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Optical and EUV Nanolithography XXXV最新文献

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A lithographic and etching study on EUV contact hole patterning for stochastic process mitigation towards advanced device scaling 针对先进器件缩放的随机过程减缓的EUV接触孔图案的光刻和蚀刻研究
Optical and EUV Nanolithography XXXV Pub Date : 2022-06-21 DOI: 10.1117/12.2614165
D. De Simone, P. Foubert, R. Fallica, Arnaud Dauendorffer, K. Nafus, N. Oikawa, Hironori Oka, Keita Kato
{"title":"A lithographic and etching study on EUV contact hole patterning for stochastic process mitigation towards advanced device scaling","authors":"D. De Simone, P. Foubert, R. Fallica, Arnaud Dauendorffer, K. Nafus, N. Oikawa, Hironori Oka, Keita Kato","doi":"10.1117/12.2614165","DOIUrl":"https://doi.org/10.1117/12.2614165","url":null,"abstract":"","PeriodicalId":181376,"journal":{"name":"Optical and EUV Nanolithography XXXV","volume":"42 18","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-06-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"120835814","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Front Matter: Volume 12051 封面:卷12051
Optical and EUV Nanolithography XXXV Pub Date : 2022-06-15 DOI: 10.1117/12.2643342
{"title":"Front Matter: Volume 12051","authors":"","doi":"10.1117/12.2643342","DOIUrl":"https://doi.org/10.1117/12.2643342","url":null,"abstract":"","PeriodicalId":181376,"journal":{"name":"Optical and EUV Nanolithography XXXV","volume":"18 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-06-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129394897","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
EUV mask absorber induced best focus shifts EUV掩膜吸收剂诱导最佳聚焦偏移
Optical and EUV Nanolithography XXXV Pub Date : 2022-06-13 DOI: 10.1117/12.2614174
H. Mesilhy, P. Evanschitzky, G. Bottiglieri, E. van Setten, C. van Lare, Tim Brunner, M. A. van de Kerkhof, A. Erdmann
{"title":"EUV mask absorber induced best focus shifts","authors":"H. Mesilhy, P. Evanschitzky, G. Bottiglieri, E. van Setten, C. van Lare, Tim Brunner, M. A. van de Kerkhof, A. Erdmann","doi":"10.1117/12.2614174","DOIUrl":"https://doi.org/10.1117/12.2614174","url":null,"abstract":"","PeriodicalId":181376,"journal":{"name":"Optical and EUV Nanolithography XXXV","volume":"43 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121019970","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 7
ILT for HVM: history, present and future 用于HVM的ILT:历史、现在和未来
Optical and EUV Nanolithography XXXV Pub Date : 2022-06-13 DOI: 10.1117/12.2616194
Danping Peng
{"title":"ILT for HVM: history, present and future","authors":"Danping Peng","doi":"10.1117/12.2616194","DOIUrl":"https://doi.org/10.1117/12.2616194","url":null,"abstract":"","PeriodicalId":181376,"journal":{"name":"Optical and EUV Nanolithography XXXV","volume":"37 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130258938","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Resist and reticle activities towards High-NA EUV ecosystem readiness 抵抗和瞄准高na EUV生态系统准备活动
Optical and EUV Nanolithography XXXV Pub Date : 2022-06-13 DOI: 10.1117/12.2614162
J. Santaclara, Weimin Gao, E. Hendrickx, V. Wiaux, J. Franke, Emily Gallagher, Kannan Keizer, T. Kovalevich, J. Finders
{"title":"Resist and reticle activities towards High-NA EUV ecosystem readiness","authors":"J. Santaclara, Weimin Gao, E. Hendrickx, V. Wiaux, J. Franke, Emily Gallagher, Kannan Keizer, T. Kovalevich, J. Finders","doi":"10.1117/12.2614162","DOIUrl":"https://doi.org/10.1117/12.2614162","url":null,"abstract":"","PeriodicalId":181376,"journal":{"name":"Optical and EUV Nanolithography XXXV","volume":"18 2","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"120865920","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Effect of diffraction phase control for EUV phase shift mask 衍射相位控制对EUV移相掩模的影响
