{"title":"在碘离子存在下,在铜单晶(111)平面上电沉积铜","authors":"S. Nageswar","doi":"10.1016/0300-9416(75)90042-5","DOIUrl":null,"url":null,"abstract":"<div><p>In the presence of iodide ions the pyramidal type of growth on a (111) face changes to a layer type of growth which transforms to ridges and then to polycrystalline material at low current densities. At higher concentrations the transitions are not regular. The surface becomes corroded at a higher concentration of iodide.</p></div>","PeriodicalId":100399,"journal":{"name":"Electrodeposition and Surface Treatment","volume":"3 3","pages":"Pages 195-204"},"PeriodicalIF":0.0000,"publicationDate":"1975-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0300-9416(75)90042-5","citationCount":"2","resultStr":"{\"title\":\"Electrodeposition of copper on a copper single crystal (111) plane in the presence of iodide ions\",\"authors\":\"S. Nageswar\",\"doi\":\"10.1016/0300-9416(75)90042-5\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>In the presence of iodide ions the pyramidal type of growth on a (111) face changes to a layer type of growth which transforms to ridges and then to polycrystalline material at low current densities. At higher concentrations the transitions are not regular. The surface becomes corroded at a higher concentration of iodide.</p></div>\",\"PeriodicalId\":100399,\"journal\":{\"name\":\"Electrodeposition and Surface Treatment\",\"volume\":\"3 3\",\"pages\":\"Pages 195-204\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1975-05-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://sci-hub-pdf.com/10.1016/0300-9416(75)90042-5\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Electrodeposition and Surface Treatment\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/0300941675900425\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Electrodeposition and Surface Treatment","FirstCategoryId":"1085","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/0300941675900425","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Electrodeposition of copper on a copper single crystal (111) plane in the presence of iodide ions
In the presence of iodide ions the pyramidal type of growth on a (111) face changes to a layer type of growth which transforms to ridges and then to polycrystalline material at low current densities. At higher concentrations the transitions are not regular. The surface becomes corroded at a higher concentration of iodide.