2010 IEEE International Memory Workshop最新文献

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Highly-scalable disruptive reading scheme for Gb-scale SPRAM and beyond 用于gb级SPRAM及以上的高度可扩展的破坏性读取方案
2010 IEEE International Memory Workshop Pub Date : 2010-05-16 DOI: 10.1109/IMW.2010.5488324
R. Takemura, T. Kawahara, K. Ono, K. Miura, H. Matsuoka, H. Ohno
{"title":"Highly-scalable disruptive reading scheme for Gb-scale SPRAM and beyond","authors":"R. Takemura, T. Kawahara, K. Ono, K. Miura, H. Matsuoka, H. Ohno","doi":"10.1109/IMW.2010.5488324","DOIUrl":"https://doi.org/10.1109/IMW.2010.5488324","url":null,"abstract":"We propose a disruptive reading and restoring schemes for high-density SPRAM. The proposed scheme uses the feature that, with a desired error rate, TMR device doesn't switch its magnetization of free layer in a specific period of large current pulse. The restoring operation is performed to ensure the storing data. As a result, keeping the good scalability of spin-transfer torque writing toward Gb-scale and beyond, high speed reading with read-disturbance-free operation can be achieved. This operation also enables the SPRAM to accept the DDRx-SDRAM compatible operation.","PeriodicalId":149628,"journal":{"name":"2010 IEEE International Memory Workshop","volume":"29 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-05-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132780869","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 52
Charge loss in TANOS devices caused by Vt sensing measurements during retention 在保留期间由Vt传感测量引起的TANOS器件中的电荷损失
2010 IEEE International Memory Workshop Pub Date : 2010-05-16 DOI: 10.1109/IMW.2010.5488409
H. Park, G. Bersuker, D. Gilmer, K. Lim, M. Jo, H. Hwang, A. Padovani, L. Larcher, P. Pavan, W. Taylor, P. Kirsch
{"title":"Charge loss in TANOS devices caused by Vt sensing measurements during retention","authors":"H. Park, G. Bersuker, D. Gilmer, K. Lim, M. Jo, H. Hwang, A. Padovani, L. Larcher, P. Pavan, W. Taylor, P. Kirsch","doi":"10.1109/IMW.2010.5488409","DOIUrl":"https://doi.org/10.1109/IMW.2010.5488409","url":null,"abstract":"In TANOS stuctures in retention, the major decrease in the programmed threshold voltage is found to be caused by the Vt sensing (IdVg measurements) rather than by intrinsic charge loss (when no bias is applied). This Vt decrease can be understood within the process of the temperature-activated charge transport through the Al2O3 blocking oxide. The charge loss can be minimized when Vt sensing time is decreased down to micro seconds. Blocking oxides engineered by adding a thin SiO2 layer at the SiN/AlO interface demonstrate significant suppression of the charge loss.","PeriodicalId":149628,"journal":{"name":"2010 IEEE International Memory Workshop","volume":"126 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-05-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115621398","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 10
Study of electron and hole injection statistics of BE-SONOS NAND Flash BE-SONOS NAND闪存的电子和空穴注入统计研究
2010 IEEE International Memory Workshop Pub Date : 2010-05-16 DOI: 10.1109/IMW.2010.5488308
H. Lue, T. Hsu, S. Lai, Yan-Ru Chen, Kuan-Fu Chen, C. Lo, I. Huang, T. Han, M. Chen, W. P. Lu, K. C. Chen, Chih-Shen Chang, M. Liaw, K. Hsieh, Chih-Yuan Lu
{"title":"Study of electron and hole injection statistics of BE-SONOS NAND Flash","authors":"H. Lue, T. Hsu, S. Lai, Yan-Ru Chen, Kuan-Fu Chen, C. Lo, I. Huang, T. Han, M. Chen, W. P. Lu, K. C. Chen, Chih-Shen Chang, M. Liaw, K. Hsieh, Chih-Yuan Lu","doi":"10.1109/IMW.2010.5488308","DOIUrl":"https://doi.org/10.1109/IMW.2010.5488308","url":null,"abstract":"The electron and hole injection statistics of BE-SONOS NAND Flash is studied for the first time using a 75 nm charge-trapping NAND Flash test chip. By using the incremental step pulse programming (ISPP) method the impact of device variations are minimized and