E. Geiss, M. Aminpur, R. Sporer, V. Seshachalam, P. Timoney, Brendan O'Brien, J. LaRose, E. Barlaz, Cameron Werner, Katie Lutker-Lee, Luis Fernandez, Brian Pfeifer, C. Mbanaso, Yan Shao, Angélique Raley
{"title":"Advanced process technologies for photonics waveguide patterning","authors":"E. Geiss, M. Aminpur, R. Sporer, V. Seshachalam, P. Timoney, Brendan O'Brien, J. LaRose, E. Barlaz, Cameron Werner, Katie Lutker-Lee, Luis Fernandez, Brian Pfeifer, C. Mbanaso, Yan Shao, Angélique Raley","doi":"10.1117/12.2657729","DOIUrl":"https://doi.org/10.1117/12.2657729","url":null,"abstract":"","PeriodicalId":156510,"journal":{"name":"Advanced Etch Technology and Process Integration for Nanopatterning XII","volume":"33 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-06-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130665738","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Front Matter: Volume 12499","authors":"","doi":"10.1117/12.2685109","DOIUrl":"https://doi.org/10.1117/12.2685109","url":null,"abstract":"","PeriodicalId":156510,"journal":{"name":"Advanced Etch Technology and Process Integration for Nanopatterning XII","volume":"468 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-05-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121839686","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Seung Park, Yong-Hee Choi, David Lo, M. Kawaguchi, C. Das
{"title":"Ultra-low energy radical treatments for advanced 3D device structures","authors":"Seung Park, Yong-Hee Choi, David Lo, M. Kawaguchi, C. Das","doi":"10.1117/12.2659121","DOIUrl":"https://doi.org/10.1117/12.2659121","url":null,"abstract":"","PeriodicalId":156510,"journal":{"name":"Advanced Etch Technology and Process Integration for Nanopatterning XII","volume":"56 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-04-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128621514","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Radical etching of high-k and low-k dielectrics for three-dimension device manufacturing with microwave-ECR etching system","authors":"Yusuke Nakatani, Yasushi Sonoda, T. Iwase, Yi‐Ying Lin, Masashi Kawabata, Motohiro Tanaka","doi":"10.1117/12.2656040","DOIUrl":"https://doi.org/10.1117/12.2656040","url":null,"abstract":"","PeriodicalId":156510,"journal":{"name":"Advanced Etch Technology and Process Integration for Nanopatterning XII","volume":"12 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-04-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"134037101","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}