Industrial Chemistry & Materials最新文献

{"title":"Introduction to advanced electronic chemicals","authors":"Ruixia Liu, Rong Sun and Guoqiang Yang","doi":"10.1039/D5IM90014J","DOIUrl":"https://doi.org/10.1039/D5IM90014J","url":null,"abstract":"<p >A graphical abstract is available for this content</p>","PeriodicalId":29808,"journal":{"name":"Industrial Chemistry & Materials","volume":" 5","pages":" 507-508"},"PeriodicalIF":11.9,"publicationDate":"2025-08-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://pubs.rsc.org/en/content/articlepdf/2025/im/d5im90014j?page=search","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145078772","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Ionic liquids: a pitocin for next-generation electronic information materials?","authors":"Mengyue Li, Bin He, Yangyang Jiang, Ruirui Wang, Cunliang Gan, Fengqi Ji, Yao Li and Ruixia Liu","doi":"10.1039/D5IM00098J","DOIUrl":"https://doi.org/10.1039/D5IM00098J","url":null,"abstract":"<p>Electronic information materials (EIMs) are key enablers for building a smart society. As the material carriers of next-generation information technology, the development of EIMs is increasingly constrained by the challenges of manufacturing precision, heterogeneous integration reliability, and circular economy compatibility. As traditional approaches struggle to meet the demands for nanoscale machining, low power consumption, structural flexibility, and environmental compatibility, there is an urgent need for disruptive materials and methodologies. Ionic liquids (ILs), with their unique combination of tunable molecular structures, negligible volatility, broad electrochemical windows, and strong solvation capabilities, offer a promising route to address these bottlenecks. As dynamic reaction media, ILs precisely regulate the nucleation kinetics and interfacial behaviours of zero dimension (0D) quantum dots, one dimension (1D) nanowires, and two dimension (2D) semiconductors through their unique solvation environments, yielding advanced materials with next-generation EIMs. Leveraging hydrogen bonding and ion-exchange interactions, ILs enable selective extraction and recycling of critical electronic chemicals (<em>e.g.</em>, rare earth elements, conductive polymers), offering greener alternatives to conventional solvent-based processes. In field-effect transistors and flexible electronics, ILs improve charge transport efficiency, reduce operating voltages, and enhance interfacial stability, while their compatibility with heterogeneous integration addresses reliability challenges in scalable manufacturing. This review systematically examines ILs roles in advancing EIMs and proposes design principles for their targeted application, highlighting their potential to drive sustainable innovation in electronic materials science.</p><p>Keywords: Ionic liquids; Electronic information materials; Separation and purification; Electronic devices.</p>","PeriodicalId":29808,"journal":{"name":"Industrial Chemistry & Materials","volume":" 5","pages":" 509-534"},"PeriodicalIF":11.9,"publicationDate":"2025-07-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://pubs.rsc.org/en/content/articlepdf/2025/im/d5im00098j?page=search","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145078773","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Hybrid alkyl-ligand tin-oxo clusters for enhanced lithographic patterning performance via intramolecular interactions†","authors":"Hao Chen, Wenzheng Li, Yingdong Zhao, Xinyan Huang, Jialong Zhang, Peijun Ji, Jun Zhao, Pengzhong Chen and Xiaojun Peng","doi":"10.1039/D5IM00058K","DOIUrl":"https://doi.org/10.1039/D5IM00058K","url":null,"abstract":"<p>Tin-oxo clusters (TOCs) are promising candidates for next-generation extreme ultraviolet (EUV) photoresist materials due to their strong EUV absorption properties and small molecular sizes. The surface ligands are critical to the photolithographic patterning process; however, the precise regulatory mechanisms governing their functionality require further investigation. Building upon our previously reported Sn4-oxo clusters, Sn4–Me–C10 and Sn4–Bu–C10, which incorporate butyl and methyl groups, respectively, this study presents the synthesis of a novel cluster, <strong>Sn4-MB</strong>, which integrates both butyl and methyl groups within the same Sn4-oxo core. This new compound demonstrates superior patterning performance compared to both Sn4–Me–C10 and Sn4–Bu–C10, as well as their mixed formulations. The enhanced performance is attributed to the intramolecular hybridization between Sn–methyl and Sn–butyl moieties in <strong>Sn4-MB</strong>, which facilitates radical feedback regulation, thereby minimizing energy dissipation and suppressing the extent of reaction diffusion during pattern formation. In electron beam lithography (EBL) exposure experiments, optimization of the developer and reduction of film thickness allowed <strong>Sn4-MB</strong> to achieve lines with a critical dimension (CD) of 17 nm. Furthermore, during EUV exposure, <strong>Sn4-MB</strong> produced 75 nm pitch lines at a dose of 150 mJ cm<small>⁻²</small>, with a line CD of 33 nm. This study provides an effective molecular design strategy for enhancing the lithographic performance of TOC photoresists, highlighting their substantial potential for next-generation EUV lithography applications.</p><p>Keywords: Tin-oxo clusters; Intramolecular radical regulation; Photoresist; Electron beam lithography; Extreme ultraviolet lithography.</p>","PeriodicalId":29808,"journal":{"name":"Industrial Chemistry & Materials","volume":" 5","pages":" 543-552"},"PeriodicalIF":11.9,"publicationDate":"2025-07-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://pubs.rsc.org/en/content/articlepdf/2025/im/d5im00058k?page=search","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145078775","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Efficient stacking of iso-butene in sulfonate functional metal–organic frameworks for efficient iso-butene/iso-butane separation†","authors":"Zhensong Qiu, Jiyu Cui, Dengzhuo Zhou, Zhenglu Yang, Xiaofei Lu, Xian Suo, Anyun Zhang, Xili Cui, Lifeng Yang and Huabin Xing","doi":"10.1039/D5IM00077G","DOIUrl":"https://doi.org/10.1039/D5IM00077G","url":null,"abstract":"<p>Separation of iso-butene and iso-butane is vital to producing high purity iso-butene feedstock, but is challenging because of their close molecular size and properties. Adsorptive separation using porous materials like metal organic frameworks (MOFs) is emerging as a potential energy-efficient alternative. But it's hindered by the lack of porous materials that exhibit satisfactory iso-butene/iso-butane separation performance. In this study, a novel sulfonate functionalized material, ZU-603, is reported to achieve the benchmark separation performance of iso-butene/iso-butane <em>via</em> exploiting the geometric difference of the carbon backbone between the planar iso-butene and tetrahedral iso-butane. Single-crystal analysis of ZU-603 loaded with iso-butene and simulation studies reveal that the sulfonate sites bound the iso-butene <em>via</em> S<small>^{<em>δ</em>−}</small>⋯H<small>^<em>δ</em>+</small><img>C interactions, meanwhile iso-butene molecules are efficiently stacked <em>via</em> π–π interactions within the confined space, realizing higher stacking efficiency of iso-butene than iso-butane. ZU-603 shows an exceptionally high iso-butene adsorption uptake of 2.30 mmol g<small>⁻¹</small> (298 K, 1 bar) and a record high iso-butene/iso-butane uptake ratio of 2.77 at 1 bar, outperforming previously reported benchmarking materials (1.2). Fixed-bed breakthrough experiments confirm the impressive iso-butene/iso-butane dynamic separation ability of ZU-603. The work provides a potential shape-recognition strategy in designing functional materials for the efficient separation of hydrocarbons with similar physicochemical properties.</p><p>Keywords: Adsorptive separation; Hydrocarbon; Metal-organic frameworks; Iso-butene/iso-butane; Purification.</p>","PeriodicalId":29808,"journal":{"name":"Industrial Chemistry & Materials","volume":" 5","pages":" 535-542"},"PeriodicalIF":11.9,"publicationDate":"2025-07-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://pubs.rsc.org/en/content/articlepdf/2025/im/d5im00077g?page=search","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145078774","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"On-line detection of additive concentrations in acidic copper plating solution for metal interconnection by an electrochemical microfluidic workstation†","authors":"Yi Zhao, Ju-Xing Zeng, Jia-Qiang Yang, Tao Song, Ren Hu, Jian-Jia Su, Bo Zhang, Fang-Zu Yang, Dongping Zhan and Lianhuan Han","doi":"10.1039/D5IM00073D","DOIUrl":"https://doi.org/10.1039/D5IM00073D","url":null,"abstract":"<p>On-line detection of additive concentrations in acidic copper (Cu) electroplating solution, including the suppressor, accelerator and leveler, is crucial for the industrial production of integrated circuit metal interconnections. For this purpose, a portable electrochemical microfluidic workstation (EMW) is developed. The polymer electrochemical microfluidic chip is designed and fabricated by 3D printing, in which a liquid