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2018 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)最新文献

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Inter-band coupling in Empirical Pseudopotential Method based bandstructure calculations of group IV and III-V nanostructures 基于经验赝势法的带间耦合计算IV族和III-V族纳米结构的能带结构
2018 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) Pub Date : 2018-09-01 DOI: 10.1109/SISPAD.2018.8551706
D. Rideau, G. Mugny, M. Pala, D. Esseni
{"title":"Inter-band coupling in Empirical Pseudopotential Method based bandstructure calculations of group IV and III-V nanostructures","authors":"D. Rideau, G. Mugny, M. Pala, D. Esseni","doi":"10.1109/SISPAD.2018.8551706","DOIUrl":"https://doi.org/10.1109/SISPAD.2018.8551706","url":null,"abstract":"This paper presents a systematic analysis of the use of the linear combination of bulk bands based on the empirical pseudopotential method to obtain the bandstructure of confined nanostructures. The relevance of interband coupling between conduction and valence bands in III-V materials is highlighted.","PeriodicalId":170070,"journal":{"name":"2018 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)","volume":"71 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115146218","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Boundary Concepts for an Improvement of the Numerical Solution with regard to the Wigner Transport Equation 改进Wigner输运方程数值解的边界概念
2018 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) Pub Date : 2018-09-01 DOI: 10.1109/SISPAD.2018.8551736
L. Schulz, D. Schulz
{"title":"Boundary Concepts for an Improvement of the Numerical Solution with regard to the Wigner Transport Equation","authors":"L. Schulz, D. Schulz","doi":"10.1109/SISPAD.2018.8551736","DOIUrl":"https://doi.org/10.1109/SISPAD.2018.8551736","url":null,"abstract":"Even though the numerical solution of the Wigner Transport Equation is linked with problems, the approach is preferable from the engineering point of view. Among the several differences in comparisons based on the numerical solution of the Schrödinger equation, the absence of open boundary conditions may be one of the most prominent challenges. As a consequence unphysical results may be obtained. To overcome the limitations, two concepts are presented allowing an inclusion of open boundary conditions in the Wigner function formalism. The concepts are investigated by means of a simple structured resonant tunneling diode as a prototype device.","PeriodicalId":170070,"journal":{"name":"2018 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)","volume":"29 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127179111","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Impact of the Effective Mass on the Mobility in Si Nanowire Transistors 有效质量对硅纳米线晶体管迁移率的影响
2018 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) Pub Date : 2018-09-01 DOI: 10.1109/SISPAD.2018.8551630
C. Medina-Bailón, T. Sadi, M. Nedjalkov, Jaehyun Lee, S. Berrada, H. Carrillo-Nuñez, V. Georgiev, S. Selberherr, A. Asenov
{"title":"Impact of the Effective Mass on the Mobility in Si Nanowire Transistors","authors":"C. Medina-Bailón, T. Sadi, M. Nedjalkov, Jaehyun Lee, S. Berrada, H. Carrillo-Nuñez, V. Georgiev, S. Selberherr, A. Asenov","doi":"10.1109/SISPAD.2018.8551630","DOIUrl":"https://doi.org/10.1109/SISPAD.2018.8551630","url":null,"abstract":"In the simulation based research of aggressively scaled CMOS transistors, it is mandatoryto combine advanced transport simulators and quantum confinement effects with atomistic simulations which accurately reproduce the electronic structure at the nanometer scale. This work investigates the impact of cross-section dependent effective masses, obtained from atomistic simulations, on the mobility in Si nanowire transistors (NWTs). For the transport simulations, weuse the Kubo-Greenwood formalism with a set of multisubband phonon, surface roughness, and impurity scattering mechanisms.","PeriodicalId":170070,"journal":{"name":"2018 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)","volume":"47 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121453292","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 5
A Carrier Lifetime Sensitivity Probe Based on Transient Capacitance: A novel method to Characterize Lifetime in Z2FET 基于瞬态电容的载流子寿命灵敏度探头:一种表征Z2FET寿命的新方法
2018 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) Pub Date : 2018-09-01 DOI: 10.1109/SISPAD.2018.8551644
F. Adamu-Lema, M. Duan, V. Georgiev, P. Asenov
