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International Conference on Thin Film Physics and Applications最新文献

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Designing and preparation of tricolor light filter 三色滤光片的设计与制备
International Conference on Thin Film Physics and Applications Pub Date : 2010-10-11 DOI: 10.1117/12.888211
Dang-juan Li, Shenjiang Wu, J. Lu
{"title":"Designing and preparation of tricolor light filter","authors":"Dang-juan Li, Shenjiang Wu, J. Lu","doi":"10.1117/12.888211","DOIUrl":"https://doi.org/10.1117/12.888211","url":null,"abstract":"In the full-color, high contrast, more accurate color rendition technology, High-Definition (HD) color display requires to increase the transmissivity of red green blue (RGB) light of ordinary white light and cut-off others in depth. The ordinarily used discrete tricolor light filter has shortcomings such as energy lose and polarization aberration. In this paper, a new tricolor light filter was designed and prepared based on thin film technology. The center wavelengths of the tricolor light filter were determined to be λR=700.0nm, λG=546.1nm and λB=435.8nm, the results showed that the transmissivity of the filter is less than 7% in cut-off region, and the average transmissivity is greater than 91% in pass band region. The tricolor light filter can simplify the preparation process, save the coats and increase the transmission property.","PeriodicalId":316559,"journal":{"name":"International Conference on Thin Film Physics and Applications","volume":"3 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-10-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"117063836","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Photoelectric properties of a-Si/mesoporous ZnO tandem solar cells a-Si/介孔ZnO串联太阳能电池的光电性能
International Conference on Thin Film Physics and Applications Pub Date : 2010-10-11 DOI: 10.1117/12.888204
Guizhi Wu, Yue Shen, Wanxi Cheng, Feng Gu, Jian-cheng Zhang
{"title":"Photoelectric properties of a-Si/mesoporous ZnO tandem solar cells","authors":"Guizhi Wu, Yue Shen, Wanxi Cheng, Feng Gu, Jian-cheng Zhang","doi":"10.1117/12.888204","DOIUrl":"https://doi.org/10.1117/12.888204","url":null,"abstract":"Mesoporous nanocrystalline ZnO applied to a-Si/mesoporous tandem solar cell was synthesized through the hydrothermal method. The structures and morphologies were characterized by X-ray Diffraction (XRD), Transmission Electron Microscopy (TEM) and Brunauer-Emmett-Teller (BET) analysis based on the nitrogen adsorption isotherm. The test results indicated that the samples had an average pore size of 17 nm and the BET specific surface area was approximately 37.5 m2/g. The transparent a-Si film on fluorine-tin-oxide (FTO) coated glass was obtained by chemical treatment and was used to structure a-Si/mesoporous ZnO tandem solar cell. Under AM 1.5 irradiation, the a- Si/mesoporous tandem solar cell had an open circuit voltage (Voc) of 560 mV, a short circuit current (Jsc) of 3.61 mA/cm2 and a conversion efficiency of 0.28%. The conversion efficiency of tandem solar cell was improved obviously than that of the transparent a-Si film, which had lost special solar cell properties in chemical processing.","PeriodicalId":316559,"journal":{"name":"International Conference on Thin Film Physics and Applications","volume":"22 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-10-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"117117262","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Comparison of two methods of improving the characteristics of a double-color white organic light-emitting diode 改进双色白光有机发光二极管特性的两种方法的比较
International Conference on Thin Film Physics and Applications Pub Date : 2010-10-11 DOI: 10.1117/12.888395
Xue Chen, Wenqing Zhu, Sai-na Wang, F. Xu, Hong Xu, Xiao-Wen Zhang, Xifeng Li, Xueyin Jiang, Zhilin Zhang