mixer is integrated with an electrochemical microcell. The asymmetrically distributed herringbone microstructures in the microchannels (width: 400 μm, height: 300 μm, length: 4 cm) ensure the highly efficient mixture of solutions. In the electrochemical microcell, a 12.5 μm radius platinum ultramicroelectrode (Pt UME) acts as the working electrode. Based on the suppressing or accelerating effects of the additives on Cu electroplating, the calibration curves can be obtained by the stripping charge of electrodeposited Cu. Thus, the concentration of each additive in the acidic Cu electroplating solution can be detected on line and adjusted in time. The solution volume needed for each additive is approximately 220 μL. The detection error is lower than 10%, meeting the analytic requirements in industry. The automated EMW has the potential to replace the current manual cyclic voltammetry stripping (CVS) employed in lab analysis.</p><p>Keywords: Electrochemical microfluidic workstation; On-line detection of additive concentration; Microfluidic chip; Ultramicroelectrode; Acidic copper electroplating.</p>","PeriodicalId":29808,"journal":{"name":"Industrial Chemistry & Materials","volume":" 5","pages":" 607-617"},"PeriodicalIF":11.9,"publicationDate":"2025-06-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://pubs.rsc.org/en/content/articlepdf/2025/im/d5im00073d?page=search","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145078705","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Fine-tuned ultramicroporous carbon materials via CO2 activation for molecular sieving of fluorinated propylene and propane†","authors":"Yiwen Fu, Liangzheng Sheng, Wei Xia, Guangtong Hai, Jialei Yan, Lihang Chen, Qiwei Yang, Zhiguo Zhang, Qilong Ren and Zongbi Bao","doi":"10.1039/D5IM00079C","DOIUrl":"https://doi.org/10.1039/D5IM00079C","url":null,"abstract":"<p>Ultramicroporous carbon materials with precisely engineered pore structures offer a promising pathway for the challenging separation of fluorinated gases with similar physicochemical properties, such as C<small>₃</small>F<small>₆</small> (fluorinated propylene) and C<small>₃</small>F<small>₈</small> (fluorinated propane). In this work, we report the synthesis of CO<small>₂</small>-activated porous carbon adsorbents derived from a precursory resin and systematically investigate their molecular sieving behavior for C<small>₃</small>F<small>₆</small>/C<small>₃</small>F<small>₈</small> mixtures. Through controlled thermal pyrolysis and stepwise CO<small>₂</small> activation, we tailored ultramicropore size distributions to selectively exclude or admit target molecules. Adsorption studies reveal that optimal CO<small>₂</small> activation yields pore sizes that enable effective separation of C<small>₃</small>F<small>₆</small> from C<small>₃</small>F<small>₈</small>, achieving efficient molecular sieving due to size exclusion effects. Excessive activation, however, generates larger pores that diminish selectivity due to nonspecific affinity for both gases. The findings highlight the importance of ultramicropore control for energy-efficient separation of fluorinated hydrocarbons and provide insights for designing advanced adsorbents for industrial gas purification.</p><p>Keywords: Electronic specialty gas (ESGs); Adsorption separation; Phenolic resin-derived carbon; Molecular sieving; C<small>₃</small>F<small>₆</small>/C<small>₃</small>F<small>₈</small>.</p>","PeriodicalId":29808,"journal":{"name":"Industrial Chemistry & Materials","volume":" 5","pages":" 567-577"},"PeriodicalIF":11.9,"publicationDate":"2025-06-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://pubs.rsc.org/en/content/articlepdf/2025/im/d5im00079c?page=search","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145078784","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Synergistic strengthening of ion-exchange resins by post-crosslinking and selective sulfonation for PGMEA purification†","authors":"Nian Zhang, Fan Liu, Dan Li, Chunyan Shi, Aizi Cai, Shizhe Xu, Yaocheng Dai, Yan Wang and Haifeng Dong","doi":"10.1039/D5IM00078E","DOIUrl":"https://doi.org/10.1039/D5IM00078E","url":null,"abstract":"<p>PGMEA is widely used as a solvent and diluent for photoresists, yet developing an efficient resin that simultaneously resists organic dissolution and removes trace metal ions presents a significant challenge. To overcome this, a novel sulfonated hyper-cross-linked resin (2-CS-DVB-SO<small>₃</small>H) was synthesized through a multi-step process involving the preparation of a Cl-functionalized gel polymer, followed by sulfonation and post-crosslinking. The