{"title":"Fabricatiofn and characterization or iridium silicide/silicon Schottky barrier","authors":"J. Hao, X.R. Zhao, S.C. Qiou, X. Yi","doi":"10.1109/ECTC.1990.122262","DOIUrl":"https://doi.org/10.1109/ECTC.1990.122262","url":null,"abstract":"It is demonstrated that an IrSi/Si Schottky barrier can be formed by electron beam evaporation and annealing of Ir films on","PeriodicalId":102875,"journal":{"name":"40th Conference Proceedings on Electronic Components and Technology","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1990-05-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126100740","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
K. Lodge, J. A. Sparrow, E.D. Perry, E. A. Logan, M. Goosey, D. Pedder, C. Montgomery
{"title":"Prototype packages in aluminium nitride for high performance electronic systems","authors":"K. Lodge, J. A. Sparrow, E.D. Perry, E. A. Logan, M. Goosey, D. Pedder, C. Montgomery","doi":"10.1109/ECTC.1990.122175","DOIUrl":"https://doi.org/10.1109/ECTC.1990.122175","url":null,"abstract":"The authors illustrate the way in which many standard processing techniques, such as laser cutting, thick- and thin-film deposition, glassing, and soldering, can be used with aluminium nitride and highlight some of the ways in which material and process compatibilities can be achieved. The viability of such techniques is demonstrated by the production of aluminium nitride prototype packages and substrates using thick- and thin-film technologies. It is shown that thick and thin film substrates can be successfully produced in aluminium nitride. These can be incorporated into hermetic demonstrator packages quickly and easily by adopting standard techniques to assemble package components. By adopting this approach, it is possible to achieve a rapid turnaround of small numbers of demonstrator packages, allowing prompt assessment of both chip and package technologies and materials.<<ETX>>","PeriodicalId":102875,"journal":{"name":"40th Conference Proceedings on Electronic Components and Technology","volume":"12 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1990-05-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125397502","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
L. Khoury, David J. Burkhard, D. Galloway, T. Scharr
{"title":"A comparison of copper and gold wire bonding on integrated circuit devices","authors":"L. Khoury, David J. Burkhard, D. Galloway, T. Scharr","doi":"10.1109/ECTC.1990.122277","DOIUrl":"https://doi.org/10.1109/ECTC.1990.122277","url":null,"abstract":"A comparative approach was used to develop new copper wire bond technology using the current standard production gold wire process as a baseline. Characterizations were made in the areas of assembly processes and material selection, electrical and thermal performance, intermetallic formation on Al and Al alloy bond pads, and reliability testing. It was demonstrated that copper wire bond strength tested with wire-pull and ball-shear methods can be maintained at higher levels than comparable gold wire bonds. Die shear strengths were degraded by temperature cycling, but not by high-temperature storage. AC/DC parameter characterizations across temperature and power supply exhibited identical performances on copper and gold devices. Input impedance, capacitance, and ESD (electrostatic discharge) showed no deviations between Au and Cu wire bonded devices selected for this investigation. The lower resistivity of Cu wire offers the potential for increased device power ratings. The thermal transient response showed negligible differences between Au and Cu wire bonded devices. The difference in intermetallic growth rates between Au and Cu wire processed devices suggest that Cu wire bonded devices will have greater reliability than Au wire bonded devices. The reliability data indicate that copper wire bonding is at least equal to conventional gold wire bonding. It is concluded that a copper ball bond assembly process can be developed for mass production which will equal and potentially surpass the performance and reliability of the present gold ball bond assembly process.<<ETX>>","PeriodicalId":102875,"journal":{"name":"40th Conference Proceedings on Electronic Components and Technology","volume":"33 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1990-05-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122226540","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Wire sweep during molding of integrated circuits","authors":"L. Nguyen, F. J. Lim","doi":"10.1109/ECTC.1990.122278","DOIUrl":"https://doi.org/10.1109/ECTC.1990.122278","url":null,"abstract":"The conditions that lead to wire sweep during transfer molding of plastic packages are examined. The parameters investigated include the material flow properties, the mold cavity/leadframe aspect ratio, the wire modulus, and the wire bond configuration (e.g. diameter, length, and orientation). Flow visualization with a clear silicone fluid and actual molding with an epoxy compound were carried out in order to quantify sweep conditions. A 14-lead bipolar device attached to a recessed copper leadframe and bonded with gold wires was the test vehicle. A functional relationship between the wire sweep behavior and the various processing parameters is presented.