H. Mesilhy, P. Evanschitzky, G. Bottiglieri, E. van Setten, C. van Lare, Tim Brunner, M. A. van de Kerkhof, A. Erdmann
{"title":"EUV mask absorber induced best focus shifts","authors":"H. Mesilhy, P. Evanschitzky, G. Bottiglieri, E. van Setten, C. van Lare, Tim Brunner, M. A. van de Kerkhof, A. Erdmann","doi":"10.1117/12.2614174","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":181376,"journal":{"name":"Optical and EUV Nanolithography XXXV","volume":"43 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"7","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Optical and EUV Nanolithography XXXV","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2614174","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}