{"title":"Comparison of two methods of improving the characteristics of a double-color white organic light-emitting diode","authors":"Xue Chen, Wenqing Zhu, Sai-na Wang, F. Xu, Hong Xu, Xiao-Wen Zhang, Xifeng Li, Xueyin Jiang, Zhilin Zhang","doi":"10.1117/12.888395","DOIUrl":"https://doi.org/10.1117/12.888395","url":null,"abstract":"White organic light-emitting diode was realized by co-doping a blue dye p-di(p-N,N-diphenyl-amino-styryl)benzene(DSA-ph) and a red dye 4-(dicyanomethylene)-2-t-butyl-6-(1,1,7,7-tetramethyljulolidyl-9-enyl)-4H-pyran(DCJTB) into a blue host 2-(t-butyl)-9,10-di(2-naphthyl)anthracene(TBADN), achieving a brightness of 11580 cd/m2 at 200 mA/cm2, and a maximum current efficiency of 7.53 cd/A. The improvement was due to efficiency energy transfer from host to guest by the aid of assistant energy transfer mechanism. The device introduced a (4,4'-N,N'-dicarbazole)biphenyl/4,4'-bis(N-carbazolyl)biphenyl(CBP) interlayer between separate double emissive layers with the same materials showed improved color stability, due to the blocking effect of the CBP layer, which contributed to stable and even exciton distribution in both blue and red emission layer.","PeriodicalId":316559,"journal":{"name":"International Conference on Thin Film Physics and Applications","volume":"20 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-10-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127165164","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Surface figure control for optical filters in fluorescence microscopy 荧光显微镜中滤光片的表面图形控制
International Conference on Thin Film Physics and Applications Pub Date : 2010-10-11 DOI: 10.1117/12.888215
Yi-Ping Cao, L. Tang, Shuaifeng Zhao, Yongxin Zhang, Jing Ma, Xiaojun Yin, Shuguo Fei
{"title":"Surface figure control for optical filters in fluorescence microscopy","authors":"Yi-Ping Cao, L. Tang, Shuaifeng Zhao, Yongxin Zhang, Jing Ma, Xiaojun Yin, Shuguo Fei","doi":"10.1117/12.888215","DOIUrl":"https://doi.org/10.1117/12.888215","url":null,"abstract":"The request of fluorescence microscopy filters was introduced. Optimized filter construction which requires more than 100 layers stack on both sides was redesigned. Surface deformation of filters caused by stress of multi-layers film was studied. The stress deformation effected by different film material and thickness was analyzed. A new flatten surface method was used to improve the surface flatness to 0.25λ. Filter sets were manufactured and photomicrograph was obtained with high contrast and no deformations when these filter sets were applied in fluorescence microscopy.","PeriodicalId":316559,"journal":{"name":"International Conference on Thin Film Physics and Applications","volume":"9 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-10-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126034918","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Fabrication and quantitative characterization of super smooth surface with sub-nanometer roughness 亚纳米超光滑表面的制备与定量表征
International Conference on Thin Film Physics and Applications Pub Date : 2010-10-11 DOI: 10.1117/12.888916
Zhengxiang Shen, Bin Ma, T. Ding, Xiaoqiang Wang, Zhanshan Wang, Lishuan Wang, Hua-song Liu, Yi-qin Ji
{"title":"Fabrication and quantitative characterization of super smooth surface with sub-nanometer roughness","authors":"Zhengxiang Shen, Bin Ma, T. Ding, Xiaoqiang Wang, Zhanshan Wang, Lishuan Wang, Hua-song Liu, Yi-qin Ji","doi":"10.1117/12.888916","DOIUrl":"https://doi.org/10.1117/12.888916","url":null,"abstract":"There is a growing requirement to use supersmooth surfaces with roughness in the sub-nanometer range. But, to produce 100mm-diameter optical elements with ultra-flat and supersmooth surfaces is still difficult. The fabrication technique based on continues polishing process is presented to produce flat optical element with extremely smooth surface. During the fabrication, A concept of \"Process Controlling\" is introduced, which means the machining of super-smooth surfaces is considered as a chain consisted of some key nodes, not merely a polishing process. The surface figure is tested using interferometer and the surface roughness is using interference microscopy and atom force microscopy (AFM) repectively. Then the Power Spectral Density (PSD) function, including the basic theory and the physical meaning, are presented to explain the difference of test results, which is measured by optical profiler and AFM with different parameters. The polynomial fitting results indicate that there is excellent agreement between measurements made by the two instruments.","PeriodicalId":316559,"journal":{"name":"International Conference on Thin Film Physics and Applications","volume":"21 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-10-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123447238","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Effects of texture on the properties of polycrystalline HgI2 films 织构对多晶HgI2薄膜性能的影响
