针对先进器件缩放的随机过程减缓的EUV接触孔图案的光刻和蚀刻研究

{"title":"针对先进器件缩放的随机过程减缓的EUV接触孔图案的光刻和蚀刻研究","authors":"D. De Simone, P. Foubert, R. Fallica, Arnaud Dauendorffer, K. Nafus, N. Oikawa, Hironori Oka, Keita Kato","doi":"10.1117/12.2614165","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":181376,"journal":{"name":"Optical and EUV Nanolithography XXXV","volume":"42 18","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-06-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":"{\"title\":\"A lithographic and etching study on EUV contact hole patterning for stochastic process mitigation towards advanced device scaling\",\"authors\":\"D. De Simone, P. Foubert, R. Fallica, Arnaud Dauendorffer, K. Nafus, N. Oikawa, Hironori Oka, Keita Kato\",\"doi\":\"10.1117/12.2614165\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"\",\"PeriodicalId\":181376,\"journal\":{\"name\":\"Optical and EUV Nanolithography XXXV\",\"volume\":\"42 18\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2022-06-21\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"3\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Optical and EUV Nanolithography XXXV\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1117/12.2614165\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Optical and EUV Nanolithography XXXV","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2614165","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}