Industrial Chemistry & Materials最新文献

{"title":"Synergistic strengthening of ion-exchange resins by post-crosslinking and selective sulfonation for PGMEA purification†","authors":"Nian Zhang, Fan Liu, Dan Li, Chunyan Shi, Aizi Cai, Shizhe Xu, Yaocheng Dai, Yan Wang and Haifeng Dong","doi":"10.1039/D5IM00078E","DOIUrl":"https://doi.org/10.1039/D5IM00078E","url":null,"abstract":"<p>PGMEA is widely used as a solvent and diluent for photoresists, yet developing an efficient resin that simultaneously resists organic dissolution and removes trace metal ions presents a significant challenge. To overcome this, a novel sulfonated hyper-cross-linked resin (2-CS-DVB-SO<small>₃</small>H) was synthesized through a multi-step process involving the preparation of a Cl-functionalized gel polymer, followed by sulfonation and post-crosslinking. The effects of the monomers, crosslinking degree, sulfonation degree, dosage, adsorption temperature, and resin stability on its purity performance were discussed. The resulting resin demonstrated exceptional stability in organic media and effectively purified PGMEA under optimized conditions (30% crosslinking, 4.69% S content, and 0.2 g mL<small>⁻¹</small> resin dosage), with Ti, Co, Ni, and Cu metal ion concentrations reduced below 10 ppb. This process elevated PGMEA purity from 98.90% to 99.48%. Thermodynamic analysis revealed the adsorption to be non-spontaneous. The resin maintained chemical stability in PGMEA within 18 h. FT-IR and XPS data identified ion exchange, electrostatic interactions and lone electron pair coordination between sulfonic acid groups and metal ions as the binding mechanisms. The hydrogen bonds formed between Cl<small>⁻</small> on the resin and hydroxyl groups in methanol (as organic impurities) were considered the primary factor responsible for enhancing the purity of PGMEA. These results collectively establish 2-CS-DVB-SO<small>₃</small>H as a robust and reliable material for metal ion removal in PGMEA purification, thereby improving the purity of photoresist solvents and potentially enhancing photoresist performance.</p><p>Keywords: Sulfonated resin; PGMEA; Metal ion removal; Purification mechanisms.</p>","PeriodicalId":29808,"journal":{"name":"Industrial Chemistry & Materials","volume":" 5","pages":" 631-642"},"PeriodicalIF":11.9,"publicationDate":"2025-06-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://pubs.rsc.org/en/content/articlepdf/2025/im/d5im00078e?page=search","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145078707","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Alternative sources of carbon for moving towards a sustainable carbon cycle","authors":"Michele Aresta","doi":"10.1039/D5IM00061K","DOIUrl":"https://doi.org/10.1039/D5IM00061K","url":null,"abstract":"<p>This perspective identifies the carbon needs of the chemical and transport industries in the short-to-medium term, categorizes the available renewable alternative carbon sources (biomass, waste-plastics and CO<small>₂</small>) to fossil carbon and discusses their usability and potential for the short-, medium- and long-term use. Given the constraints to the use of biomass (grown on purpose and waste) and the limited overall amount of waste plastics, CO<small>₂</small> is the most abundant and at-hand source of renewable carbon. The conversion of CO<small>₂</small> into chemicals, materials and energy products is discussed for meeting the energetic and hydrogen demands. The use of solar energy as a primary energy source and water as a proton and electron source in recycling carbon <em>via</em> CO<small>₂</small> conversion into energy products is also elucidated. E-fuels and solar-fuels are compared for their commercialization, and the benefits of co-processing CO<small>₂</small> and water (in electrochemical, photochemical and photoelectrochemical processes) instead of producing green-H<small>₂</small> for CO<small>₂</small> reduction are emphasized.