International Conference on Thin Film Physics and Applications Pub Date : 2010-10-11 DOI: 10.1117/12.888212
W. Shi, Q. Su, Dongming Li, Linjun Wang, Haokun Hu, Yiben Xia
{"title":"Effects of texture on the properties of polycrystalline HgI2 films","authors":"W. Shi, Q. Su, Dongming Li, Linjun Wang, Haokun Hu, Yiben Xia","doi":"10.1117/12.888212","DOIUrl":"https://doi.org/10.1117/12.888212","url":null,"abstract":"Due to different oriented polycrystalline HgI2 films show different properties. In this paper the properties of different oriented HgI2 films have been investigated by scanning electron microscopy, X-ray diffraction and current-voltage measurements. The measured results indicate HgI2 films are of high quality and the properties of the (001)-oriented HgI2 film are better than those of the free oriented ones. The dark current of the (001)-oriented HgI2 film is 0.5 nA with an applied bias voltage of 40 V. The current of (001)-oriented HgI2 film keeps unchanged during measurement.","PeriodicalId":316559,"journal":{"name":"International Conference on Thin Film Physics and Applications","volume":"100 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-10-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122612568","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Soft-X study of buried interfaces in stratified media 层状介质中埋藏界面的软x射线研究
International Conference on Thin Film Physics and Applications Pub Date : 2010-10-11 DOI: 10.1117/12.888179
N. Mahne, A. Giglia, L. Sponza, A. Verna, S. Nannarone
{"title":"Soft-X study of buried interfaces in stratified media","authors":"N. Mahne, A. Giglia, L. Sponza, A. Verna, S. Nannarone","doi":"10.1117/12.888179","DOIUrl":"https://doi.org/10.1117/12.888179","url":null,"abstract":"The performance of multilayer optics depends on the quality of the buried interfaces between materials, whose intermixing strongly affects their behavior. We present an experimental method to determine, in a non destructively way, the amount of material intermixing at interfaces of multilayer structures. The reflection mechanism is related to the build up in the multilayer of a standing wave field, whose peaks and the valleys move as a function both of wavelength and of incidence angle. Exploiting this fact it is possible to modulate the electric field inside the multilayer in order to have different parts of the multilayer structure excited at a different extent and in particular the buried interfaces regions. The excitation is directly proportional to the intensity of the electric field and to the concentration of a given element in the sample. The excitation can be detected with different techniques, f.i. electron core level photoemission, fluorescence, luminescence, total electron yield. The flexibility of the experimental apparatus of the BEAR beamline (Elettra Trieste, Italy) allowed us to study some important classes of layered structures in the soft X-ray energy range, using the above mentioned techniques together with the determination of the Bragg conditions through the measurement of the specular reflectivity. We demonstrate the possibility of obtaining quantitative information on the width of the intermixing region, strongly related to the interface roughness, through the comparison with a phenomenological model of the intermixing and a numerical simulation of the standing field inside the multilayer.","PeriodicalId":316559,"journal":{"name":"International Conference on Thin Film Physics and Applications","volume":"25 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-10-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129924888","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 5
Effect of UV and vacuum treatment on stability of WO3 gas sensing films 紫外和真空处理对WO3气敏膜稳定性的影响
