Applications of Surface Science最新文献

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The contribution of kinetic nucleation theories to studies of Volmer-Weber thin film growth 动力学成核理论对Volmer-Weber薄膜生长研究的贡献
Applications of Surface Science Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90182-5
B.F. Usher
{"title":"The contribution of kinetic nucleation theories to studies of Volmer-Weber thin film growth","authors":"B.F. Usher","doi":"10.1016/0378-5963(85)90182-5","DOIUrl":"10.1016/0378-5963(85)90182-5","url":null,"abstract":"<div><p>Extensive study of the vapour deposition of noble metals onto UHV cleaved alkali halide crystal surfaces has made an important contribution to the development of time-dependent nucleation theory. There nevertheless remain significant inconsistencies between results obtained from different studies of identical systems. The role which the time-dependent kinetic approach to nucleation theory has played in the past and that which it might take in the future are discussed.</p></div>","PeriodicalId":100105,"journal":{"name":"Applications of Surface Science","volume":"22 ","pages":"Pages 506-511"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0378-5963(85)90182-5","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"90953095","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 11
SEM alloyed AuGeNi ohmic contacts to GaAs SEM alloyedGe在既ohmic接触GaAs摄氏度
Applications of Surface Science Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90236-3
A.G. Nassibian, T.S. Kalkur
{"title":"SEM alloyed AuGeNi ohmic contacts to GaAs","authors":"A.G. Nassibian,&nbsp;T.S. Kalkur","doi":"10.1016/0378-5963(85)90236-3","DOIUrl":"10.1016/0378-5963(85)90236-3","url":null,"abstract":"<div><p>A scanned electron beam from a commercial SEM is used for the localized alloying of vacuum evaporated AuGeNi contacts on n-type GaAs. The contact quality is studied for metallization thickness, 450–1350 Å, for furnace and electron beam alloyed contacts. For the electron beam alloyed method, the contact resistivity decreases with increasing metallization thickness and remains constant for thicknesses above 750 Å. Scanning electron microscopy and electron microprobe analysis shows that electron beam alloyed contacts undergo less redistribution of contact constituents than furnace alloyed contacts. The stability of the contacts is determined by high temperature ageing.</p></div>","PeriodicalId":100105,"journal":{"name":"Applications of Surface Science","volume":"22 ","pages":"Pages 1019-1026"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0378-5963(85)90236-3","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"86859240","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Anisotropic etching during negative ion resputtering 负离子溅射过程中的各向异性蚀刻
Applications of Surface Science Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90042-X
Russell Messier, Daniel J. Kester
{"title":"Anisotropic etching during negative ion resputtering","authors":"Russell Messier,&nbsp;Daniel J. Kester","doi":"10.1016/0378-5963(85)90042-X","DOIUrl":"10.1016/0378-5963(85)90042-X","url":null,"abstract":"<div><p>Negative ion resputtering leads to a nonuniform erosion of material which can result in a wide range of morphological features. These various surface structures are a consequence of focused bombardment processes which are highly sensitive to sputtering system geometry and preparation parameters. The continuous manner in which the features are connected leads to a clearer understanding of each.</p></div>","PeriodicalId":100105,"journal":{"name":"Applications of Surface Science","volume":"22 ","pages":"Pages 111-117"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0378-5963(85)90042-X","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"85116260","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Amorphous silicon solar cells produced by a DC magnetron glow discharge technique 用直流磁控管辉光放电技术制备非晶硅太阳能电池
Applications of Surface Science Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90221-1
D.R. McKenzie , G.B. Smith
{"title":"Amorphous silicon solar cells produced by a DC magnetron glow discharge technique","authors":"D.R. McKenzie ,&nbsp;G.B. Smith","doi":"10.1016/0378-5963(85)90221-1","DOIUrl":"10.1016/0378-5963(85)90221-1","url":null,"abstract":"<div><p>The production of amorphous silicon solar cells using deposition from a DC magnetron glow discharge is described. The cells have the p-i-n structure with indium tin oxide front contacts. Fill factors of 40% and overall solar efficiencies of around 1.2% were obtained. Investigations were carried out to determine the reasons for deficiencies in the carrier collection efficiency. The cell efficiency was increased by increasing the μτ product of the i-layer. The spectral dependences of carrier collection efficiency, open circuit voltage and fill factors were determined. Comparison with published theoretical models of similar cells showed that for the best cells, surface recombination effects limited the efficiency. Argon used in the p-layer deposition was the most likely cause of these effects.</p></div>","PeriodicalId":100105,"journal":{"name":"Applications of Surface Science","volume":"22 ","pages":"Pages 891-898"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0378-5963(85)90221-1","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"80176197","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Surface compositions of the two phases of differently prepared Ni-Cr-Al and Ni-Cr-Al-Zr samples 不同制备的Ni-Cr-Al和Ni-Cr-Al- zr样品的两相表面组成
