2-2.60J/cm2), we got the LIDT of the DLC films is 1J/cm2. The whole physical process from slight burning, spalling, crack splashing until the substance damage of the DLC films was observed by 1000 times magnification and interference microscope. Thermal stress is one of main factors that laser injures films.","PeriodicalId":316559,"journal":{"name":"International Conference on Thin Film Physics and Applications","volume":"19 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-10-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126516043","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
1Effects of sputter power, gas pressure and substrate temperature on the structure and optical properties of CdS thin films 溅射功率、气体压力和衬底温度对CdS薄膜结构和光学性能的影响
International Conference on Thin Film Physics and Applications Pub Date : 2010-10-11 DOI: 10.1117/12.888273
Weiming Gong, R. Xu, Jian Huang, Minyan Tang, Linjun Wang, M. Cao
{"title":"1Effects of sputter power, gas pressure and substrate temperature on the structure and optical properties of CdS thin films","authors":"Weiming Gong, R. Xu, Jian Huang, Minyan Tang, Linjun Wang, M. Cao","doi":"10.1117/12.888273","DOIUrl":"https://doi.org/10.1117/12.888273","url":null,"abstract":"CdS is deposited on transparent conductive oxide (TCO)-coated glass substrate by radio frequency (r.f.) magnetron sputtering method. The X-ray diffraction (XRD) measurements revealed that CdS films were polycrystalline with the hexagonal wurtzite structure present only. The same conclusions as described below are arrived at from the photoluminescence (PL) and UV-vis absorption spectra measurements. When the power increases or the gas pressure decreases, the grain size and the film thickness increases, and then lead to the increase of stress in films which results in the decrease of energy band gap. The substrate temperature also has an effect on the strain in the films.","PeriodicalId":316559,"journal":{"name":"International Conference on Thin Film Physics and Applications","volume":"426 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-10-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126715997","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Mg/B4C EUV multilayer by introducing Co as barrier layer 引入Co作为阻挡层的Mg/B4C EUV多层膜
International Conference on Thin Film Physics and Applications Pub Date : 2010-10-11 DOI: 10.1117/12.888272
Haochuan Li, Sika Zhou, Qiushi Huang, M. Tan, Li Jiang, Jingtao Zhu, Xiaoqiang Wang, Fengli Wang, Zhong Zhang, Zhanshan Wang, Lingyan Chen
{"title":"Mg/B4C EUV multilayer by introducing Co as barrier layer","authors":"Haochuan Li, Sika Zhou, Qiushi Huang, M. Tan, Li Jiang, Jingtao Zhu, Xiaoqiang Wang, Fengli Wang, Zhong Zhang, Zhanshan Wang, Lingyan Chen","doi":"10.1117/12.888272","DOIUrl":"https://doi.org/10.1117/12.888272","url":null,"abstract":"Mg/B4C multilayer provides very high theoretical reflectivity in extreme ultraviolet range near 30.4nm wavelength, while the interface between Mg and B4C layer is very poor. In this paper, Co was introduced into the interface between Mg and B4C as a barrier layer. Mg/B4C and Co/Mg/Co/B4C multilayers were designed, fabricated, and measured for the wavelength of 30.4nm. The thickness of Co barrier layer was optimized. Grazing incidence x-ray reflectance measurements show that the structural quality of Co/Mg/Co/B4C multilayer is improved significantly after Co barrier layer inserting, and the optimum thickness of the barrier layer is 1.5nm.","PeriodicalId":316559,"journal":{"name":"International Conference on Thin Film Physics and Applications","volume":"17 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-10-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116863365","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
High-sensitivity testing techniques for laser optics 激光光学的高灵敏度测试技术
International Conference on Thin Film Physics and Applications Pub Date : 2010-10-11 DOI: 10.1117/12.888254
B. Li, Z. Qu, Y. Wang, Y. Han, W. Gao
{"title":"High-sensitivity testing techniques for laser optics","authors":"B. Li, Z. Qu, Y. Wang, Y. Han, W. Gao","doi":"10.1117/12.888254","DOIUrl":"https://doi.org/10.1117/12.888254","url":null,"abstract":"The absorptance and high reflectance measurements of laser optics are presented. In the absorptance measurement, the laser calorimetry (LC) technique is investigated. A rigorous theoretical model describing the laser irradiation induced temperature rise in a coated sample, in which both the finite thermal conductivity and the finite size of sample are taken into account, is developed to optimize the temperature detection geometry to further improve the accuracy of the absorptance measurement. For the high reflectivity measurement, an optical feedback cavity ring-down (OF-CRD) technique, in which a continuous-wave (CW) Fabry-Perot (FP) diode laser is used as the light source, is employed for high reflectivity measurement. The linear and V-shaped schemes are investigated to measure the reflectivity of cavity mirrors and planar test mirrors, respectively. For cavity mirrors with reflectance larger than 99.99%, the measurement error is less than 1ppm.","PeriodicalId":316559,"journal":{"name":"International Conference on Thin Film Physics and Applications","volume":"22 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-10-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114605647","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Effect of deposition rate on the DUV/VUV reflectance of MgF2protected aluminum mirrors with e-beam evaporation 沉积速率对电子束蒸发mgf2保护铝镜DUV/VUV反射率的影响
International Conference on Thin Film Physics and Applications Pub Date : 2010-10-11 DOI: 10.1117/12.888553
Tong-tong Wang, Jin-song Gao
{"title":"Effect of deposition rate on the DUV/VUV reflectance of MgF2protected aluminum mirrors with e-beam evaporation","authors":"Tong-tong Wang, Jin-song Gao","doi":"10.1117/12.888553","DOIUrl":"https://doi.org/10.1117/12.888553","url":null,"abstract":"Aluminum mirrors were freshly fabricated under optimum conditions protected with MgF2 at various deposition rates which evaporated by e-beam. All the samples were deposited on fine polished fused silica substrate. The reflectance results were measured by Mcpherson Vuvas2000 spectrometer in DUV/VUV spectral region from 150nm to 350nm. The highest reflectance is chosen to 210nm, and the point of 160nm is also very important for the project, so the results of two points are detailed presented. The highest average reflectance is about 86.76% with the MgF2 deposition rate at 1.2nm/s. The effects of aging on the reflectance of the MgF2 protected aluminum mirrors are discussed.","PeriodicalId":316559,"journal":{"name":"International Conference on Thin Film Physics and Applications","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-10-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114701898","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
首页 上一页 下一页 尾页
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整，为了账户安全，请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
请完成安全验证×
相关产品
×
本文献相关产品
联系我们：info@booksci.cn Book学术提供免费学术资源搜索服务，方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号：481959085
Book学术官方微信