Optical and EUV Nanolithography XXXV Pub Date : 2022-06-13 DOI: 10.1117/12.2614362
Dongmin Jeong, D. Kim, Yunsoo Kim, Min-Su Cho, Jinho Ahn
{"title":"Effect of diffraction phase control for EUV phase shift mask","authors":"Dongmin Jeong, D. Kim, Yunsoo Kim, Min-Su Cho, Jinho Ahn","doi":"10.1117/12.2614362","DOIUrl":"https://doi.org/10.1117/12.2614362","url":null,"abstract":"","PeriodicalId":181376,"journal":{"name":"Optical and EUV Nanolithography XXXV","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129146783","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Photomasks unmasked: confessions of a recovering lithographer 曝光版:一位康复版印刷工的自白
Optical and EUV Nanolithography XXXV Pub Date : 2022-06-13 DOI: 10.1117/12.2615103
C. Progler
{"title":"Photomasks unmasked: confessions of a recovering lithographer","authors":"C. Progler","doi":"10.1117/12.2615103","DOIUrl":"https://doi.org/10.1117/12.2615103","url":null,"abstract":"","PeriodicalId":181376,"journal":{"name":"Optical and EUV Nanolithography XXXV","volume":"13 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130970687","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
High NA EUV enabling cost efficient scaling for N+1 technology nodes 高NA EUV可实现N+1技术节点的成本效益扩展
Optical and EUV Nanolithography XXXV Pub Date : 2022-06-13 DOI: 10.1117/12.2617240
G. Storms, S. Lok, Rob van Ballegoij, J. van Schoot, R. Peeters, Diederik de Bruin, K. Troost, Teun van Gogh
{"title":"High NA EUV enabling cost efficient scaling for N+1 technology nodes","authors":"G. Storms, S. Lok, Rob van Ballegoij, J. van Schoot, R. Peeters, Diederik de Bruin, K. Troost, Teun van Gogh","doi":"10.1117/12.2617240","DOIUrl":"https://doi.org/10.1117/12.2617240","url":null,"abstract":"","PeriodicalId":181376,"journal":{"name":"Optical and EUV Nanolithography XXXV","volume":"34 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127879240","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
The EUV mask as a system: function breakdown and interface description EUV掩模作为一个系统:功能分解和接口描述
Optical and EUV Nanolithography XXXV Pub Date : 2022-06-13 DOI: 10.1117/12.2614677
J. Finders, C. van Lare, D. Nam, P. Broman, E. van Setten, F. de Lange, F. Timmermans
{"title":"The EUV mask as a system: function breakdown and interface description","authors":"J. Finders, C. van Lare, D. Nam, P. Broman, E. van Setten, F. de Lange, F. Timmermans","doi":"10.1117/12.2614677","DOIUrl":"https://doi.org/10.1117/12.2614677","url":null,"abstract":"","PeriodicalId":181376,"journal":{"name":"Optical and EUV Nanolithography XXXV","volume":"52 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116597778","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Tin removal by annular surface wave plasma antenna in an extreme ultraviolet source 极紫外光源环形表面波等离子体天线除锡
Optical and EUV Nanolithography XXXV Pub Date : 2022-06-13 DOI: 10.1117/12.2619407
Dren Qerimi, Andrew C. Herschberg, Parker Hays, Tyler Pohlman, D. Ruzic
{"title":"Tin removal by annular surface wave plasma antenna in an extreme ultraviolet source","authors":"Dren Qerimi, Andrew C. Herschberg, Parker Hays, Tyler Pohlman, D. Ruzic","doi":"10.1117/12.2619407","DOIUrl":"https://doi.org/10.1117/12.2619407","url":null,"abstract":"","PeriodicalId":181376,"journal":{"name":"Optical and EUV Nanolithography XXXV","volume":"19 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133039539","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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