</p><p>Keywords: Carbon dioxide as source of renewable carbon; Carbon cyclic economy; Photochemistry; Photoelectrochemistry; E-fuels; Solar-fuels</p>","PeriodicalId":29808,"journal":{"name":"Industrial Chemistry & Materials","volume":" 6","pages":" 703-709"},"PeriodicalIF":11.9,"publicationDate":"2025-06-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://pubs.rsc.org/en/content/articlepdf/2025/im/d5im00061k?page=search","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145493313","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Nitrogen doped hierarchical porous carbon for supercapacitors and zinc ion hybrid capacitors†","authors":"Jun Ni, Weijian Chen, Xinyang Zhang, Hui Xu, Minghui Zhang and Xiaoliang Wu","doi":"10.1039/D5IM00044K","DOIUrl":"https://doi.org/10.1039/D5IM00044K","url":null,"abstract":"<p>Heteroatom-doped hierarchical porous carbon materials demonstrate significant promise for energy storage applications. In this paper, nitrogen-doped hierarchical porous carbon (NPC) materials were synthesized by one-step carbonization process using agar as the carbon precursor, urea as the nitrogen precursor, and KHCO<small>₃</small> as the activating agent. Owing to the combined influence of substantial nitrogen and oxygen functional groups, interconnected hierarchical porous structure and large specific surface area, the NPC-600 electrode delivers a high specific capacitance of 450 F g<small>⁻¹</small> and remarkable cyclic stability. Moreover, the NPC-600//NPC-600 symmetrical supercapacitor delivers an energy density of 29.41 Wh kg<small>⁻¹</small> and good cyclic performance. More interestingly, a zinc ion hybrid capacitor (ZIHC) constructed with NPC-600 as the positive electrode achieves a capacitance of 368.78 F g<small>⁻¹</small> (163.9 mAh g<small>⁻¹</small>), an energy density reaching 120.75 Wh kg<small>⁻¹</small> and superior cyclic characteristics. The research affords a straightforward way for fabricating heteroatom-doped porous carbon as electrode for supercapacitor and ZIHCs.</p><p>Keywords: Hierarchical porous carbon; KHCO<small>₃</small>; Agar; Supercapacitor; Zinc ion hybrid capacitor.</p>","PeriodicalId":29808,"journal":{"name":"Industrial Chemistry & Materials","volume":" 4","pages":" 475-484"},"PeriodicalIF":0.0,"publicationDate":"2025-06-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://pubs.rsc.org/en/content/articlepdf/2025/im/d5im00044k?page=search","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144641063","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Continuous direct air capture and conversion tandem system applicable to a wide range of CO2 concentrations†","authors":"Shinta Miyazaki, Akihiko Anzai, Masaki Yoshihara, Hsu Sheng Feng, Shinya Mine, Takashi Toyao and Ken-ichi Shimizu","doi":"10.1039/D5IM00028A","DOIUrl":"https://doi.org/10.1039/D5IM00028A","url":null,"abstract":"<p>The concentrations of CO<small>₂</small> emitted from different CO<small>₂</small> sources vary significantly. Thus, processes capable of accommodating a broad range of CO<small>₂</small> concentrations, from 0.04% (air) to 10% (power plants), must be developed to achieve carbon neutrality. In this study, we developed a two-step CO<small>₂</small> capture and hydrogenation system by employing Rb-oxide-incorporated zeolites as CO<small>₂</small> adsorbents and Ni/CeO<small>₂</small> or Cu/ZnO/Al<small>₂</small>O<small>₃</small> as catalysts for CO<small>₂</small> hydrogenation. This process is suitable for continuous operation over a temperature swing of 40–200 °C. Notably, this system can operate at low temperatures (below 200 °C) using a simple temperature-swing process in the presence of O<small>₂</small>. Compared with more than 100 previously reported systems that can convert CO<small>₂</small> including O<small>₂</small> to green fuels such as CO or CH<small>₄</small>, the proposed system achieved the best CO<small>₂</small> conversions to CH<small>₄</small> and CO.</p><p>Keywords: Direct air capture (DAC); Zeolite sorbent; Temperature swing adsorption (TSA); Methanation; Reverse water-gas shift (RWGS).</p>","PeriodicalId":29808,"journal":{"name":"Industrial Chemistry & Materials","volume":" 1","pages":" 118-130"},"PeriodicalIF":11.9,"publicationDate":"2025-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://pubs.rsc.org/en/content/articlepdf/2026/im/d5im00028a?page=search","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"146071199","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Lithographic performances of aryl sulfonate ester-modified polystyrenes as nonchemically amplified resists†","authors":"Rongrong Peng, Peng Lian, Jinping Chen, Tianjun Yu, Yi Zeng, Shuangqing Wang, Xudong Guo, Rui Hu, Jun Zhao, Yanqing Wu, Guoqiang Yang and Yi Li","doi":"10.1039/D5IM00046G","DOIUrl":"https://doi.org/10.1039/D5IM00046G","url":null,"abstract":"<p>Aryl sulfonate ester modified polystyrenes with different substituents (X–SEPS, X = H–, MeO–, and CN–) were synthesized by reversible addition-fragmentation chain transfer (RAFT) polymerization. The excellent thermal stability and film-forming capability of these three polymers suggest that they can satisfy the lithography process and are candidates for