ACS Physical Chemistry AuPub Date : 2024-12-10eCollection Date: 2025-01-22DOI: 10.1021/acsphyschemau.4c00089
Fábio J Amorim, Giovanni F Caramori
{"title":"Exploring the Capability of Mechanically Interlocked Molecules in Anion Recognition: A Computational Insight.","authors":"Fábio J Amorim, Giovanni F Caramori","doi":"10.1021/acsphyschemau.4c00089","DOIUrl":"10.1021/acsphyschemau.4c00089","url":null,"abstract":"<p><p>The present study elucidated the role of both hydrogen and halogen bonds, from an electronic structure perspective, in the anion recognition process by the [2]catenane (<b>1</b>) containing a moiety with hydrogen bond donors entangled with another macrocyclic halogen bond donor. Spherical and nonspherical anions have been employed. The roles of different σ-hole donors have also been considered. The structure of <b>1</b> was modified by incorporating other σ-hole donors, namely bromine, chlorine, fluorine, as well as -Te-CH<sub>3</sub> as a chalcogen bond donor, leading to the modified [2]catenanes <b>2</b>-<b>5</b>. Insights into anion recognition were gained by quantifying the contributions of not only the mechanical but also hydrogen and halogen/chalcogen bonds to anion recognition using the GKS-EDA energy partition scheme and homodesmostic reactions scheme. GKS-EDA reveals that the anions Cl<sup>-</sup> and TS<sup>-</sup> exhibit the most stabilizing interactions with the <b>1</b> binding pocket. The EDA results confirm that by changing from a stronger σ-hole donor (I) to a weaker σ-hole donor (F) will have a considerable impact on anion interaction, thereby demonstrating that the halogen bonds formed between the [2]catenane and the anion play a pivotal role.</p>","PeriodicalId":29796,"journal":{"name":"ACS Physical Chemistry Au","volume":"5 1","pages":"101-111"},"PeriodicalIF":3.7,"publicationDate":"2024-12-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC11758374/pdf/","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143047872","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
ACS Physical Chemistry AuPub Date : 2024-12-04eCollection Date: 2025-01-22DOI: 10.1021/acsphyschemau.4c00068
José A S Laranjeira, Nicolas Martins, Pablo A Denis, Julio Sambrano
{"title":"High Stability, Piezoelectric Response, and Promising Photocatalytic Activity on the New Pentagonal CGeP<sub>4</sub> Monolayer.","authors":"José A S Laranjeira, Nicolas Martins, Pablo A Denis, Julio Sambrano","doi":"10.1021/acsphyschemau.4c00068","DOIUrl":"10.1021/acsphyschemau.4c00068","url":null,"abstract":"<p><p>This study introduces the penta-structured semiconductor p-CGeP<sub>4</sub> through density functional theory simulations, which possesses an indirect band gap transition of 3.20 eV. Mechanical analysis confirms the mechanical stability of p-CGeP<sub>4</sub>, satisfying Born-Huang criteria. Notably, p-CGeP<sub>4</sub> has significant direct (<i>e</i> <sub>31</sub> = -11.27 and <i>e</i> <sub>36</sub> = -5.34 × 10<sup>-10</sup> C/m) and converse (<i>d</i> <sub>31</sub> = -18.52 and <i>d</i> <sub>36</sub> = -13.18 pm/V) piezoelectric coefficients, surpassing other pentagon-based structures. Under tensile strain, the band gap energy increases to 3.31 eV at 4% strain, then decreases smoothly to 1.97 eV at maximum stretching, representing an ∼38% variation. Under compressive strain, the band gap decreases almost linearly to 2.65 eV at -8% strain and then drops sharply to 0.97 eV, an ∼69% variation. Strongly basic conditions result in a promising band alignment for the new p-CGeP<sub>4</sub> monolayer. This suggests potential photocatalytic behavior across all tensile strain regimes and significant compression levels (ε = 0% to -8%). This study highlights the potential of p-CGeP<sub>4</sub> for groundbreaking applications in nanoelectronic devices and materials engineering.</p>","PeriodicalId":29796,"journal":{"name":"ACS Physical Chemistry Au","volume":"5 1","pages":"62-71"},"PeriodicalIF":3.7,"publicationDate":"2024-12-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC11758271/pdf/","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143047878","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
David C. Zeitz, Vivien L. Cherrette, Sarah A. Creech, Yan Li, Yuan Ping and Jin Z. Zhang*,
{"title":"","authors":"David C. Zeitz, Vivien L. Cherrette, Sarah A. Creech, Yan Li, Yuan Ping and Jin Z. Zhang*, ","doi":"","DOIUrl":"","url":null,"abstract":"","PeriodicalId":29796,"journal":{"name":"ACS Physical Chemistry Au","volume":"4 6","pages":"XXX-XXX XXX-XXX"},"PeriodicalIF":3.7,"publicationDate":"2024-11-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://pubs.acs.org/doi/pdf/10.1021/acsphyschemau.4c00051","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144399260","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}