Applications of Surface Science Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90050-9
M.M. El Gomati, M. Prutton, R.H. Roberts
{"title":"Surface compositions of the two phases of differently prepared Ni-Cr-Al and Ni-Cr-Al-Zr samples","authors":"M.M. El Gomati,&nbsp;M. Prutton,&nbsp;R.H. Roberts","doi":"10.1016/0378-5963(85)90050-9","DOIUrl":"10.1016/0378-5963(85)90050-9","url":null,"abstract":"<div><p>The surface compositions of the α/β and γ/γ' phases of different metallographic preparations of Ni-15Cr-24Al and Ni-15Cr-24Al-0.3Zr (at%) alloys are presented. Surfaces investigated include a mechanically polished surface for both alloys, a mechanically polished acid etched surface of the Ni-Cr-Al-Zr both before heating and after heating to 600°C for several hours, and the underlying surface of this latter sample exposed by ball cratering. Both phases of all surfaces considered show depletion of Al. It is concluded that the Al depletion is not an artefact of the sample metallographic preparation or the analytical procedure. This is supported by analysis of the composition of a sample scratched in situ under UHV. It is further concluded that the Al depletion is due to oxidation during bakeout. Cr-rich features in both the α/β and γ/γ' phases are reported. An optimal two dimensionally smoothed Cr Auger image is presented showing these features which are considered to be due to the αCr solid solution particles or clustering of these particles in the α/β phase and the Ni solid solution component in the γ/γ' phase.</p></div>","PeriodicalId":100105,"journal":{"name":"Applications of Surface Science","volume":"22 ","pages":"Pages 184-192"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0378-5963(85)90050-9","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"86819138","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Some properties of Si(111) and Ge(111) cleaved surfaces at low temperatures 低温下Si(111)和Ge(111)切割表面的一些性质
Applications of Surface Science Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90032-7
V.A. Grazhulis, V.F. Kuleshov
{"title":"Some properties of Si(111) and Ge(111) cleaved surfaces at low temperatures","authors":"V.A. Grazhulis,&nbsp;V.F. Kuleshov","doi":"10.1016/0378-5963(85)90032-7","DOIUrl":"10.1016/0378-5963(85)90032-7","url":null,"abstract":"<div><p>Low-temperature experimental results on Ge(111) and Si(111) surfaces prepared by crystal cleavage in ultra-high vacuum (∼ 10<sup>-10</sup> Torr), liquid N<sub>2</sub>, and liquid He are presented and briefly discussed. Some of these results are reanalyzed and new interpretations are suggested.</p></div>","PeriodicalId":100105,"journal":{"name":"Applications of Surface Science","volume":"22 ","pages":"Pages 14-24"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0378-5963(85)90032-7","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"90942605","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Some strategies for quantitative scanning Auger electron microscopy 定量扫描俄歇电子显微镜的一些策略
Applications of Surface Science Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90046-7
R. Browning , D.C. Peacock, M. Prutton
{"title":"Some strategies for quantitative scanning Auger electron microscopy","authors":"R. Browning ,&nbsp;D.C. Peacock,&nbsp;M. Prutton","doi":"10.1016/0378-5963(85)90046-7","DOIUrl":"10.1016/0378-5963(85)90046-7","url":null,"abstract":"<div><p>The general applicability of power law forms of the background in electron spectra is pointed out and exploited for background removal from under Auger peaks. This form of <em>B(E)</em> is found to be extremely sensitive to instrumental alignment and to fault-free construction - an observation which can be used to set up analyser configurations in an accurate way. Also, differences between <em>N(E)</em> and <em>B(E)</em> can be used to derive a spectrometer transmission function <em>T(E)</em>. The questions of information density in an energy-analysing spatially-resolving instrument are addressed after reliable instrumental characterization has been established. Strategies involving ratio histograms, showing the population distribution of the ratio of a pair of Auger peak heights, composition scatter diagrams and windowed imaging are discussed and illustrated.</p></div>","PeriodicalId":100105,"journal":{"name":"Applications of Surface Science","volume":"22 ","pages":"Pages 145-159"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0378-5963(85)90046-7","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"86184787","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Further studies on the semiconductivity and pyroelectricity of poled and Cd-doped mercury telluride thin films for electronics and engineering 电子和工程用掺杂镉和极化碲化汞薄膜的半导体性和热电性的进一步研究
