D. De Simone, P. Foubert, R. Fallica, Arnaud Dauendorffer, K. Nafus, N. Oikawa, Hironori Oka, Keita Kato
{"title":"A lithographic and etching study on EUV contact hole patterning for stochastic process mitigation towards advanced device scaling","authors":"D. De Simone, P. Foubert, R. Fallica, Arnaud Dauendorffer, K. Nafus, N. Oikawa, Hironori Oka, Keita Kato","doi":"10.1117/12.2614165","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":181376,"journal":{"name":"Optical and EUV Nanolithography XXXV","volume":"42 18","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-06-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Optical and EUV Nanolithography XXXV","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2614165","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}