the electron number ( N ) fluctuation can be identified. We find that both electron and hole injection statistics well follow the Poisson statistics ( Sigma ∞ √N, where Sigma corresponds to the distribution width). However, due to the 3D fringing field effect the small transistors require more charge injection to obtain the same memory window, and this reduces the proportional factor of Sigma. We also found that the hole injection distribution is slightly broader than the electron injection, and can be explained by the lower charge centroid in nitride which leads to the larger proportional factor. Based on these results, we can also simulate the distribution for various technology nodes.","PeriodicalId":149628,"journal":{"name":"2010 IEEE International Memory Workshop","volume":"49 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-05-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126322097","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 7
Highly-reliable NAND flash memory using Al2O3-inserted inter-poly dielectric 高可靠的NAND快闪记忆体,使用al2o3插入的聚间介电体
2010 IEEE International Memory Workshop Pub Date : 2010-05-16 DOI: 10.1109/IMW.2010.5488413
Sung-Hae Lee, B. Koo, K. Hwang, Siyoung Choi, J. Moon
{"title":"Highly-reliable NAND flash memory using Al2O3-inserted inter-poly dielectric","authors":"Sung-Hae Lee, B. Koo, K. Hwang, Siyoung Choi, J. Moon","doi":"10.1109/IMW.2010.5488413","DOIUrl":"https://doi.org/10.1109/IMW.2010.5488413","url":null,"abstract":"The improvement of device performances has been achieved successfully through OAO IPD EOT scaling, which shows that OAO IPD is applicable to sub-40nm devices which require aggressive scaling of IPD EOT. Charge loss of OAO IPD at high temperature is explained by thermionic emission of alumina traps. Trap profiles of alumina were obtained by monitoring Vth shift above 100°C. OAO IPD shows good data retention at room temperature, which is consistent with trap profiles.","PeriodicalId":149628,"journal":{"name":"2010 IEEE International Memory Workshop","volume":"21 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-05-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124667968","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Post-manufacturing, 17-times acceptable raw bit error rate enhancement, dynamic codeword transition ECC scheme for highly reliable solid-state drives, SSDs 制造后,17倍可接受的原始误码率提高,动态码字转换ECC方案,高可靠的固态硬盘,ssd
2010 IEEE International Memory Workshop Pub Date : 2010-05-16 DOI: 10.1109/IMW.2010.5488311
S. Tanakamaru, Atsushi Esumi, Mitsuyoshi Ito, Kai Li, K. Takeuchi
{"title":"Post-manufacturing, 17-times acceptable raw bit error rate enhancement, dynamic codeword transition ECC scheme for highly reliable solid-state drives, SSDs","authors":"S. Tanakamaru, Atsushi Esumi, Mitsuyoshi Ito, Kai Li, K. Takeuchi","doi":"10.1109/IMW.2010.5488311","DOIUrl":"https://doi.org/10.1109/IMW.2010.5488311","url":null,"abstract":"A dynamic codeword transition ECC scheme is proposed for highly reliable solid-state drives, SSDs. By monitoring the error number or the write / erase cycles, the ECC codeword dynamically increases from 512Byte (+parity) to 1KByte, 2KByte, 4KByte…32KByte. The proposed ECC with a larger codeword decreases the failure rate after ECC. As a result, the acceptable raw bit error rate, BER, before ECC is enhanced. Assuming a NAND Flash memory which requires 8-bit correction in 512Byte codeword ECC, a 17-times higher acceptable raw BER than the conventional fixed 512Byte codeword ECC is realized for the mobile phone application without an interleaving. For the MP3 player, digital-still camera and high-speed memory card applications with a dual channel interleaving, 15-times higher acceptable raw BER is achieved. Finally, for the SSD application with 8 channel interleaving, 13-times higher acceptable raw BER is realized. Because the parity rate per codeword is the same in each ECC