Applications of Surface Science Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90209-0
A. Tawfik, M.M.Abou Sekkina, M.I.Abd El-Ati
{"title":"Further studies on the semiconductivity and pyroelectricity of poled and Cd-doped mercury telluride thin films for electronics and engineering","authors":"A. Tawfik,&nbsp;M.M.Abou Sekkina,&nbsp;M.I.Abd El-Ati","doi":"10.1016/0378-5963(85)90209-0","DOIUrl":"10.1016/0378-5963(85)90209-0","url":null,"abstract":"<div><p>The crystalline structure, electrical conductivity, and pyroelectricity of freshly prepared Hg<sub>0.7</sub>Cd<sub>0.30</sub>Te thin films have been investigated in detail. It was found that these properties hold good with one another. The roles of Hg migration, non-stoichiometry and degree of crystallinity are clearly indicated. Finally, the optimum conditions were evaluated and recommended for mercury telluride thin films for application in electronic industries and engineering.</p></div>","PeriodicalId":100105,"journal":{"name":"Applications of Surface Science","volume":"22 ","pages":"Pages 763-771"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0378-5963(85)90209-0","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"77331567","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
A rigorous diffraction theory for the optical properties of black chrome 黑铬光学性质的严格衍射理论
Applications of Surface Science Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90214-4
G.B. Smith, G.H. Derrick, R.C. McPhedran
{"title":"A rigorous diffraction theory for the optical properties of black chrome","authors":"G.B. Smith,&nbsp;G.H. Derrick,&nbsp;R.C. McPhedran","doi":"10.1016/0378-5963(85)90214-4","DOIUrl":"10.1016/0378-5963(85)90214-4","url":null,"abstract":"<div><p>Quantitative three-dimensional studies of morphology together with analysis of validity of quasistatic effective medium theories show the need for a diffraction treatment of the optical properties of solar selective black chrome. The spectral absorptance <em>A</em>(<em>λ</em>) is calculated for a doubly periodic modulation of chrome overcoated with Cr<sub>2</sub>O<sub>3</sub> or a cermet of Cr<sub>2</sub>O<sub>3</sub> and Cr metal. Various profiles, depths and coating thicknesses are used. Diffraction caused by the surface morphology explains the major features of <em>A</em>(<em>λ</em>) for black chrome. Internal structure is of secondary importance.</p></div>","PeriodicalId":100105,"journal":{"name":"Applications of Surface Science","volume":"22 ","pages":"Pages 813-819"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0378-5963(85)90214-4","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"74856703","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Destructive and non-destructive depth profiling using ESCA 使用ESCA进行破坏性和非破坏性深度剖面分析
Applications of Surface Science Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90062-5
K.L. Smith, J.S. Hammond
{"title":"Destructive and non-destructive depth profiling using ESCA","authors":"K.L. Smith,&nbsp;J.S. Hammond","doi":"10.1016/0378-5963(85)90062-5","DOIUrl":"10.1016/0378-5963(85)90062-5","url":null,"abstract":"<div><p>While the chemical analysis of a surface has become commonplace using a variety of techniques including Auger Electron Spectroscopy (AES) and Electron Spectroscopy for Chemical Analysis (ESCA), it is often advantageous to differentiate between the chemistry of the surface and the near surface. The method used to make this distinction depends on the thickness of the layers to be differentiated. If the combined thickness of the layers is greater than 100 Å, then the surface must be physically removed by ion bombardment before the subsurface components can be identified. An example of the chemistry revealed by this method is given in a sputter profile of an eight layer, 3000 Å, metal magnetic tape. The internal interfaces show more oxidation than the bulk of the metal layers. If the combined thickness of the layers is less than 100 Å, then the surface and subsurface components can be identified by non-destructive techniques. This is accomplished by using high energy excitation or by angle resolved studies. Examples will be shown of the change in the surface and near surface chemistry of polystyrene as it is treated in H<sub>2</sub> and H<sub>2</sub>O plasmas. The degree of oxidation of the polymer surface can be monitored as a function of reaction depth using angle resolved ESCA. Extending the range of angle resolved studies by using Au Mα X-rays is shown for a native oxide on silicon.</p></div>","PeriodicalId":100105,"journal":{"name":"Applications of Surface Science","volume":"22 ","pages":"Pages 288-298"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0378-5963(85)90062-5","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"88040074","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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