resist materials. Comparative electron beam lithography (EBL) demonstrates that the three resists (H–SEPS, MeO–SEPS and CN–SEPS) exhibit different EBL performances. Calculation of bond energies for the model compounds suggests that the influence of substituent groups on the bond energy is not the reason for the differences in sensitivity. Results obtained using a fully automated dissipative quartz crystal microbalance (QCM) analyzer confirm that the influence of substituent groups on the solubility behavior of resist films in developers leads to different photolithographic performances. The H–SEPS resist exhibits better comprehensive performance than the MeO–SEPS and CN–SEPS resists, achieving an 18 nm line/space (L/S) pattern and a 10 nm line/4 space (L/4S) semi-dense pattern by EBL at doses of 3200 and 2800 μC cm<small>⁻²</small>, respectively. Further extreme ultraviolet lithography (EUVL) demonstrates the capability of H–SEPS resist to form 22 nm half-pitch (HP) patterns. The detailed study of the photochemical reaction and patterning mechanism suggests that the decomposition of sulfonate ester groups into polar sulfonic acid groups, along with a rearrangement, leads to a solubility switch of resist films in the developer.</p><p>Keywords: Nonchemically amplified resist; Reversible addition-fragmentation chain transfer polymerization; Aryl sulfonate; Electron beam lithography; Extreme ultraviolet lithography.</p>","PeriodicalId":29808,"journal":{"name":"Industrial Chemistry & Materials","volume":" 5","pages":" 553-566"},"PeriodicalIF":11.9,"publicationDate":"2025-06-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://pubs.rsc.org/en/content/articlepdf/2025/im/d5im00046g?page=search","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145078783","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Kinetic advantages of microwave activation in the dry reforming of methane: insights gained by SSITKA†","authors":"Tatsuya Hamashima, José Palomo, Manoj Coppens, Hajime Hojo, Hisahiro Einaga and Atsushi Urakawa","doi":"10.1039/D5IM00050E","DOIUrl":"https://doi.org/10.1039/D5IM00050E","url":null,"abstract":"<p>Utilising unexploited methane through its reaction with CO<small>₂</small><em>via</em> the dry reforming of methane (DRM) has attracted attention. However, there are challenges related to catalyst deactivation and energy consumption due to the highly endothermic nature of the DRM; thus, microwave activation has been proposed to increase energy efficiency by directly heating the catalyst while minimising the heating of the reactor. In this study, we clarify the advantages of microwave heating in terms of more reactive coke formation during the reaction and enhanced reactivity under microwave conditions compared with conventional resistive heating. For the latter, steady-state isotopic transient kinetic analysis (SSITKA) was conducted to gain mechanistic insights, which suggested that microwave heating accelerated CO generation steps. This study shows that microwave activation can be advantageous in terms of reaction kinetics for the DRM.</p><p>Keywords: Dry reforming of methane; Microwave heating; La–Ni oxide catalyst; SSITKA.</p>","PeriodicalId":29808,"journal":{"name":"Industrial Chemistry & Materials","volume":" 2","pages":" 226-236"},"PeriodicalIF":11.9,"publicationDate":"2025-06-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://pubs.rsc.org/en/content/articlepdf/2026/im/d5im00050e?page=search","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"147558261","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Engineering sulfonated polymers for the removal of ultra-trace complexed Cr(iii) in tris(2-carboxyethyl) isocyanurate photoresist resin monomers†","authors":"Huiyao Huang, Shiquan Zhong, Yawen Chen, Wangquan Gong, Changshen Ye, Ting Qiu and Jie Chen","doi":"10.1039/D5IM00057B","DOIUrl":"https://doi.org/10.1039/D5IM00057B","url":null,"abstract":"<p>The semiconductor manufacturing industry imposes stringent requirements on the metal ion content of photoresist resin monomers. Tris(2-carboxyethyl) isocyanurate (H<small>₃</small>tci), a critical raw material for photoresist resin monomers, inevitably incorporates metal ions during production. However, its inherent carboxyethyl groups form stable coordination complexes with Cr(<small>III</small>), hindering the semiconductor-grade resin monomer production. To achieve the ultra-deep removal of Cr(<small>III</small>) at ultra-trace concentrations, inspired by the hard–soft-acid–base theory, we systematically modulated the electron-rich sulfonic acid