codeword, no additional memory area is required. Note that the reliability of SSD is improved after the manufacturing without cost penalty. Compared with the conventional ECC with the fixed large 32KByte codeword, the proposed scheme achieves a better performance and a lower power consumption by introducing the “best-effort” type operation. In the proposed scheme, during the most of the lifetime of SSD, a weak ECC with a shorter codeword such as 512Byte (+parity), 1KByte and 2KByte is used and a 2.6 times better performance and a 98% lower power consumption is realized. At the life-end of SSD, a strong ECC with a 32KByte codeword is used and the highly reliable operation is achieved.","PeriodicalId":149628,"journal":{"name":"2010 IEEE International Memory Workshop","volume":"19 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-05-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126975075","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 19
A comparative study of the program efficiency of gate all around SONOS and TANOS flash memory 围绕SONOS和TANOS闪存的栅极程序效率的比较研究
2010 IEEE International Memory Workshop Pub Date : 2010-05-16 DOI: 10.1109/IMW.2010.5488407
Junghwan Ji, Byung-Gook Park, Jong Ho Lee, Hyungcheol Shin
{"title":"A comparative study of the program efficiency of gate all around SONOS and TANOS flash memory","authors":"Junghwan Ji, Byung-Gook Park, Jong Ho Lee, Hyungcheol Shin","doi":"10.1109/IMW.2010.5488407","DOIUrl":"https://doi.org/10.1109/IMW.2010.5488407","url":null,"abstract":"An analytic expression was obtained to examine the dependence of dielectric layers thickness and silicon radius on Vth shift, which is an important characteristic of gate all around SONOS/TANOS memory. As the radius of silicon decreases, the Vth shift decreases because of increasing capacitance in dielectric layers under the condition of same trapped charge density. The Vth shift is almost linearly dependant on bottom oxide thickness and top oxide thickness. The maximum Vth shift of TANOS is lower than that of SONOS because of high dielectric constant of blocking layer in TANOS. On the other hand, the program speed of TANOS is faster than that of SONOS.","PeriodicalId":149628,"journal":{"name":"2010 IEEE International Memory Workshop","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-05-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129433291","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
General chair 一般的椅子
2010 IEEE International Memory Workshop Pub Date : 1900-01-01 DOI: 10.1109/pdgc.2014.7030702
E. Joelianto, Wahidin Wahab, A. Widyotriatmo, Kuntoro Priyambodo, Sreenatha Gopalarao, Diah Chaerani, Estiko Riyanto, Indah E. Wijayanti, Mohd. Rizal, K. Hamzah., Ling Keck, Rajmohan Madhavan
{"title":"General chair","authors":"E. Joelianto, Wahidin Wahab, A. Widyotriatmo, Kuntoro Priyambodo, Sreenatha Gopalarao, Diah Chaerani, Estiko Riyanto, Indah E. Wijayanti, Mohd. Rizal, K. Hamzah., Ling Keck, Rajmohan Madhavan","doi":"10.1109/pdgc.2014.7030702","DOIUrl":"https://doi.org/10.1109/pdgc.2014.7030702","url":null,"abstract":"If you have a highly original idea related to software engineering, bring it Onward! Onward! is a place for highly original ideas about how technological advances and new applications are going to shape computational fabrics of the future. Onward! is more radical, more visionary, and more open than other conferences to not so well proven but well argued ideas. We welcome different ways of thinking about, approaching, and reporting on programming languages and software engineering research. Onward! takes a broad and inclusive view of computation and seeks contributions","PeriodicalId":149628,"journal":{"name":"2010 IEEE International Memory Workshop","volume":"70 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116589439","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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