International Conference on Thin Film Physics and Applications Pub Date : 2010-10-11 DOI: 10.1117/12.888224
G. Gao, Guang-ming Wu, Zenghai Zhang, Jiandong Wu, W. Feng, Jun Shen, Zhihua Zhang, Ai Du
{"title":"Effect of UV and vacuum treatment on stability of WO3 gas sensing films","authors":"G. Gao, Guang-ming Wu, Zenghai Zhang, Jiandong Wu, W. Feng, Jun Shen, Zhihua Zhang, Ai Du","doi":"10.1117/12.888224","DOIUrl":"https://doi.org/10.1117/12.888224","url":null,"abstract":"UV and vacuum treatment, as well as annealing, were tried to recover the gas sensing property of WO3 films. Results show that gas sensing films can partially recover one or two coloring and bleaching cycles if kept in vacuum condition. And UV irradiation can well recover several cycles. But heat treatment does not show any obvious effect on the gas sensing recovery. Furthermore, IR and XPS spectra were used to identify the mechanism of this improvement. Results reveal that changes of water content will reduce the desorption energy of hydrogen atom, which will accelerate the bleaching velocity.","PeriodicalId":316559,"journal":{"name":"International Conference on Thin Film Physics and Applications","volume":"77 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-10-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114304593","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Near-field microwave phase imaging by a spintronic sensor 自旋电子传感器近场微波相位成像
International Conference on Thin Film Physics and Applications Pub Date : 2010-10-11 DOI: 10.1117/12.888266
Xiaofeng Zhu, M. Harder, A. Wirthmann, Bo Zhang, W. Lu, Y. Gui, Can-Ming Hu
{"title":"Near-field microwave phase imaging by a spintronic sensor","authors":"Xiaofeng Zhu, M. Harder, A. Wirthmann, Bo Zhang, W. Lu, Y. Gui, Can-Ming Hu","doi":"10.1117/12.888266","DOIUrl":"https://doi.org/10.1117/12.888266","url":null,"abstract":"We report a novel technique for microwave imaging utilizing a nonlinear coupling between the microwave fields in a ferromagnetic material, in which the relative phase of the coupled microwave fields plays an important role in the resultant homodyne dc voltage. A technical breakthrough has been achieved to effectively control such a relative phase using a spintronic Michelson interferometry. This enables a phase- and amplitude-resolved near-field dielectric image using a spintronic sensor. The contrast of microwave imaging for an object with subwavelength features strongly depends on the local dielectric constant of materials, and agrees well with simulation results by COMSOL.","PeriodicalId":316559,"journal":{"name":"International Conference on Thin Film Physics and Applications","volume":"60 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-10-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127955619","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Erbium silicide nanostructures self-assembled on Si(001) by cyclic growth 循环生长法在Si(001)上自组装硅化铒纳米结构
International Conference on Thin Film Physics and Applications Pub Date : 2010-10-11 DOI: 10.1117/12.888533
T. Ding, Junqiang Song, Juan Li, Q. Cai
{"title":"Erbium silicide nanostructures self-assembled on Si(001) by cyclic growth","authors":"T. Ding, Junqiang Song, Juan Li, Q. Cai","doi":"10.1117/12.888533","DOIUrl":"https://doi.org/10.1117/12.888533","url":null,"abstract":"Erbium silicide nanostructures were self assembled on the Si(001) substrates by novel multiple deposition and annealing steps. In-situ scanning probe microscopy (SPM) and ex-situ scanning electron microscopy (SEM) were used to characterize the morphology of the nanostructures. Compared with traditional growth method, it was found that ErSi2 nanostructures fabricated by cyclic growth could keep stable morphology avoiding the shape instability. Besides, both the size and distribution density could be well controlled, which have significance in the application of nanostructures.","PeriodicalId":316559,"journal":{"name":"International Conference on Thin Film Physics and Applications","volume":"53 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-10-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"134112299","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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