{"title":"A Carrier Lifetime Sensitivity Probe Based on Transient Capacitance: A novel method to Characterize Lifetime in Z2FET","authors":"F. Adamu-Lema, M. Duan, V. Georgiev, P. Asenov","doi":"10.1109/SISPAD.2018.8551644","DOIUrl":"https://doi.org/10.1109/SISPAD.2018.8551644","url":null,"abstract":"The Z2FET [1] (Fig.1) has a potential for application in memory cells without connection to external charge storage components. Since its invention and experimental demonstrations, essential progress has been made in analyzing its transient and DC properties via electrical characterization [2] and TCAD simulations [3, 4, 6]. However, until now no attempt has been made to investigate the transient capacitance (C-t), which, can be used to characterize the carrier lifetime ruling the dynamic operation of the Z2FET. The carrier lifetime is one of the most important parameters, which directly determines the Z2FET retention time (Fig. 2). In this work, using simulation, we analyze the impact of carrier lifetime on transient capacitance in the gated region of the Z2FET (Fig. 1) in order to provide guidelines of its experimental measurement and characterization.","PeriodicalId":170070,"journal":{"name":"2018 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)","volume":"50 5","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132792547","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
A Stochastic Modeling Framework for NBTI and TDDS in Small Area p-MOSFETs 小面积p- mosfet中NBTI和TDDS的随机建模框架
2018 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) Pub Date : 2018-09-01 DOI: 10.1109/SISPAD.2018.8551647
R. Anandkrishnan, S. Bhagdikar, N. Choudhury, R. Rao, B. Fernandez, A. Chaudhury, N. Parihar, S. Mahapatra
{"title":"A Stochastic Modeling Framework for NBTI and TDDS in Small Area p-MOSFETs","authors":"R. Anandkrishnan, S. Bhagdikar, N. Choudhury, R. Rao, B. Fernandez, A. Chaudhury, N. Parihar, S. Mahapatra","doi":"10.1109/SISPAD.2018.8551647","DOIUrl":"https://doi.org/10.1109/SISPAD.2018.8551647","url":null,"abstract":"Kinetic Monte Carlo (KMC) simulations are used to simulate the stochastic interface trap generation recovery $(Delta V_{IT})$ and hole trapping detrapping $(Delta V_{HT})$ during and after Negative Bias Temperature Instability (NBTI) stress. The simulated mean of threshold voltage shift $(Delta V_{IT}=Delta V_{HT}+Delta V_{HT})$ is verified against continuum simulations and mean of measured data on multiple small area devices. Simulated and measured time constants for steps of Time Dependent Defect Spectroscopy (TDDS) data and step like recovery after NBTI stress are compared and analyzed. Keywords–NBTI, HKMG, Kinetic Monte Carlo (KMC), interface trap generation, hole trapping, Reaction-Diffusion (RD) model, Non-Radiative Multi-phonon (NMP) model.","PeriodicalId":170070,"journal":{"name":"2018 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)","volume":"55 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130987531","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 6
A Deterministic Multi-Subband Boltzmann Transport Equation Solver for GaN Based HEMTs GaN基hemt的确定性多子带玻尔兹曼输运方程求解器
2018 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) Pub Date : 2018-09-01 DOI: 10.1109/SISPAD.2018.8551696
Suhyeong Cha, Sung-Min Hong
{"title":"A Deterministic Multi-Subband Boltzmann Transport Equation Solver for GaN Based HEMTs","authors":"Suhyeong Cha, Sung-Min Hong","doi":"10.1109/SISPAD.2018.8551696","DOIUrl":"https://doi.org/10.1109/SISPAD.2018.8551696","url":null,"abstract":"A high electron mobility transistor based on a GaN channel is simulated by using a deterministic Boltzmann transport equation solver. In order to verify the physical soundness of the scattering mechanisms, first, a mobility calculator has been implemented. Phonon-limited electron mobility is calculated for one-dimensional heterostructure in the low field regime. For GaN based HEMTs, the two-dimensional Poisson equation and the one-dimensional Schrodinger equation along the confinement direction are considered. The transport of electrons in the non-equilibrium state is determined by solving the Boltzmann equation expanded with the Fourier harmonics in a self-consistent manner. The polar optical phonon is considered to explain the scattering of the system and the Pauli principle is also included. The Boltzmann equation is implemented for the total energy space with H-transformation. Without assistance from the momentum-based equation, the direct bias ramping from the equilibrium solution can be performed.","PeriodicalId":170070,"journal":{"name":"2018 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)","volume":"51 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132930735","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Steady-State Empirical Model for Electrical Activation of Silicon-Implanted Gallium Nitride 硅注入氮化镓电活化的稳态经验模型
2018 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) Pub Date : 2018-09-01 DOI: 10.1109/SISPAD.2018.8551728
A. Toifl, S. Selberherr, V. Šimonka, J. Weinbub, A. Hössinger