group on polymers <em>via</em> controlled sulfonation conditions to achieve a novel series of adsorption materials (St) with ultra-high Cr(<small>III</small>) adsorption affinity. The adsorption–recrystallization process using 6 g of St-<em>V</em>-15 could reduce the Cr(<small>III</small>) concentration in a solution containing 1 g of H<small>₃</small>tci from 840 ppb to 27.5 ppb. Furthermore, St-<em>V</em>-15 exhibited a maximum adsorption capacity of 145 mg g<small>⁻¹</small> calculated using the Langmuir model and a rapid initial adsorption rate of 82.92 mg g<small>⁻¹</small> min<small>⁻¹</small> at 333 K. Additionally, St-<em>V</em>-15 demonstrated exceptional selectivity for Cr(<small>III</small>) over competing ions (<em>e.g.</em>, K(<small>I</small>), Mg(<small>II</small>), Na(<small>I</small>) and Zn(<small>II</small>)) and maintained stable performance over at least 10 adsorption–desorption cycles. The superior performance originated from the chelation between Cr(<small>III</small>) and the sites of O atoms (S–O and S<img>O) combined with the electrostatic interaction between deprotonated sulfonic acid groups and Cr(<small>III</small>). These results position St-<em>V</em>-15 as a promising adsorption material for ultra-trace Cr(<small>III</small>) removal in H<small>₃</small>tci, offering a cost-effective solution for semiconductor-grade resin monomer production for the very first time.</p><p>Keywords: Tris(2-carboxyethyl) isocyanurate; Complexed Cr(<small>III</small>); Ultra-trace; Cr(<small>III</small>) removal; Sulfonated polymers.</p>","PeriodicalId":29808,"journal":{"name":"Industrial Chemistry & Materials","volume":" 5","pages":" 618-630"},"PeriodicalIF":11.9,"publicationDate":"2025-06-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://pubs.rsc.org/en/content/articlepdf/2025/im/d5im00057b?page=search","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145078706","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Coarse-grained models for ionic liquids and applications to biological and electrochemical systems","authors":"Yang Ge, Qiang Zhu, Xueping Wang and Jing Ma","doi":"10.1039/D5IM00021A","DOIUrl":"https://doi.org/10.1039/D5IM00021A","url":null,"abstract":"<p>Ionic liquids (ILs) are a class of molten salts with a collection of exciting properties and have been employed for wide-ranging applications across chemistry, biology, and materials science. However, the high viscosity of ionic liquids challenges atomistic molecular dynamics (MD) simulations in studying their structure–property relationships on large spatiotemporal scales. Coarse-grained (CG) models provide insight into the microscopic structure and intermolecular interactions underlying various properties by eliminating unnecessary atomic details. The general protocol for proposing a new CG model is reviewed, including determination of CG representation and force field (FF) parameterization. Recent advances in polarizable CG models were discussed with the emphasis on Drude oscillators and QM-based polarizable models. An overview was given on some recent applications of machine learning (ML) techniques on development of CG potentials, including the utilization of an ML surrogate model for FF parameterization and the development of ML potentials. Applications and challenges of IL CG models in treating complex systems, including pure solvents, mixtures, biological systems, and electrochemically confined environments, were presented. Finally, prospects for the development of transferable IL CG models are highlighted to extend the applicability to more mesoscopic systems.</p><p>Keywords: Ionic liquids; Coarse-grained models; Polarization effect; Machine learning; Molecular dynamics simulation.</p>","PeriodicalId":29808,"journal":{"name":"Industrial Chemistry & Materials","volume":" 4","pages":" 383-411"},"PeriodicalIF":0.0,"publicationDate":"2025-06-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://pubs.rsc.org/en/content/articlepdf/2025/im/d5im00021a?page=search","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144641115","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Molecular topology-driven benzocyclobutene-based ultralow dielectrics with copper-matched low thermal expansion†","authors":"Menglu Li, Linfeng Fan, Quan Sun, Meng Xie, Jin Guo and Wenxin Fu","doi":"10.1039/D5IM00051C","DOIUrl":"https://doi.org/10.1039/D5IM00051C","url":null,"abstract":"<p>To address the critical challenge of balancing ultralow dielectric constant (<em>k</em>) with low coefficient of thermal expansion (CTE) in high-frequency electronic