二氧化硅掺杂对气相变色膜稳定性的影响

Jiandong Wu, Guang-ming Wu, G. Gao, Zenghai Zhang, W. Feng, Jun Shen, Zhihua Zhang
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引用次数: 1

摘要

WO3因其气致变色效应可用于智能窗口和气体传感器而成为研究最广泛的材料之一;目前已广泛应用于许多节能领域。与其他气相膜制备方法相比,溶胶-凝胶法具有成本低、可大规模应用等优点。然而,溶胶-凝胶WO3薄膜还不够稳定,不能用于商业应用。在本文中,我们首先研究了SiO2掺杂对WO3气相变色膜稳定性的影响。我们还考察了SiO2含量与WO3/SiO2薄膜稳定性之间的关系。通过拟合四种不同Si/W比的染色-漂白周期的指数衰减,建立了经验公式。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Effect of silica doping on the stability of gasochromic films
WO3 has emerged as one of the most extensively studied materials because its gasochromic effect can be used for smart window and gas sensor; currently it is widely used in many energy conservation areas. Compared with other preparations methods for gasoschromic films, sol-gel process shows several advantages, such as low cost and large-scale applications. However, sol-gel WO3 films were not stable enough for commercial application yet. In this paper, we first investigated the effect of SiO2 doping, which exhibited good enhancement of WO3 gasochromic films' stability. We also examined the relationship between SiO2 ratio and stability of WO3/SiO2 films. An empirical formula was established by fitting exponential decay of the coloring-bleaching cycles for four different Si/W ratios.
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