<<ETX>>","PeriodicalId":102875,"journal":{"name":"40th Conference Proceedings on Electronic Components and Technology","volume":"35 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1990-05-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124776198","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"New military qualification testing procedures for cleaning agent alternatives to CFCs","authors":"B. C. Smiley","doi":"10.1109/ECTC.1990.122199","DOIUrl":"https://doi.org/10.1109/ECTC.1990.122199","url":null,"abstract":"The joint industry/military/EPA (US Environmental Protection Agency) program to evaluate alternatives to CCs and CFCs (chlorocarbons and chlorofluorocarbons) for printed board assembly cleaning is described. Phase one was completed in 1989 and established three measures for determining circuit-board cleanliness; surface insulation resistance (SIR), ionic levels (for inorganics), and a novel rosin-residue extraction method (for organics). Phase two of this program is to test alternative cleaning agents and processes against the standard. The author presents results obtained from this protocol for several cleaning alternatives under consideration as replacements for CFC-based materials.<<ETX>>","PeriodicalId":102875,"journal":{"name":"40th Conference Proceedings on Electronic Components and Technology","volume":"216 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1990-05-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129443537","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
L. Reith, J. Mann, N. Andreadakis, G. Lalk, C. Zah
{"title":"Single-mode fiber packaging for semiconductor optical devices","authors":"L. Reith, J. Mann, N. Andreadakis, G. Lalk, C. Zah","doi":"10.1109/ECTC.1990.122188","DOIUrl":"https://doi.org/10.1109/ECTC.1990.122188","url":null,"abstract":"The authors describe an approach which increases package assembly alignment tolerances substantially while demonstrating coupling efficiencies as high as 40%. This has been accomplished by utilizing a spherical lens to couple from the device into single-mode fiber. The ball lens is mounted directly on the chip carrier for maximum thermal and mechanical stability and is aligned mechanically rather than actively. The single-mode fiber alignment is done actively, and the fiber is positioned so as to compensate for misalignments of the ball lens. Coupling to the single-mode fiber was done directly and by using a second lens affixed to the end of the fiber. In addition to relaxed alignment tolerances, this coupling scheme has other advantages. The working distance between the ball lens and single-mode fiber is typically approximately=2-4 mm. This allows for easy insertion of microoptical components such as optical isolators or filters into the package. The scheme also lends itself to a flexible, modular approach to packaging. The dual-lens coupling technique has been used to package optical amplifiers. A fiber-to-fiber gain as large as 10 dB has been demonstrated using this coupling technique.<<ETX>>","PeriodicalId":102875,"journal":{"name":"40th Conference Proceedings on Electronic Components and Technology","volume":"2010 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1990-05-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129111874","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Local mismatches in SM solder joint FE analysis","authors":"M.J. Tervalon","doi":"10.1109/ECTC.1990.122304","DOIUrl":"https://doi.org/10.1109/ECTC.1990.122304","url":null,"abstract":"The relative effects of material properties on the attachment reliability of 68 I/O (input/output) 50-mil pitch PLCC (plastic leaded chip carriers) were assessed using FEA (finite-element analysis). Initially, the intent was to rank the local lead/solder and solder/PWB (printed wiring board) CTE (coefficient of thermal expansion) mismatches against the global device/PWB CTE mismatch as the driving cause for crack initiation. The experimental design changed only the CTE and elastic modulus of the PLCC lead frames. Under conditions of pure thermal expansion and in the absence of additional induced mechanical forces, such as with board flexure, the localized interfacial CTE mismatches are shown to be the primary cause of plastic strains in surface-mount solder joints. The belief that lead compliancy is a valid parameter for insuring attachment reliability is addressed and confirmed, but the differential strains caused by loading conditions equivalent to reducing the lead spring constants by an order of magnitude yield only a factor of three increase in the maximum plastic strain values on FR-4 PWBs. In contrast, altering the interfacial CTE differences by changing from an FR-4 to a Kevlar substrate or from a copper to Kovar lead frame, induces order-of-magnitude differences in the solder-joint plastic strains.