applications, this study develops a series of tri-armed benzocyclobutene (BCB)-based resins <em>via</em> rational molecular design. Five functional monomers (Ph-BCB, Ph-ene-BCB, Ph-yne-BCB, TPA-yne-BCB, TPB-yne-BCB) were synthesized through Suzuki, Heck, and Sonogashira coupling reactions, followed by thermal curing to form crosslinked polymers. The introduction of branched architectures and rigid conjugated cores effectively enhanced free volume fraction while suppressing molecular chain mobility, achieving synergistic optimization of dielectric and thermomechanical properties. The cured resins exhibited exceptional performance: dielectric constants as low as 1.83 (TPA-yne-BCB) at 1 kHz, dielectric loss below 0.0015, and CTE values ranging from 19.23–34.63 ppm °C<small>⁻¹</small>, closely matching copper (16 ppm °C<small>⁻¹</small>). The SAXS and WAXS analyses confirmed that enlarged free volume and reduced polarization from optimized topology were key to low-<em>k</em> performance. Additionally, the materials demonstrated outstanding thermal stability (5% weight loss &gt;500 °C), high mechanical strength (elastic modulus up to 10 GPa), and hydrophobicity (water absorption &lt;2%). This work provides a groundbreaking strategy for designing high-performance dielectric materials for 5G millimeter-wave packaging, flexible electronics, and 3D heterogeneous integration.</p><p>Keywords: Benzocyclobutene; Ultralow dielectric constant; Low thermal expansion; Tri-armed monomer; Branched polymers.</p>","PeriodicalId":29808,"journal":{"name":"Industrial Chemistry & Materials","volume":" 5","pages":" 596-606"},"PeriodicalIF":11.9,"publicationDate":"2025-06-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://pubs.rsc.org/en/content/articlepdf/2025/im/d5im00051c?page=search","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145078704","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Synthesis and properties of a novel perfluorinated polyimide with high toughness, low dielectric constant and low dissipation factor†","authors":"Hangqian Wang, Yao Zhang, Xialei Lv, Jinhui Li, Kuangyu Wang, Guoping Zhang and Rong Sun","doi":"10.1039/D5IM00048C","DOIUrl":"https://doi.org/10.1039/D5IM00048C","url":null,"abstract":"<p>With the development of high-frequency communication technologies, polyimide (PI) materials with a low dielectric constant (<em>D</em><small>_k</small>) and low dissipation factor (<em>D</em><small>_f</small>) are urgently needed to reduce signal crosstalk and other transmission problems. The introduction of a trifluoromethyl group is a common strategy to reduce <em>D</em><small>_k</small> and <em>D</em><small>_f</small>, but the bulky trifluoromethyl group would diminish stacking density and consequently lead to inferior mechanical properties. Herein, a novel diamine monomer, 2,3,4,5,6-pentafluororo-3,5-bis(4-aminophenoxy)-1,1-biphenyl (5FBODA), was designed and synthesized using simple reactions. Subsequently, fluorinated diamine and dianhydride were copolymerized with 5FBODA to obtain a series of fluorinated polyimide (FPI) with excellent dielectric properties and good mechanical performances, particularly high elongation at break. The pentafluorophenyl side group showed an obvious electron-withdrawing effect and made the charge of the structure more balanced, which reduced the molecular polarization rate and charge concentration to some extent, significantly helping in reducing <em>D</em><small>_k</small> at high frequency. As the 5FBODA content increased, the large lateral group restricted the movement of the main chain, constrained the dipole polarization, thereby effectively diminishing their <em>D</em><small>_f</small>. Moreover, when 20–30% 5FBODA was added, the pentafluorophenyl side group increased the intermolecular forces, thereby enhancing the elongation at break while maintaining good thermal properties. These FPIs exhibited remarkable advantages for advanced microelectronic packaging applications, providing an innovative solution for the development of next-generation high-performance electronic materials.</p><p>Keywords: Wafer level packaging; Fluorinated polyimide; Low dielectric; High toughness.</p>","PeriodicalId":29808,"journal":{"name":"Industrial Chemistry & Materials","volume":" 5","pages":" 587-595"},"PeriodicalIF":11.9,"publicationDate":"2025-06-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://pubs.rsc.org/en/content/articlepdf/2025/im/d5im00048c?page=search","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145078703","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}