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Ultra-low energy radical treatments for advanced 3D device structures

Advanced Etch Technology and Process Integration for Nanopatterning XII Pub Date : 2023-04-30 DOI:10.1117/12.2659121
Seung Park, Yong-Hee Choi, David Lo, M. Kawaguchi, C. Das
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先进3D器件结构的超低能量根治
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Advanced Etch Technology and Process Integration for Nanopatterning XII
Advanced Etch Technology and Process Integration for Nanopatterning XII
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