<<ETX>>","PeriodicalId":102875,"journal":{"name":"40th Conference Proceedings on Electronic Components and Technology","volume":"7 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1990-05-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129207769","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Advanced decoupling using ceramic MLC capacitors","authors":"J.D. Prymak","doi":"10.1109/ECTC.1990.122312","DOIUrl":"https://doi.org/10.1109/ECTC.1990.122312","url":null,"abstract":"The author traces the evolution of early decoupling methods to present uses and some future directions. He tries to present a broad awareness that might reduce repetition and introduce a possible solution to the decoupling problem, noting that recent developments in high-speed decoupling have been in multiple simultaneous directions. The refinement of one design or technique has not necessarily led to the discovery of the next; rather, the developments in the different methods have usually been parallel, specific-application dictated. It is the multiple specific requirements that have led to the varied venues in design and technology. Attention is given to the development and utilization of the following devices: the four-terminal power entry capacitor, the power-plane decoupling capacitor, the 10- mu F 20-pH capacitor, and interdigitated leads.<<ETX>>","PeriodicalId":102875,"journal":{"name":"40th Conference Proceedings on Electronic Components and Technology","volume":"7 4","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1990-05-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"120923713","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Mechanism of electro-migration in ceramic package induced by chip-coating polyimide","authors":"M. Kohara, Y. Mashiko, K. Nakazaki, M. Nunoshita","doi":"10.1109/ECTC.1990.122295","DOIUrl":"https://doi.org/10.1109/ECTC.1990.122295","url":null,"abstract":"The mechanism of electromigration between the inner leads in a ceramic package was investigated. The short-circuit failure between the neighboring pins of the ceramic package, in which a polyimide-coated LSI chip was assembled, was observed in tests after burn in. An analysis of the bypass which caused the failure found that the composition of the bypass was electromigrated nickel from the inner lead. Gas analysis showed that N-methyl-pyrrolidone (NMP) and water were included in the package. From these analyses, it was found that the progress of the migration was as follows: (1) NMP and water were evaporated from polyimide film during burn in if the polyimide was insufficiently baked; (2) NMP condensed on the inner leads and absorbed water during cooling to room temperature; and (3) the electromigration occurred between the inner leads with electric potential. This failure was eliminated by sufficiently baking the polyimide coating.<<ETX>>","PeriodicalId":102875,"journal":{"name":"40th Conference Proceedings on Electronic Components and Technology","volume":"4 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1990-05-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121488155","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Development of copper wire bonding application technology","authors":"K. Toyozawa, K. Fujita, S. Minamide, T. Maeda","doi":"10.1109/ECTC.1990.122276","DOIUrl":"https://doi.org/10.1109/ECTC.1990.122276","url":null,"abstract":"Continuous forming of oxidation-free, stable, fully spherical copper balls has been realized by blowing reduction gas onto the copper wire during copper-ball formation (sparking). Chip damage resulting from hard copper wire, including underpad crack and silicon cratering, have been major technical hurdles to copper wire bonding. These problems have been overcome by introducing the double-load wire-bonding technology. Unlike conventional wire-bonding the double-load technology can minimize chip damage from wire-bonding stress because the bonding load is reduced during ultrasonic power oscillation. The double-load technology has made copper wire bonding applicable to MOS LSI devices.<<ETX>>","PeriodicalId":102875,"journal":{"name":"40th Conference Proceedings on Electronic Components and Technology","volume":"7 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1990-05-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127879876","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}