{"title":"Steady-State Empirical Model for Electrical Activation of Silicon-Implanted Gallium Nitride","authors":"A. Toifl, S. Selberherr, V. Šimonka, J. Weinbub, A. Hössinger","doi":"10.1109/SISPAD.2018.8551728","DOIUrl":"https://doi.org/10.1109/SISPAD.2018.8551728","url":null,"abstract":"We propose a steady-state empirical activation model for the prediction of the electrical activation efficiency of silicon-implanted gallium nitride. Our model has been implemented into Silvaco’s Victory Process simulator which we utilize to perform an accurate prediction of the dopant activation profiles. The dopant activation strongly influences the device characteristics, which is demonstrated by device simulations of a state-of-the-art junction barrier Schottky rectifier. Our results show that increasing the annealing temperature by fifty degrees Celsius reduces the device’s on-state resistance by one order of magnitude.","PeriodicalId":170070,"journal":{"name":"2018 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)","volume":"47 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121203400","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Technique for Asymmetric Source/Drain Resistance Extraction on a Single Gate Length MOSFET 单栅长MOSFET非对称源漏电阻提取技术
2018 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) Pub Date : 2018-09-01 DOI: 10.1109/SISPAD.2018.8551676
P. Oldiges, Chen Zhang, Xin He Miao, M. Kang, T. Yamashita
{"title":"Technique for Asymmetric Source/Drain Resistance Extraction on a Single Gate Length MOSFET","authors":"P. Oldiges, Chen Zhang, Xin He Miao, M. Kang, T. Yamashita","doi":"10.1109/SISPAD.2018.8551676","DOIUrl":"https://doi.org/10.1109/SISPAD.2018.8551676","url":null,"abstract":"A simple inline measurement technique for extracting the individual resistance components of the source, drain, and channel on a single MOSFET device using DC measurements is proposed. Modeling data is used to prove the efficacy of the technique. This method can be applied to symmetric or asymmetric devices.","PeriodicalId":170070,"journal":{"name":"2018 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)","volume":"7 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121424182","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Topography Simulation of 4H-SiC-Chemical-Vapor-Deposition Trench Filling Including an OrientationDependent Surface Free Energy 含取向相关表面自由能的4h - sic化学气相沉积海沟填充形貌模拟
2018 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) Pub Date : 2018-09-01 DOI: 10.1109/SISPAD.2018.8551735
K. Mochizuki, Ji Shiyang, R. Kosugi, Y. Yonezawa, H. Okumura
{"title":"Topography Simulation of 4H-SiC-Chemical-Vapor-Deposition Trench Filling Including an OrientationDependent Surface Free Energy","authors":"K. Mochizuki, Ji Shiyang, R. Kosugi, Y. Yonezawa, H. Okumura","doi":"10.1109/SISPAD.2018.8551735","DOIUrl":"https://doi.org/10.1109/SISPAD.2018.8551735","url":null,"abstract":"Topography simulation of chemical-vapordeposition (CVD) trench filling has been advanced as a tool for designing fabrication processes of high-voltage 4H-SiC superjunction devices. In the longitudinal section of filled stripe trenches, an experimentally observed dip, which had not been well reproduced with a previous technique using a fixed surface free energy $gamma$, came to be qualitatively reproduced by including an orientation dependence of $gamma$.","PeriodicalId":170070,"journal":{"name":"2018 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)","volume":"07 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122372334","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Interplay of RDF and Gate LER Induced Statistical Variability in Negative Capacitance FETs 负电容场效应管中RDF和栅极LER诱导的统计变异的相互作用
2018 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) Pub Date : 2018-09-01 DOI: 10.1109/SISPAD.2018.8551747
T. Dutta, V. Georgiev, A. Asenov
{"title":"Interplay of RDF and Gate LER Induced Statistical Variability in Negative Capacitance FETs","authors":"T. Dutta, V. Georgiev, A. Asenov","doi":"10.1109/SISPAD.2018.8551747","DOIUrl":"https://doi.org/10.1109/SISPAD.2018.8551747","url":null,"abstract":"We investigate the impact on statistical variability induced by random dopant fluctuations (RDF) and gate line edge roughness (LER) acting separately and simultaneously in negative capacitance (NC) FETs. In order to simulate the NCFETs, we couple the 3D transistor simulator tool GARAND which is well suited for statistical variability simulations, with the Landau Khalatnikov (L-K) model of the ferroelectric. We also explore the impact of ferroelectric thickness scaling.","PeriodicalId":170070,"journal":{"name":"2018 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)","volume":"7 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122330162","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
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