{"title":"Electrodeposition of copper on a copper single crystal (111) plane in the presence of iodide ions","authors":"S. Nageswar","doi":"10.1016/0300-9416(75)90042-5","DOIUrl":"10.1016/0300-9416(75)90042-5","url":null,"abstract":"<div><p>In the presence of iodide ions the pyramidal type of growth on a (111) face changes to a layer type of growth which transforms to ridges and then to polycrystalline material at low current densities. At higher concentrations the transitions are not regular. The surface becomes corroded at a higher concentration of iodide.</p></div>","PeriodicalId":100399,"journal":{"name":"Electrodeposition and Surface Treatment","volume":"3 3","pages":"Pages 195-204"},"PeriodicalIF":0.0,"publicationDate":"1975-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0300-9416(75)90042-5","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"85641869","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"The electropolishing of aluminum","authors":"P. Neufeld, D.M. Southall","doi":"10.1016/0300-9416(75)90038-3","DOIUrl":"10.1016/0300-9416(75)90038-3","url":null,"abstract":"<div><p>An electron microscopical study of electropolished aluminium films formed in a variety of different electrolytes is reported. Polishing in various electrolytes produces films which have different morphologies dependent upon the electrolyte used. The films have no common structure for the range of electrolytes used. It appears that the electrolyte needs only to be able to induce adequate ionic conductivity in the surface film for the production of a smooth and bright surface.</p></div>","PeriodicalId":100399,"journal":{"name":"Electrodeposition and Surface Treatment","volume":"3 3","pages":"Pages 159-168"},"PeriodicalIF":0.0,"publicationDate":"1975-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0300-9416(75)90038-3","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"87415722","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"The effect of a magnetic field on the electrodeposition of iron-nickel alloy","authors":"I. Ohno, M. Mukai","doi":"10.1016/0300-9416(75)90044-9","DOIUrl":"10.1016/0300-9416(75)90044-9","url":null,"abstract":"<div><p>The effect of a magnetic field on the electrodeposition of a thin film of iron-nickel alloy for magnetic material was examined. The cathode potential during the electrodeposition of a ferromagnetic iron-nickel alloy in the magnetic field was compared with that of non-magnetic copper and magnetic nickel. The effect of a magnetic field on the form of the electrodeposit was examined.</p><p>It was observed that the effect of a magnetic field on the cathode potential was to increase polarization in the electrodeposition of nickel and iron-nickel alloy and magnetic metals. The polarization effect was greater when the magnetic field was perpendicular to the electrolytic current flux than when the two fluxes were in parallel. The form of the electrodeposit changed greatly with changes in the direction of the magnetic field.</p></div>","PeriodicalId":100399,"journal":{"name":"Electrodeposition and Surface Treatment","volume":"3 3","pages":"Pages 213-218"},"PeriodicalIF":0.0,"publicationDate":"1975-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0300-9416(75)90044-9","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"74845265","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"A critical appraisal of the methods for measuring adhesion of electrodeposited coatings","authors":"","doi":"10.1016/0300-9416(75)90046-2","DOIUrl":"https://doi.org/10.1016/0300-9416(75)90046-2","url":null,"abstract":"","PeriodicalId":100399,"journal":{"name":"Electrodeposition and Surface Treatment","volume":"3 3","pages":"Page 223"},"PeriodicalIF":0.0,"publicationDate":"1975-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0300-9416(75)90046-2","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"136846818","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Electroplating of crack-free corrosion resistant Co-Mo alloy coatings","authors":"Vu Quang Kinh, E. Chassaing, M. Saurat","doi":"10.1016/0300-9416(75)90043-7","DOIUrl":"10.1016/0300-9416(75)90043-7","url":null,"abstract":"<div><p>Thick crack-free Co-Mo coatings containing 12%–18% molybdenum can be electroplated on metal substrates from an aqueous citrate complex bath containing sodium molybdate and a cobalt salt. The deposits have a columnar microstructure and a hardness of about 400 VHN. The internal tensile stress in the deposits is about 5 kg/mm<sup>2</sup>, does not change significantly with molybdenum content, but shows a slight decrease when the cathode current density increases. These Co-Mo deposited alloys are well-crystallized supersaturated solid solutions with a close-packed hexagonal structure. The cathodic current efficiencies vary between 60% and 75%, depending on experimental conditions. The resistance to acids, especially concentrated hydrochloric, is excellent. Corrosion behaviour of deposits is improved by adequate heat treatment and reaches that of their cast counterparts.</p></div>","PeriodicalId":100399,"journal":{"name":"Electrodeposition and Surface Treatment","volume":"3 3","pages":"Pages 205-212"},"PeriodicalIF":0.0,"publicationDate":"1975-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0300-9416(75)90043-7","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"88576860","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Electrodeposition of alloys III. Electrodeposition and x-ray structure of cobalt-indium alloys (initial studies)","authors":"Y.N. Sadana, A.E. Keskinen, M. Guindon","doi":"10.1016/0300-9416(75)90037-1","DOIUrl":"10.1016/0300-9416(75)90037-1","url":null,"abstract":"<div><p>Cobalt-indium alloys, ranging in composition from 2.0 to 90.6% cobalt, have been electrodeposited from aqueous solutions. The effect of current density on current efficiency and composition of the deposit has been studied. An increase in current density increases the cobalt content of the deposits. Addition of ammonium citrate improves current efficiency. X-ray studies of the annealed deposits indicate the presence of two intermediate phases, CoIn<sub>3</sub> and Co<sub>3</sub>In<sub>2</sub>, both of which are tetragonal. The lattice constants are: CoIn<sub>3</sub>, <em>a</em> = 8.2195 Å, <em>c</em> = 8.669 Å, <em>c</em>/<em>a</em> = 1.020; Co<sub>3</sub>In<sub>2</sub>, <em>a</em> = 8.23 Å and <em>c</em> = 10.478 Å, <em>c</em>/<em>a</em> = 1.272.