合金的电沉积III。钴铟合金的电沉积和x射线结构(初步研究)

Y.N. Sadana, A.E. Keskinen, M. Guindon
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引用次数: 7

摘要

钴-铟合金,其组成范围从2.0到90.6%钴,已从水溶液中电沉积。研究了电流密度对电流效率和镀层成分的影响。电流密度的增加增加了镀层的钴含量。柠檬酸铵的加入提高了电流效率。x射线研究表明,退火后的矿床存在两种中间相,Co3In2和co3in3,两者都是四方相。晶格常数为:CoIn3, a = 8.2195 Å, c = 8.669 Å, c/a = 1.020;Co3In2, a = 8.23 Å, c = 10.478 Å, c/a = 1.272。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Electrodeposition of alloys III. Electrodeposition and x-ray structure of cobalt-indium alloys (initial studies)

Cobalt-indium alloys, ranging in composition from 2.0 to 90.6% cobalt, have been electrodeposited from aqueous solutions. The effect of current density on current efficiency and composition of the deposit has been studied. An increase in current density increases the cobalt content of the deposits. Addition of ammonium citrate improves current efficiency. X-ray studies of the annealed deposits indicate the presence of two intermediate phases, CoIn3 and Co3In2, both of which are tetragonal. The lattice constants are: CoIn3, a = 8.2195 Å, c = 8.669 Å, c/a = 1.020; Co3In2, a = 8.23 Å and c = 10.478 Å, c/a = 1.272.

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