effects of the monomers, crosslinking degree, sulfonation degree, dosage, adsorption temperature, and resin stability on its purity performance were discussed. The resulting resin demonstrated exceptional stability in organic media and effectively purified PGMEA under optimized conditions (30% crosslinking, 4.69% S content, and 0.2 g mL<small>⁻¹</small> resin dosage), with Ti, Co, Ni, and Cu metal ion concentrations reduced below 10 ppb. This process elevated PGMEA purity from 98.90% to 99.48%. Thermodynamic analysis revealed the adsorption to be non-spontaneous. The resin maintained chemical stability in PGMEA within 18 h. FT-IR and XPS data identified ion exchange, electrostatic interactions and lone electron pair coordination between sulfonic acid groups and metal ions as the binding mechanisms. The hydrogen bonds formed between Cl<small>⁻</small> on the resin and hydroxyl groups in methanol (as organic impurities) were considered the primary factor responsible for enhancing the purity of PGMEA. These results collectively establish 2-CS-DVB-SO<small>₃</small>H as a robust and reliable material for metal ion removal in PGMEA purification, thereby improving the purity of photoresist solvents and potentially enhancing photoresist performance.</p><p>Keywords: Sulfonated resin; PGMEA; Metal ion removal; Purification mechanisms.</p>","PeriodicalId":29808,"journal":{"name":"Industrial Chemistry & Materials","volume":" 5","pages":" 631-642"},"PeriodicalIF":11.9,"publicationDate":"2025-06-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://pubs.rsc.org/en/content/articlepdf/2025/im/d5im00078e?page=search","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145078707","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Nitrogen doped hierarchical porous carbon for supercapacitors and zinc ion hybrid capacitors†","authors":"Jun Ni, Weijian Chen, Xinyang Zhang, Hui Xu, Minghui Zhang and Xiaoliang Wu","doi":"10.1039/D5IM00044K","DOIUrl":"https://doi.org/10.1039/D5IM00044K","url":null,"abstract":"<p>Heteroatom-doped hierarchical porous carbon materials demonstrate significant promise for energy storage applications. In this paper, nitrogen-doped hierarchical porous carbon (NPC) materials were synthesized by one-step carbonization process using agar as the carbon precursor, urea as the nitrogen precursor, and KHCO<small>₃</small> as the activating agent. Owing to the combined influence of substantial nitrogen and oxygen functional groups, interconnected hierarchical porous structure and large specific surface area, the NPC-600 electrode delivers a high specific capacitance of 450 F g<small>⁻¹</small> and remarkable cyclic stability. Moreover, the NPC-600//NPC-600 symmetrical supercapacitor delivers an energy density of 29.41 Wh kg<small>⁻¹</small> and good cyclic performance. More interestingly, a zinc ion hybrid capacitor (ZIHC) constructed with NPC-600 as the positive electrode achieves a capacitance of 368.78 F g<small>⁻¹</small> (163.9 mAh g<small>⁻¹</small>), an energy density reaching 120.75 Wh kg<small>⁻¹</small> and superior cyclic characteristics. The research affords a straightforward way for fabricating heteroatom-doped porous carbon as electrode for supercapacitor and ZIHCs.</p><p>Keywords: Hierarchical porous carbon; KHCO<small>₃</small>; Agar; Supercapacitor; Zinc ion hybrid capacitor.</p>","PeriodicalId":29808,"journal":{"name":"Industrial Chemistry & Materials","volume":" 4","pages":" 475-484"},"PeriodicalIF":0.0,"publicationDate":"2025-06-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://pubs.rsc.org/en/content/articlepdf/2025/im/d5im00044k?page=search","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144641063","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Lithographic performances of aryl sulfonate ester-modified polystyrenes as nonchemically amplified resists†","authors":"Rongrong Peng, Peng Lian, Jinping Chen, Tianjun Yu, Yi Zeng, Shuangqing Wang, Xudong Guo, Rui Hu, Jun Zhao, Yanqing Wu, Guoqiang Yang and Yi Li","doi":"10.1039/D5IM00046G","DOIUrl":"https://doi.org/10.1039/D5IM00046G","url":null,"abstract":"<p>Aryl sulfonate ester modified polystyrenes with different substituents (X–SEPS, X = H–, MeO–, and CN–) were synthesized by reversible addition-fragmentation chain transfer (RAFT) polymerization. The excellent thermal stability and film-forming capability of these three polymers suggest that they can satisfy the lithography process and are candidates for resist materials. Comparative electron beam lithography (EBL) demonstrates that the three resists (H–SEPS, MeO–SEPS and CN–SEPS) exhibit different EBL performances. Calculation