</p></div>","PeriodicalId":100399,"journal":{"name":"Electrodeposition and Surface Treatment","volume":"3 3","pages":"Pages 149-157"},"PeriodicalIF":0.0,"publicationDate":"1975-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0300-9416(75)90037-1","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"74939155","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Interferometric investigation of the kinetics of the levelling process during bright electroplating","authors":"Chr. Nanev, L. Mirkova, St. Rashkov, R. Kaischev","doi":"10.1016/0300-9416(75)90040-1","DOIUrl":"10.1016/0300-9416(75)90040-1","url":null,"abstract":"<div><p>An interferometric method was devised for the direct quantitative investigation of the levelling ability of electrolytic baths used in the bright plating processes. The method makes it possible to measure <em>in situ</em> the main parameters of the depositing galvanic layer. The experimental conditions resemble those prevailing in industry; the electrolyte circulates, is continuously filtrated and is air agitated. The method is rapid and can be automated. Measurements are performed according to a preset time programme. It was applied to the study of the levelling ability of different baths for bright acid copper plating in which the cathode was an unmodulated gramophone plate matrix. The deposition rate in the grooves and onto the smooth portions of the electrode surface was established. From the data obtained the full pattern of the time dependence of the cathode profile was reconstructed.</p></div>","PeriodicalId":100399,"journal":{"name":"Electrodeposition and Surface Treatment","volume":"3 3","pages":"Pages 179-188"},"PeriodicalIF":0.0,"publicationDate":"1975-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0300-9416(75)90040-1","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"81352374","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Electrodeposition of zirconium diboride from oxides dissolved in molten cryolite","authors":"E.J. Frazer, K.E. Anthony , B.J. Welch","doi":"10.1016/0300-9416(75)90039-5","DOIUrl":"10.1016/0300-9416(75)90039-5","url":null,"abstract":"<div><p>Zirconium diboride has been deposited from B<sub>2</sub>O<sub>3</sub> and ZrO<sub>2</sub> dissolved in molten Na<sub>3</sub>AlF<sub>6</sub> using nickel as the cathode material. The mechanism of the deposition and the morphology of the deposit were shown to be strongly dependent upon melt composition and current density. A series of nickel boride diffusion compounds was also identified by electron microprobe analysis. The compounds Ni<sub>3</sub>B, Ni<sub>2</sub>B, Ni<sub>4</sub>B<sub>3</sub> and NiB were formed quite readily at lower current densities. The ZrB<sub>2</sub> deposit was mainly scaly and/or dendritic and was usually non-adherent. Three competing reaction sequences were found to be in operation: </p><ul><li><span>1.</span><span><p>(i) boron deposition and nickel boride formation by diffusion,</p></span></li><li><span>2.</span><span><p>(ii) boron deposition and subsequent chemical reaction with ZrO<sub>2</sub> to form ZrB<sub>2</sub>, and</p></span></li><li><span>3.</span><span><p>(iii) codeposition of boron and zirconium to form ZrB<sub>2</sub>.</p></span></li></ul></div>","PeriodicalId":100399,"journal":{"name":"Electrodeposition and Surface Treatment","volume":"3 3","pages":"Pages 169-177"},"PeriodicalIF":0.0,"publicationDate":"1975-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0300-9416(75)90039-5","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"90783470","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Macrostress in electrodeposited coatings determined by x-ray diffraction technique","authors":"L. Révay","doi":"10.1016/0300-9416(75)90049-8","DOIUrl":"10.1016/0300-9416(75)90049-8","url":null,"abstract":"<div><p>Various metallic coatings deposited on different substrates have been investigated by means of X-rays to determine the macrostresses. The dependence of lattice strain on sin<sup>2</sup> ψ obeys the linear relationship expected from the linear theory of elasticity.</p><p>The present study was intended to explore the possible application of X-ray macrostress measurement to surface coatings.</p><p>Measurement on gold electrodeposits revealed tensile stresses. After dissolution of the substrate (with intermediate nickel, copper or silver layer) the stress in the gold deposit changed to compressive. The stress of electrodeposited nickel was compressive; dissolution of the aluminium substrate reduced the stress level. Electrodeposited zinc coatings showed compressive stresses. The macrostresses are expressed in terms of proportional stresses to distinguish them from the absolute stress values.</p></div>","PeriodicalId":100399,"journal":{"name":"Electrodeposition and Surface Treatment","volume":"3 2","pages":"Pages 97-104"},"PeriodicalIF":0.0,"publicationDate":"1975-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0300-9416(75)90049-8","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"80910226","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}