of bond energies for the model compounds suggests that the influence of substituent groups on the bond energy is not the reason for the differences in sensitivity. Results obtained using a fully automated dissipative quartz crystal microbalance (QCM) analyzer confirm that the influence of substituent groups on the solubility behavior of resist films in developers leads to different photolithographic performances. The H–SEPS resist exhibits better comprehensive performance than the MeO–SEPS and CN–SEPS resists, achieving an 18 nm line/space (L/S) pattern and a 10 nm line/4 space (L/4S) semi-dense pattern by EBL at doses of 3200 and 2800 μC cm<small>⁻²</small>, respectively. Further extreme ultraviolet lithography (EUVL) demonstrates the capability of H–SEPS resist to form 22 nm half-pitch (HP) patterns. The detailed study of the photochemical reaction and patterning mechanism suggests that the decomposition of sulfonate ester groups into polar sulfonic acid groups, along with a rearrangement, leads to a solubility switch of resist films in the developer.</p><p>Keywords: Nonchemically amplified resist; Reversible addition-fragmentation chain transfer polymerization; Aryl sulfonate; Electron beam lithography; Extreme ultraviolet lithography.</p>","PeriodicalId":29808,"journal":{"name":"Industrial Chemistry & Materials","volume":" 5","pages":" 553-566"},"PeriodicalIF":11.9,"publicationDate":"2025-06-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://pubs.rsc.org/en/content/articlepdf/2025/im/d5im00046g?page=search","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145078783","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Engineering sulfonated polymers for the removal of ultra-trace complexed Cr(iii) in tris(2-carboxyethyl) isocyanurate photoresist resin monomers†","authors":"Huiyao Huang, Shiquan Zhong, Yawen Chen, Wangquan Gong, Changshen Ye, Ting Qiu and Jie Chen","doi":"10.1039/D5IM00057B","DOIUrl":"https://doi.org/10.1039/D5IM00057B","url":null,"abstract":"<p>The semiconductor manufacturing industry imposes stringent requirements on the metal ion content of photoresist resin monomers. Tris(2-carboxyethyl) isocyanurate (H<small>₃</small>tci), a critical raw material for photoresist resin monomers, inevitably incorporates metal ions during production. However, its inherent carboxyethyl groups form stable coordination complexes with Cr(<small>III</small>), hindering the semiconductor-grade resin monomer production. To achieve the ultra-deep removal of Cr(<small>III</small>) at ultra-trace concentrations, inspired by the hard–soft-acid–base theory, we systematically modulated the electron-rich sulfonic acid group on polymers <em>via</em> controlled sulfonation conditions to achieve a novel series of adsorption materials (St) with ultra-high Cr(<small>III</small>) adsorption affinity. The adsorption–recrystallization process using 6 g of St-<em>V</em>-15 could reduce the Cr(<small>III</small>) concentration in a solution containing 1 g of H<small>₃</small>tci from 840 ppb to 27.5 ppb. Furthermore, St-<em>V</em>-15 exhibited a maximum adsorption capacity of 145 mg g<small>⁻¹</small> calculated using the Langmuir model and a rapid initial adsorption rate of 82.92 mg g<small>⁻¹</small> min<small>⁻¹</small> at 333 K. Additionally, St-<em>V</em>-15 demonstrated exceptional selectivity for Cr(<small>III</small>) over competing ions (<em>e.g.</em>, K(<small>I</small>), Mg(<small>II</small>), Na(<small>I</small>) and Zn(<small>II</small>)) and maintained stable performance over at least 10 adsorption–desorption cycles. The superior performance originated from the chelation between Cr(<small>III</small>) and the sites of O atoms (S–O and S<img>O) combined with the electrostatic interaction between deprotonated sulfonic acid groups and Cr(<small>III</small>). These results position St-<em>V</em>-15 as a promising adsorption material for ultra-trace Cr(<small>III</small>) removal in H<small>₃</small>tci, offering a cost-effective solution for semiconductor-grade resin monomer production for the very first time.</p><p>Keywords: Tris(2-carboxyethyl) isocyanurate; Complexed Cr(<small>III</small>); Ultra-trace; Cr(<small>III</small>) removal; Sulfonated polymers.</p>","PeriodicalId":29808,"journal":{"name":"Industrial Chemistry & Materials","volume":" 5","pages":" 618-630"},"PeriodicalIF":11.9,"publicationDate":"2025-06-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://pubs.rsc.org/en/content/articlepdf/2025/im/d5im00057b?page=search","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145078706","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}